Light modulation for inspection probes

    公开(公告)号:US11125551B2

    公开(公告)日:2021-09-21

    申请号:US15674920

    申请日:2017-08-11

    Abstract: A probe system and a method are provided. The probe system includes an emitter unit, a pattern generation system, and an intensity modulator. The emitter unit is for emitting light. The pattern generation system is for projecting at least one reference structured-light pattern onto an object surface to obtain at least one reference projected pattern, and including a mirror scanning unit for reflecting the light to a plurality of directions. The intensity modulator is for modulating intensity of the light according to the at least one reference projected pattern to provide modulated light to the mirror scanning unit to reflect the modulated light to the plurality of directions to project at least one modulated structured-light pattern onto the object surface to obtain at least one modulated projected pattern.

    INSPECTION ASSISTANT FOR AIDING VISUAL INSPECTIONS OF MACHINES

    公开(公告)号:US20220236197A1

    公开(公告)日:2022-07-28

    申请号:US17160825

    申请日:2021-01-28

    Abstract: A digital inspection assistant and a system and a method of using the inspection assistant as an aid during a visual inspection of a gas turbine engine are provided. In one aspect, the inspection assistant receives data that includes images captured by an optical probe installed through an access port of a gas turbine engine. The images can be still images or video of the interior of a core of the engine. A gateway can route the data to the inspection assistant. The inspection assistant can provide interactive inspection guidance to an operator and can detect component defects. The inspection assistant can provide real time defect analysis to the operator by generating an alert upon detection of a defect. The generated alert can be audible, a visual graphic presented on a display of the visual inspection, and/or some other suitable alert. The analysis results can assist the operator during inspection.

    Probe System and Method
    3.
    发明申请

    公开(公告)号:US20180045510A1

    公开(公告)日:2018-02-15

    申请号:US15674920

    申请日:2017-08-11

    Abstract: A probe system and a method are provided. The probe system includes an emitter unit, a pattern generation system, and an intensity modulator. The emitter unit is for emitting light. The pattern generation system is for projecting at least one reference structured-light pattern onto an object surface to obtain at least one reference projected pattern, and including a mirror scanning unit for reflecting the light to a plurality of directions. The intensity modulator is for modulating intensity of the light according to the at least one reference projected pattern to provide modulated light to the mirror scanning unit to reflect the modulated light to the plurality of directions to project at least one modulated structured-light pattern onto the object surface to obtain at least one modulated projected pattern.

    Optical imaging system and method, and aperture stop assembly and aperture element
    4.
    发明授权
    Optical imaging system and method, and aperture stop assembly and aperture element 有权
    光学成像系统和方法,以及孔径光阑组件和孔径元件

    公开(公告)号:US09069181B2

    公开(公告)日:2015-06-30

    申请号:US13630373

    申请日:2012-09-28

    Abstract: An optical imaging system includes a birefringent element, a light modulating element, and a polarizer element. The birefringent element is configured for decomposing un-polarized light into first linear polarized light and second linear polarized light under different refractive indexes to respectively form a first focal length and a second focal length in the optical imaging system. The light modulating element is configured for modulating a state of polarization of the first and second linear polarized light in response to control signals. The polarizer element is configured for filtering out one of the modulated first and second linear polarized light for creating a single image.

    Abstract translation: 光学成像系统包括双折射元件,光调制元件和偏振元件。 双折射元件被配置为将不偏振光分解成不同折射率的第一线偏振光和第二线偏振光,以在光学成像系统中分别形成第一焦距和第二焦距。 光调制元件被配置为响应于控制信号调制第一和第二线偏振光的偏振状态。 偏振器元件被配置为滤除调制的第一和第二线偏振光之一,以产生单个图像。

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