公开(公告)号：US11764028B2

公开(公告)日：2023-09-19

申请号：US17056993

申请日：2018-05-22

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta Imai ,  Masahiro Sasajima ,  Yoshihiro Takahoko

IPC: H01J37/14 ,  H01J37/15 ,  H01J37/21 ,  H01J37/28 ,  H01J37/145 ,  H01J37/12 ,  H01J37/141

CPC classification number: H01J37/145 ,  H01J37/15 ,  H01J37/21 ,  H01J37/12 ,  H01J37/141 ,  H01J37/28

Abstract: A charged particle beam device is provided in which axis adjustment as a superimposing lens is facilitated by aligning an axis of an electrostatic lens resulting from a deceleration electric field with an axis of a magnetic field lens. The charged particle beam device includes: an electron source; an objective lens that focuses a probe electron beam from the electron source on a sample; a first beam tube and a second beam tube through each of which the probe electron beam passes; a deceleration electrode arranged between the first beam tube and a sample; a first voltage source that forms a deceleration electric field for the probe electron beam between the first beam tube and the deceleration electrode by applying a first potential to the first beam tube; and a first moving mechanism that moves a position of the first beam tube.

公开(公告)号：US11264201B2

公开(公告)日：2022-03-01

申请号：US17058259

申请日：2018-06-12

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Kazuo Ootsuga ,  Yuta Imai ,  Tsunenori Nomaguchi

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: A charged particle beam device includes: a charged particle beam source configured to generate a charged particle beam with which a sample is irradiated; a charged particle detection unit configured to detect a charged particle generated when the sample is irradiated with the charged particle beam; an intensity data generation unit configured to generate intensity data of the charged particle detected by the charged particle detection unit; a pulse-height value data generation unit configured to generate pulse-height value data of the charged particle detected by the charged particle detection unit; and an output unit configured to output a first image of the sample based on the intensity data and a second image of the sample based on the pulse-height value data.

公开(公告)号：US12027342B2

公开(公告)日：2024-07-02

申请号：US18363284

申请日：2023-08-01

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta Imai ,  Masahiro Sasajima ,  Yoshihiro Takahoko

IPC: H01J37/14 ,  H01J37/12 ,  H01J37/145 ,  H01J37/15 ,  H01J37/21 ,  H01J37/28 ,  H01J37/141

CPC classification number: H01J37/145 ,  H01J37/15 ,  H01J37/21 ,  H01J37/12 ,  H01J37/141 ,  H01J37/28

Abstract: A charged particle beam device is provided in which axis adjustment as a superimposing lens is facilitated by aligning an axis of an electrostatic lens resulting from a deceleration electric field with an axis of a magnetic field lens. The charged particle beam device includes: an electron source; an objective lens that focuses a probe electron beam from the electron source on a sample; a first beam tube and a second beam tube through each of which the probe electron beam passes; a deceleration electrode arranged between the first beam tube and a sample; a first voltage source that forms a deceleration electric field for the probe electron beam between the first beam tube and the deceleration electrode by applying a first potential to the first beam tube; and a first moving mechanism that moves a position of the first beam tube.

公开(公告)号：US11823861B2

公开(公告)日：2023-11-21

申请号：US17617379

申请日：2019-07-02

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Yuta Imai ,  Junichi Katane

IPC: H01J37/141 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/04735 ,  H01J2237/2448

Abstract: The invention provides a charged particle beam device that prevents a leakage of an unnecessary magnetic field to a trajectory of a charged particle beam with which a sample is irradiated in a sample observation according to a boosting method. The charged particle beam device includes: a charged particle source configured to generate the charged particle beam with which the sample is irradiated; an object lens configured to generate the magnetic field for focusing the charged particle beam; and a boosting electrode that is provided inside the object lens and to which a voltage for accelerating the charged particle beam is applied. The boosting electrode is formed of a magnetic material.

公开(公告)号：US11342155B2

公开(公告)日：2022-05-24

申请号：US17056285

申请日：2018-05-22

Applicant: Hitachi High-Tech Corporation

Inventor： Yuta Imai ,  Masahiro Sasajima ,  Yoshihiro Takahoko

IPC: H01J37/145 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

Abstract: In a charged particle beam device including a deceleration optical system, a change in a deceleration electric field and an axis shift due to a structure between an objective lens and a sample are prevented to reduce adverse effects on an irradiation system and detection system. The charged particle beam device includes an electron source, an objective lens configured to focus a probe electron beam from the electron source on the sample, an acceleration electrode configured to accelerate the probe electron beam, a first detector provided in the acceleration electrode, a deceleration electrode configured to form a deceleration electric field for the probe electron beam with the acceleration electrode, the probe electron beam being configured to pass through an opening of the deceleration electrode, and a second detector inserted between the deceleration electrode and the sample. The second detector includes an opening portion larger than the opening of the deceleration electrode, and a sensing surface is provided around the opening portion.