公开(公告)号：US20180286627A1

公开(公告)日：2018-10-04

申请号：US15940868

申请日：2018-03-29

Applicant: Hitachi High-Technologies Corporation

Inventor： Shinya UENO ,  Hiroshi NISHIHAMA ,  Shuangqi DONG ,  Shahedul HOQUE ,  Susumu KOYAMA

IPC: H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/28 ,  H01J37/26

Abstract: An object of the invention is to provide a charged particle beam apparatus capable of achieving both acquisition of an image having high resolution of an inspection target pattern and suppression of a beam irradiation amount when a specific pattern is an inspection target from a highly integrated pattern group. In order to achieve the object, a charged particle beam apparatus is proposed in which at least one of a stage and a deflector is controlled so as to move a field of view from a reference position to an inspection or measurement target pattern, the number of objects included in a first image obtained by scanning a position of the field of view in a moving process of the field of view with a charged particle beam of a first irradiation condition is counted, and in a case where the number of the objects satisfies a predetermined condition, a second image is generated based on scanning with a charged particle beam of a second irradiation condition of a higher dose than that of the first irradiation condition.

公开(公告)号：US20140021350A1

公开(公告)日：2014-01-23

申请号：US13789346

申请日：2013-03-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi NISHIHAMA ,  Tatsuya MAEDA ,  Mitsuji IKEDA ,  Susumu KOYAMA

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.

公开(公告)号：US20140021349A1

公开(公告)日：2014-01-23

申请号：US13789323

申请日：2013-03-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi Nishihama ,  Tatsuya MAEDA ,  Mitsuji IKEDA ,  Susumu KOYAMA

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.

Abstract translation: 本发明的目的是提供一种在同时减少落在待测图案上的光束的剂量的同时执行高精度凹凸确定（例如，区分线段和空间）的图案测量装置。 为了实现该目的，本发明提出了一种图形测量装置，其通过相对于与测量对象区域不同的另一区域扫描倾斜的豆来指定测量对象区域中的图案，然后基于图案指定结果进行测量。 通过这样的布置，可以在降低射击测量对象区域的光束的剂量的情况下进行测量而不会出现错误的图案指定的风险。