公开(公告)号：US20210333716A1

公开(公告)日：2021-10-28

申请号：US17369794

申请日：2021-07-07

Applicant: Gigaphoton Inc.

Inventor： Toru ABE

IPC: G03F7/20

Abstract: An extreme ultraviolet light generation apparatus is an apparatus to generate extreme ultraviolet light by irradiating a target with laser light, and may include a target supply unit configured to output the target, an actuator configured to shift a trajectory of the target, a first trajectory sensor configured to detect the trajectory of the target in a first direction, a second trajectory sensor configured to detect the trajectory of the target in a second direction being different from the first direction, and a control unit configured to perform trajectory control including controlling the actuator to cause the second trajectory sensor to be capable of detecting the trajectory of the target when the trajectory of the target has been detected by the first trajectory sensor and has not been detected by the second trajectory sensor.

公开(公告)号：US20250164889A1

公开(公告)日：2025-05-22

申请号：US18904718

申请日：2024-10-02

Applicant: Gigaphoton Inc.

Inventor： Kotaro MIYASHITA ,  Chiharu SUZUKI ,  Toru ABE

IPC: G03F7/00 ,  G03F1/22

Abstract: An EUV light generation apparatus according to an aspect of the present disclosure includes a chamber, a target supply device configured to supply a target into the chamber, a target imaging device configured to create a first target image by imaging a region including the target and a second target image by imaging the region at a timing at which a position of the target in the second target image does not overlap with a position thereof in the first target image, and a processor configured to create a background image using at least the second target image, creating a background corrected image by correcting the first target image, and detecting a position of the target based on the background corrected image.