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    Surface roughness measurement device
    1.
    发明授权
    Surface roughness measurement device 有权

    公开(公告)号：US10054434B2

    公开(公告)日：2018-08-21

    申请号：US14787134

    申请日：2014-04-25

    Applicant: General Electric Company

    Inventor： Guangping Xie ,  Ming Jia ,  Zirong Zhai ,  Paolo Trallori ,  Kevin George Harding ,  Guiju Song

    IPC: G01B11/30 ,  G01N21/47 ,  G01N21/55 ,  G01B11/24

    CPC classification number: G01B11/303 ,  G01B11/24 ,  G01B11/30 ,  G01B11/306 ,  G01N21/47 ,  G01N21/55

    Abstract: A surface roughness measurement device that in one embodiment includes main and auxiliary emitting fibers, multiple collecting fibers, an optical housing, main and auxiliary reflective mirrors, and an external circuit. The optical housing includes the fibers and defines an aperture for optically contacting a surface of an object. The main reflective mirror is arranged in the optical housing, for reflecting light emitted from the main emitting fiber to a detecting point of the aperture and reflected light by the object to the collecting fibers. The auxiliary reflective mirror is arranged in the optical housing, for reflecting light emitted from the auxiliary emitting fiber to the detecting point. The external circuit is for generating a laser beam to the main and auxiliary emitting fibers, collecting the reflected light from the collecting fibers, and calculating the surface roughness of the object based on the collected reflected light.

    ADDITIVE MANUFACTURING SYSTEM AND METHOD
    3.
    发明申请
    ADDITIVE MANUFACTURING SYSTEM AND METHOD 有权

    公开(公告)号：US20210078078A1

    公开(公告)日：2021-03-18

    申请号：US16959572

    申请日：2018-12-21

    Applicant: General Electric Company

    Inventor： Dalong Zhong ,  Yingna Wu ,  Zirong Zhai ,  Yong Wu ,  Hai Chang ,  Bin Wei ,  Lyle Timothy Rasch

    IPC: B22F3/16 ,  B22F3/17

    Abstract: An additive manufacturing system, comprises an energy source device for providing a first energy beam and a second energy beam; and a forging device comprising a forging head. The first energy beam and a substrate are configured to move relative to each other to fuse at least a portion of a material added to the surface of the substrate for forming a cladding layer on the substrate. The forging head is configured to forge the cladding layer during formation of the cladding layer. The second energy beam is configured to heat a forging area of the cladding layer.

    Radiography system and method of controlling radiography system thereof
    5.
    发明授权
    Radiography system and method of controlling radiography system thereof 有权

    公开(公告)号：US10568601B2

    公开(公告)日：2020-02-25

    申请号：US16124691

    申请日：2018-09-07

    Applicant: GENERAL ELECTRIC COMPANY

    Inventor： John Eric Tkaczyk ,  Feng Pan ,  Jiajun Gu ,  Zirong Zhai

    IPC: G01N23/04 ,  A61B6/00

    Abstract: A radiography system for imaging an object, comprises a radiation source located in a first side of the object for generating a plurality of beams; a detector located in a second side of the object for detecting the plurality of beams from the radiation source. The radiography system comprises a first sensor located in the first side of the object for obtaining an object related information and a second sensor disposed on the detector for obtaining a detector-position related information. The radiography system further comprises a controller configured to reconstruct a 3D scene based on the object related information obtained by the first sensor and the detector-position related information obtained by the second sensor and control an operation of at least one of the radiation source and the detector based on the reconstructed 3D scene. A method of controlling the radiography system is also disclosed.

    RADIOGRAPHY SYSTEM AND METHOD OF CONTROLLING RADIOGRAPHY SYSTEM THEREOF
    6.
    发明申请
    RADIOGRAPHY SYSTEM AND METHOD OF CONTROLLING RADIOGRAPHY SYSTEM THEREOF 审中-公开

    公开(公告)号：US20190076106A1

    公开(公告)日：2019-03-14

    申请号：US16124691

    申请日：2018-09-07

    Applicant: GENERAL ELECTRIC COMPANY

    Inventor： John Eric Tkaczyk ,  Feng Pan ,  Jiajun Gu ,  Zirong Zhai

    IPC: A61B6/00

    CPC classification number: A61B6/5294 ,  A61B6/0407 ,  A61B6/4283 ,  A61B6/4405 ,  A61B6/542 ,  A61B6/545 ,  A61B6/547 ,  G01S17/88

    Abstract: A radiography system for imaging an object, comprises a radiation source located in a first side of the object for generating a plurality of beams; a detector located in a second side of the object for detecting the plurality of beams from the radiation source. The radiography system comprises a first sensor located in the first side of the object for obtaining an object related information and a second sensor disposed on the detector for obtaining a detector-position related information. The radiography system further comprises a controller configured to reconstruct a 3D scene based on the object related information obtained by the first sensor and the detector-position related information obtained by the second sensor and control an operation of at least one of the radiation source and the detector based on the reconstructed 3D scene. A method of controlling the radiography system is also disclosed.

    Optical imaging system and method, and aperture stop assembly and aperture element
    10.
    发明授权
    Optical imaging system and method, and aperture stop assembly and aperture element 有权
    光学成像系统和方法，以及孔径光阑组件和孔径元件

    公开(公告)号：US09069181B2

    公开(公告)日：2015-06-30

    申请号：US13630373

    申请日：2012-09-28

    Applicant: General Electric Company

    Inventor： Kevin George Harding ,  Guiju Song ,  Tao Li ,  Dongmin Yang ,  Jie Han ,  Zirong Zhai

    IPC: G02F1/01 ,  G02B5/30 ,  G02B27/28 ,  G01N21/21 ,  A61B1/00 ,  A61B1/045 ,  A61B5/00

    CPC classification number: G02B27/283 ,  A61B1/00186 ,  A61B1/045 ,  A61B5/0059 ,  A61B2560/0223 ,  G01N21/21

    Abstract: An optical imaging system includes a birefringent element, a light modulating element, and a polarizer element. The birefringent element is configured for decomposing un-polarized light into first linear polarized light and second linear polarized light under different refractive indexes to respectively form a first focal length and a second focal length in the optical imaging system. The light modulating element is configured for modulating a state of polarization of the first and second linear polarized light in response to control signals. The polarizer element is configured for filtering out one of the modulated first and second linear polarized light for creating a single image.

    Abstract translation: 光学成像系统包括双折射元件，光调制元件和偏振元件。 双折射元件被配置为将不偏振光分解成不同折射率的第一线偏振光和第二线偏振光，以在光学成像系统中分别形成第一焦距和第二焦距。 光调制元件被配置为响应于控制信号调制第一和第二线偏振光的偏振状态。 偏振器元件被配置为滤除调制的第一和第二线偏振光之一，以产生单个图像。

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