公开(公告)号：US20200266020A1

公开(公告)日：2020-08-20

申请号：US16644871

申请日：2017-09-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Soichiro MATSUNAGA ,  Yasunari SOHDA ,  Souichi KATAGIRI ,  Makoto SAKAKIBARA ,  Hajime KAWANO ,  Takashi DOI

IPC: H01J37/063 ,  H01J37/141 ,  H01J37/244 ,  H01J37/248 ,  H01J37/28 ,  H01J37/295

Abstract: In order to provide an electron gun capable of maintaining a small spot diameter of a beam converged on a sample even when a probe current applied to the sample is increased, a magnetic field generation source 301 is provided with respect to an electron gun including: an electron source 101; an extraction electrode 102 configured to extract electrons from the electron source 101; an acceleration electrode 103 configured to accelerate the electrons extracted from the electron source 101; and a first coil 104 and a first magnetic path 201 having an opening on an electron source side, the first coil 104 and the first magnetic path 201 forming a control lens configured to converge an electron beam emitted from the acceleration electrode 103. The magnetic field generation source is provided for canceling a magnetic field, at an installation position of the electron source 101, generated by the first coil 104 and the first magnetic path 201.

公开(公告)号：US20200090897A1

公开(公告)日：2020-03-19

申请号：US16572999

申请日：2019-09-17

Applicant: Hitachi High-Technologies Corporation

Inventor： Keigo KASUYA ,  Shuhei ISHIKAWA ,  Kenji TANIMOTO ,  Hajime KAWANO ,  Hideo TODOKORO ,  Souichi KATAGIRI ,  Takashi DOI ,  Soichiro MATSUNAGA

IPC: H01J37/075

Abstract: An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.

公开(公告)号：US20190311875A1

公开(公告)日：2019-10-10

申请号：US16354670

申请日：2019-03-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Wataru YAMANE ,  Minoru YAMAZAKI ,  Yuko SASAKI ,  Wataru MORI ,  Takashi DOI

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/22 ,  H01J37/28 ,  H01J37/10

Abstract: An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.

公开(公告)号：US20190198284A1

公开(公告)日：2019-06-27

申请号：US16328150

申请日：2016-09-06

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Soichiro MATSUNAGA ,  Yasunari SOHDA ,  Souichi KATAGIRI ,  Hajime KAWANO ,  Takashi DOI

IPC: H01J37/073 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/073 ,  H01J1/30 ,  H01J1/304 ,  H01J37/06 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/24578 ,  H01J2237/2809

Abstract: Provided is a high-brightness, high-current electron source including a wire-like member. The wire-like member has an electron emission plane at the tip of the wire-like member. The electron emission plane has a projectingly curved surface. At least the surface of the electron emission plane is formed of an amorphous material.