公开(公告)号：US20180286627A1

公开(公告)日：2018-10-04

申请号：US15940868

申请日：2018-03-29

Applicant: Hitachi High-Technologies Corporation

Inventor： Shinya UENO ,  Hiroshi NISHIHAMA ,  Shuangqi DONG ,  Shahedul HOQUE ,  Susumu KOYAMA

IPC: H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/28 ,  H01J37/26

Abstract: An object of the invention is to provide a charged particle beam apparatus capable of achieving both acquisition of an image having high resolution of an inspection target pattern and suppression of a beam irradiation amount when a specific pattern is an inspection target from a highly integrated pattern group. In order to achieve the object, a charged particle beam apparatus is proposed in which at least one of a stage and a deflector is controlled so as to move a field of view from a reference position to an inspection or measurement target pattern, the number of objects included in a first image obtained by scanning a position of the field of view in a moving process of the field of view with a charged particle beam of a first irradiation condition is counted, and in a case where the number of the objects satisfies a predetermined condition, a second image is generated based on scanning with a charged particle beam of a second irradiation condition of a higher dose than that of the first irradiation condition.

公开(公告)号：US20140021350A1

公开(公告)日：2014-01-23

申请号：US13789346

申请日：2013-03-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi NISHIHAMA ,  Tatsuya MAEDA ,  Mitsuji IKEDA ,  Susumu KOYAMA

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.

公开(公告)号：US20180269026A1

公开(公告)日：2018-09-20

申请号：US15761294

申请日：2015-09-29

Applicant: Hitachi High-Technologies Corporation

Inventor： Shahedul HOQUE ,  Hajime KAWANO ,  Yoshinori MOMONOI ,  Hideki ITAI ,  Minoru YAMAZAKI ,  Hiroshi NISHIHAMA

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/26 ,  G02B21/00

Abstract: The objective of the present invention is to provide a charged particle beam device wherein scanning is performed through a scanning pattern that may suppress the influence from charge accumulation without having to perform blanking. In order to achieve this objective, a charged particle beam device is proposed wherein a first scan line is scanned by deflecting a charged particle beam in a first direction. The charged particle beam is deflected in a manner where the ending point of the first scan line is connected to the scan starting point of a second scan line which is arranged to be parallel to the first scan line so as to draw a scanning trajectory, thereby modifying the scan line position. The second scan line is scanned by scanning the charged particle beam from the scan starting point of the second scan line toward a second direction that is opposite to the first direction. After scanning the second scan line, the charged particle beam device scans the interior of a first frame by repeating the scan line position modification and the scanning of the charged particle beam toward the opposite direction. After scanning the first frame, the charged particle beam device starts the scanning of a second frame with the scan ending point contained within the first frame serving as the scan starting point.