-
Patent Agency Ranking1.发明授权Process of vapor depositing and annealing vapor deposited layers of tin-germanium and indium-germanium metastable solid solutions 失效气相沉积和退火气相沉积层的锡 - 锗和铟 - 锗亚稳态固溶体的工艺
公开(公告)号：US3244557A
公开(公告)日：1966-04-05
申请号：US30995663
申请日：1963-09-19
Applicant: IBM
Inventor： CHARLES CHIOU , CONNELL RICHARD A , SERAPHIM DONALD P
CPC classification number: C23C14/14 , C23C14/58 , C23C14/5806 , C23C14/5893 , G11C11/44 , H01L39/00 , Y10S148/064 , Y10S148/065 , Y10S148/158 , Y10S148/169 , Y10S148/17 , Y10S420/903 , Y10S505/819
-
2.发明授权
公开(公告)号：US3297465A
公开(公告)日：1967-01-10
申请号：US33472163
申请日：1963-12-31
Applicant: IBM
Inventor： CONNELL RICHARD A , GREGOR LAWRENCE V
CPC classification number: B05D1/62 , C08F2/52 , H01J37/321 , H01J37/3266 , H01J2237/3382 , Y10S8/12 , Y10S8/18
-
公开(公告)号：US3196412A
公开(公告)日：1965-07-20
申请号：US22858462
申请日：1962-10-05
Applicant: IBM
Inventor： CONNELL RICHARD A , HORWITZ LAWRENCE P , QUINN DANIEL J , SERAPHIM DONALD P
IPC: G11C11/44
CPC classification number: G11C11/44 , Y10S505/831 , Y10S505/833 , Y10T29/49014
-
公开(公告)号：US3191136A
公开(公告)日：1965-06-22
申请号：US23924762
申请日：1962-11-21
Applicant: IBM
Inventor： CONNELL RICHARD A , QUINN III DANIEL J
IPC: G11C11/44
CPC classification number: G11C11/44 , Y10S336/01 , Y10S336/02 , Y10S505/857 , Y10S505/87
-
5.发明授权
公开(公告)号：US3050643A
公开(公告)日：1962-08-21
申请号：US85070059
申请日：1959-11-03
Applicant: IBM
Inventor： CONNELL RICHARD A , SERAPHIM DONALD P
CPC classification number: H01L39/10 , G11C11/44 , Y10S505/86
-
-
-
-
Search Results
5
records
(took 0.01 seconds)
