公开(公告)号：US20210389543A1

公开(公告)日：2021-12-16

申请号：US17246875

申请日：2021-05-03

Applicant: Hitachi High-Tech Corporation

Inventor： Yuto HATTORI ,  Nobuhiko KANZAKI

IPC: G02B7/00

Abstract: To improve alignment accuracy of an optical element. An alignment device includes an optical element, a base portion that holds the optical element and is supported in a state movable in an X-direction and a Y-direction intersecting with the X-direction, a mechanical driving unit driven by a pressure of a fluid, a member in contact with the base portion pushed by the mechanical driving unit, a stage portion that holds the member and is supported in a state movable in the Y-direction, the mechanical driving unit driven by a pressure of a fluid, and a member in contact with the stage portion pushed by the mechanical driving unit. The optical element has a position: adjusted by a balance between the pushing force by the mechanical driving unit and an elastomeric force in which at least one of the base portion and the member elastically deforms in the X-direction; and adjusted by a balance between the pushing force by the mechanical driving unit and an elastomeric force in which at least one of the stage portion and the member elastically deforms in the Y-direction.

公开(公告)号：US20230369012A1

公开(公告)日：2023-11-16

申请号：US18029004

申请日：2020-09-30

Applicant: Hitachi High-Tech Corporation

Inventor： Naoko TAKEDA ,  Natsuki TSUNO ,  Satoshi TAKADA ,  Yuto HATTORI

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/244 ,  H01J37/20

CPC classification number: H01J37/222 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

Abstract: Provided is a technique and the like capable of specifying irradiation areas or irradiation positions of a beam and a light as clearly as possible. A charged particle beam apparatus 1 includes: a position adjustment mark 10 provided on a stage 6 and irradiated with a beam b1 and a light a1; and a mechanism setting an irradiation position of the beam b1 and an irradiation position of the light a1 with respect to the stage 6 and changing a relative positional relationship including a distance between the irradiation position of the light a1 and the stage 6. A computer system 2 generates a first image in which the position adjustment mark 10 is reflected based on a first detection signal obtained by irradiating the position adjustment mark 10 with the beam b1, generates a second image in which an irradiation area of the light a1 is reflected in the vicinity of the position adjustment mark 10 based on a second detection signal obtained by irradiating the position adjustment mark 10 with the light a1, and adjusts an irradiation position of the beam b1 and an irradiation position of the light a1 based on the first image and the second image obtained when a positional relationship is changed by the mechanism.