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1.发明公开公开(公告)号：US20240184220A1
公开(公告)日：2024-06-06
申请号：US18510706
申请日：2023-11-16
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Yoshifumi UENO , Kotaro MIYASHITA
CPC classification number: G03F7/706845 , G03F7/70033 , G03F7/70041 , G03F7/70233 , G03F7/70258 , G03F7/7065 , G03F7/706847 , G03F7/706849 , H05G2/008
Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions, and having a geometric centroid located at a position away from the optical axis in a direction toward the EUV light concentrating mirror; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light.
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Patent Agency Ranking
2.发明申请公开(公告)号：US20200064184A1
公开(公告)日：2020-02-27
申请号：US16673548
申请日：2019-11-04
Applicant: Gigaphoton Inc.
Inventor： Kotaro MIYASHITA
Abstract: An extreme ultraviolet light sensor unit according to one aspect of the present disclosure includes: a mirror configured to reflect extreme ultraviolet light; a wavelength filter configured to selectively transmit the extreme ultraviolet light reflected by the mirror; an optical sensor configured to detect the extreme ultraviolet light having transmitted through the wavelength filter; and a purge gas supply unit disposed to supply purge gas to a space between the wavelength filter and the optical sensor.
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3.发明公开公开(公告)号：US20240184211A1
公开(公告)日：2024-06-06
申请号：US18510705
申请日：2023-11-16
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Yoshifumi UENO , Kotaro MIYASHITA
CPC classification number: G03F7/70033 , G02B5/0891 , G03F1/24 , G03F7/7085
Abstract: An extreme ultraviolet light generation system includes a chamber including a first region; a target supply unit supplying a target to the first region; a laser device outputting pulse laser light; an optical system including an optical element to guide the pulse laser light to the first region; an irradiation position adjustment mechanism adjusting a laser irradiation position with respect to the target; an EUV light concentrating mirror arranged such that the pulse laser light passes outside the EUV light concentrating mirror and is guided to the first region; a plurality of EUV sensors measuring radiation energies of the EUV light radiated from the first region in mutually different radiation directions; and a processor controlling the irradiation position adjustment mechanism as setting a target irradiation position of the pulse laser light to a laser irradiation position away from a reference position in a direction toward the EUV light concentrating mirror.
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公开(公告)号：US20180077785A1
公开(公告)日：2018-03-15
申请号：US15807067
申请日：2017-11-08
Applicant: Gigaphoton Inc.
Inventor： Toru SUZUKI , Kotaro MIYASHITA , Yoshifumi UENO , Takuya ISHII
IPC: H05G2/00
Abstract: Output timing of laser light is controlled with high accuracy. An extreme ultraviolet light generation device may include a chamber in which plasma is generated to generate extreme ultraviolet light, a window provided in the chamber, an optical path pipe connected to the chamber, a light source disposed in the optical path pipe and configured to output light into the chamber via the window, a gas supply unit configured to supply gas into the optical path pipe, and an exhaust port configured to discharge the gas in the optical path pipe to an outside of the optical path pipe.
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公开(公告)号：US20250164889A1
公开(公告)日：2025-05-22
申请号：US18904718
申请日：2024-10-02
Applicant: Gigaphoton Inc.
Inventor： Kotaro MIYASHITA , Chiharu SUZUKI , Toru ABE
Abstract: An EUV light generation apparatus according to an aspect of the present disclosure includes a chamber, a target supply device configured to supply a target into the chamber, a target imaging device configured to create a first target image by imaging a region including the target and a second target image by imaging the region at a timing at which a position of the target in the second target image does not overlap with a position thereof in the first target image, and a processor configured to create a background image using at least the second target image, creating a background corrected image by correcting the first target image, and detecting a position of the target based on the background corrected image.
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6.发明公开公开(公告)号：US20230161262A1
公开(公告)日：2023-05-25
申请号：US18047587
申请日：2022-10-18
Applicant: Gigaphoton Inc.
Inventor： Gouta NIIMI , Kotaro MIYASHITA
IPC: G03F7/20
CPC classification number: G03F7/70033 , G03F7/7055 , G03F7/70025 , G03F7/70041 , G03F7/70166
Abstract: An extreme ultraviolet light generation system includes a chamber, a target supply unit supplying a target substance to a plasma generation region including a first point in the chamber, a window allowing pulse laser light with which the target substance is irradiated to pass therethrough, an EUV light concentrating mirror concentrating extreme ultraviolet light generated at the first point on a second point, a planar mirror arranged on an optical path of the extreme ultraviolet light reflected by the EUV light concentrating mirror and between the first and second points, an actuator causing the second point to be switched between a first position and a second position, a connection portion connectable to an external apparatus, a first EUV measurement unit on which the extreme ultraviolet light having passed through the second position is incident, and a processor controlling the actuator based on a signal from the external apparatus.
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