- 专利标题: Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
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申请号: US17169757申请日: 2021-02-08
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公开(公告)号: US12001140B2公开(公告)日: 2024-06-04
- 发明人: Kazunari Yagi , Akihiro Kaneko , Takashi Kawashima , Akiyoshi Goto
- 申请人: FUJIFILM Corporation
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP 18168170 2018.09.07 JP 19030587 2019.02.22
- 主分类号: G03F7/039
- IPC分类号: G03F7/039 ; C08F212/14 ; C08F220/18 ; C08F220/58 ; G03F7/038
摘要:
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases by the action of an acid; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (B-1).
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