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公开(公告)号：US12032288B2
公开(公告)日：2024-07-09
申请号：US17307091
申请日：2021-05-04
申请人： FUJIFILM Corporation
发明人： Masafumi Kojima , Minoru Uemura , Akihiro Kaneko , Akiyoshi Goto , Kei Yamamoto
IPC分类号： G03F7/004 , C07C25/18 , C07C309/06 , C07C309/12 , C07C309/17 , C07C311/48 , C07C381/12 , C07D327/06 , C07D333/46
CPC分类号： G03F7/0045 , C07C25/18 , C07C309/06 , C07C309/12 , C07C309/17 , C07C311/48 , C07C381/12 , C07D327/06 , C07D333/46 , C07C2602/42 , C07C2603/74
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin.
M1+A−-L-B−M2+ (I)-
公开(公告)号：US12001140B2
公开(公告)日：2024-06-04
申请号：US17169757
申请日：2021-02-08
申请人： FUJIFILM Corporation
IPC分类号： G03F7/039 , C08F212/14 , C08F220/18 , C08F220/58 , G03F7/038
CPC分类号： G03F7/039 , C08F212/24 , C08F220/1806 , C08F220/585 , G03F7/038
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases by the action of an acid; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (B-1).
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公开(公告)号：US20230236502A1
公开(公告)日：2023-07-27
申请号：US18185115
申请日：2023-03-16
申请人： FUJIFILM Corporation
CPC分类号： G03F7/0217 , G03F7/031 , G03F7/0035 , G03F7/2002 , G03F7/32 , G03F7/0015
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition capable of obtaining a pattern having a good shape, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a salt including a cation represented by Formula (X) and a resin of which polarity increases through decomposition by the action of an acid.
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公开(公告)号：US20220334476A1
公开(公告)日：2022-10-20
申请号：US17591943
申请日：2022-02-03
申请人： FUJIFILM Corporation
发明人： Masafumi KOJIMA , Aina Ushiyama , Akiyoshi Goto , Michihiro Shirakawa , Keita Kato , Kazuhiro Marumo , Hironori Oka
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , C07C381/12 , C07C311/51 , C07C311/48 , C07C309/12 , C07C309/17
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a specific compound, in which the specific compound has two or more cationic moieties and the same number of anionic moieties as that of the cationic moieties, and at least one of the cationic moieties has a group represented by General Formula (I).
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公开(公告)号：US11156917B2
公开(公告)日：2021-10-26
申请号：US16546867
申请日：2019-08-21
申请人： FUJIFILM Corporation
发明人： Kyohei Sakita , Mitsuhiro Fujita , Takumi Tanaka , Keishi Yamamoto , Akiyoshi Goto , Keita Kato
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/40 , H01L21/027 , G03F7/16 , G03F7/32 , G03F7/38
摘要： An actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.
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公开(公告)号：US20210216012A1
公开(公告)日：2021-07-15
申请号：US17212546
申请日：2021-03-25
申请人： FUJIFILM Corporation
IPC分类号： G03F7/004 , C08F220/18 , C08F220/28 , C08F212/14 , C08F220/36 , G03F7/039 , C09D125/18 , C09D133/10 , C09D133/16
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes an acid-decomposable resin having a repeating unit represented by General Formula (I), and a compound that generates an add upon irradiation with actinic rays or radiation.
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公开(公告)号：US10114292B2
公开(公告)日：2018-10-30
申请号：US15460380
申请日：2017-03-16
申请人： FUJIFILM Corporation
发明人： Naoki Inoue , Naohiro Tango , Michihiro Shirakawa , Kei Yamamoto , Akiyoshi Goto
IPC分类号： G03F7/004 , G03F7/32 , G03F7/11 , G03F7/38 , H01L21/027 , C08F220/18 , C08F220/28 , G03F7/09 , G03F7/16 , G03F7/20 , G03F7/40 , G03F7/039
摘要： Provided are a pattern forming method capable of providing good DOF and LER, a resist pattern formed by the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method. The pattern forming method includes a step a of coating an active-light-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film, a step b of coating a composition for forming an upper layer film onto the resist film, followed by carrying out heating to 100° C. or higher, to form the upper layer film on the resist film, a step c of exposing the resist film having the upper layer film formed thereon, and a step d of developing the exposed resist film using a developer including an organic solvent to form a pattern.
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公开(公告)号：US10018913B2
公开(公告)日：2018-07-10
申请号：US15400491
申请日：2017-01-06
申请人： FUJIFILM Corporation
IPC分类号： G03F7/004 , G03F7/039 , C08F220/18 , G03F7/16 , G03F7/09 , G03F7/20 , G03F7/38 , G03F7/32 , G03F7/40 , G03F7/26 , C08F220/28 , C08F220/10 , H01L21/027
CPC分类号： G03F7/0397 , C08F212/14 , C08F220/10 , C08F220/18 , C08F220/22 , C08F220/26 , C08F220/28 , C08F220/36 , C08F2220/1858 , C08F2220/282 , C08F2220/283 , G03F7/004 , G03F7/0045 , G03F7/0392 , G03F7/091 , G03F7/16 , G03F7/168 , G03F7/2041 , G03F7/26 , G03F7/325 , G03F7/327 , G03F7/38 , G03F7/40 , H01L21/0274
摘要： Provided are an active-light-sensitive or radiation-sensitive resin composition having high DOF and excellent LWR, a pattern forming method using the composition, and a method for manufacturing an electronic device. The composition is an active-light-sensitive or radiation-sensitive resin composition containing a resin (P), in which the resin (P) includes a repeating unit (a) having a group that decomposes by the action of an acid to generate a polar group, including at least a specific repeating unit (a1) represented by General Formula (1); a repeating unit (b1) having at least one of a lactone structure, a sultone structure, or a carbonate structure; and a repeating unit (b2) having at least one of a lactone structure, a sultone structure, or a carbonate structure, which is different from the repeating unit (b1), the Ohnishi parameter of the repeating unit (b1) is larger than the Ohnishi parameter of the repeating unit (b2), and the difference between both the Ohnishi parameters is 0.85 or more.
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公开(公告)号：US11886113B2
公开(公告)日：2024-01-30
申请号：US17002911
申请日：2020-08-26
申请人： FUJIFILM Corporation
IPC分类号： G03F7/004 , C07C381/12 , C07D295/26 , C07D327/08 , C07D333/46 , C08L25/06 , C08L33/06 , C08L33/08 , C08L33/16 , G03F7/115 , G03F7/20
CPC分类号： G03F7/0045 , C07C381/12 , C07D295/26 , C07D327/08 , C07D333/46 , C08L25/06 , C08L33/064 , C08L33/08 , C08L33/16 , G03F7/115 , G03F7/2053
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having an excellent pattern collapse suppressing property and excellent LWR performance can be obtained. In addition, the present invention also provides a resist film, a pattern forming method, and a method for manufacturing an electronic device, each regarding the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a resin whose solubility in a developer is changed by the action of an acid, a photoacid generator represented by General Formula (b1), and a solvent, in which the photoacid generator represented by General Formula (b1) is a compound that generates an acid having a pka of 1.0 or less upon irradiation with actinic rays or radiation
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公开(公告)号：US11584810B2
公开(公告)日：2023-02-21
申请号：US16266719
申请日：2019-02-04
申请人： FUJIFILM Corporation
发明人： Akira Takada , Ryo Nishio , Akiyoshi Goto , Michihiro Shirakawa , Naohiro Tango , Kazuhiro Marumo , Kyohei Sakita
IPC分类号： G03F7/039 , G03F7/20 , C08F20/24 , G03F7/004 , G03F7/32 , C08F20/26 , G03F7/11 , C08F220/18 , C08L33/14
摘要： An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (C) having a repeating unit represented by Formula (1). A pattern forming method includes a step of forming a film with the actinic ray-sensitive or radiation-sensitive resin composition, and a method of manufacturing an electronic device includes the pattern forming method, in Formula (1), Z represents a halogen atom, a group represented by R11OCH2—, or a group represented by R12OC(═O)CH2—. R11 and R12 each represent a monovalent substituent. X represents an oxygen atom or a sulfur atom. L represents a (n+1)-valent linking group. R represents a group having a group that is decomposed due to the action of an alkali developer to increase solubility in an alkali developer, n represents a positive integer.
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