公开(公告)号：US20250164889A1

公开(公告)日：2025-05-22

申请号：US18904718

申请日：2024-10-02

Applicant: Gigaphoton Inc.

Inventor： Kotaro MIYASHITA ,  Chiharu SUZUKI ,  Toru ABE

IPC: G03F7/00 ,  G03F1/22

Abstract: An EUV light generation apparatus according to an aspect of the present disclosure includes a chamber, a target supply device configured to supply a target into the chamber, a target imaging device configured to create a first target image by imaging a region including the target and a second target image by imaging the region at a timing at which a position of the target in the second target image does not overlap with a position thereof in the first target image, and a processor configured to create a background image using at least the second target image, creating a background corrected image by correcting the first target image, and detecting a position of the target based on the background corrected image.