公开(公告)号：US20220334476A1

公开(公告)日：2022-10-20

申请号：US17591943

申请日：2022-02-03

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Aina Ushiyama ,  Akiyoshi Goto ,  Michihiro Shirakawa ,  Keita Kato ,  Kazuhiro Marumo ,  Hironori Oka

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C311/51 ,  C07C311/48 ,  C07C309/12 ,  C07C309/17

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a specific compound, in which the specific compound has two or more cationic moieties and the same number of anionic moieties as that of the cationic moieties, and at least one of the cationic moieties has a group represented by General Formula (I).

公开(公告)号：US11156917B2

公开(公告)日：2021-10-26

申请号：US16546867

申请日：2019-08-21

Applicant: FUJIFILM Corporation

Inventor： Kyohei Sakita ,  Mitsuhiro Fujita ,  Takumi Tanaka ,  Keishi Yamamoto ,  Akiyoshi Goto ,  Keita Kato

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/40 ,  H01L21/027 ,  G03F7/16 ,  G03F7/32 ,  G03F7/38

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.

公开(公告)号：US10018913B2

公开(公告)日：2018-07-10

申请号：US15400491

申请日：2017-01-06

Applicant: FUJIFILM Corporation

Inventor： Akiyoshi Goto ,  Masafumi Kojima ,  Michihiro Shirakawa ,  Keita Kato

IPC: G03F7/004 ,  G03F7/039 ,  C08F220/18 ,  G03F7/16 ,  G03F7/09 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40 ,  G03F7/26 ,  C08F220/28 ,  C08F220/10 ,  H01L21/027

CPC classification number: G03F7/0397 ,  C08F212/14 ,  C08F220/10 ,  C08F220/18 ,  C08F220/22 ,  C08F220/26 ,  C08F220/28 ,  C08F220/36 ,  C08F2220/1858 ,  C08F2220/282 ,  C08F2220/283 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/26 ,  G03F7/325 ,  G03F7/327 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0274

Abstract: Provided are an active-light-sensitive or radiation-sensitive resin composition having high DOF and excellent LWR, a pattern forming method using the composition, and a method for manufacturing an electronic device. The composition is an active-light-sensitive or radiation-sensitive resin composition containing a resin (P), in which the resin (P) includes a repeating unit (a) having a group that decomposes by the action of an acid to generate a polar group, including at least a specific repeating unit (a1) represented by General Formula (1); a repeating unit (b1) having at least one of a lactone structure, a sultone structure, or a carbonate structure; and a repeating unit (b2) having at least one of a lactone structure, a sultone structure, or a carbonate structure, which is different from the repeating unit (b1), the Ohnishi parameter of the repeating unit (b1) is larger than the Ohnishi parameter of the repeating unit (b2), and the difference between both the Ohnishi parameters is 0.85 or more.

公开(公告)号：US11073762B2

公开(公告)日：2021-07-27

申请号：US16432279

申请日：2019-06-05

Applicant: FUJIFILM Corporation

Inventor： Daisuke Asakawa ,  Akiyoshi Goto ,  Masafumi Kojima ,  Keita Kato ,  Keiyu Ou ,  Kyohei Sakita

IPC: G03F7/038 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  C09K3/00 ,  C08F220/26 ,  C07C309/17 ,  C07C381/12 ,  C07C309/12 ,  C07C309/19

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation, and (B) a resin having a repeating unit containing an acid-decomposable group, in which an Eth sensitivity of the repeating unit containing an acid-decomposable group is 5.64 or less, and which can provide very excellent roughness performance, exposure latitude, and depth of focus, particularly, in the formation of an ultrafine pattern; a photoacid generator; and an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

公开(公告)号：US10261417B2

公开(公告)日：2019-04-16

申请号：US15291538

申请日：2016-10-12

Applicant: FUJIFILM Corporation

Inventor： Akiyoshi Goto ,  Michihiro Shirakawa ,  Keita Kato ,  Fumihiro Yoshino ,  Kei Yamamoto

IPC: G03F7/004 ,  G03F7/039 ,  C07C309/06 ,  C07C381/12 ,  G03F7/16 ,  H01L21/027 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

Abstract: An active-light-sensitive or radiation-sensitive resin composition includes a resin (A) and a photoacid generator (B) capable of generating an acid upon irradiation with active light or radiation, in which the active-light-sensitive or radiation-sensitive resin composition contains at least a photoacid generator (B1) represented by the following General Formula (1) and a photoacid generator (B2) other than the photoacid generator (B1) as the photoacid generator (B).

公开(公告)号：US10234759B2

公开(公告)日：2019-03-19

申请号：US14751669

申请日：2015-06-26

Applicant: FUJIFILM Corporation

Inventor： Takeshi Kawabata ,  Hiroo Takizawa ,  Akinori Shibuya ,  Akiyoshi Goto ,  Masafumi Kojima ,  Keita Kato

IPC: G03F7/004 ,  G03F7/039 ,  C07D217/06 ,  C07D333/48 ,  C07D333/46 ,  C07D333/76 ,  C07D335/02 ,  C07D295/185 ,  C07D327/06 ,  C07C309/12 ,  C07C309/29 ,  C07C309/17 ,  C07C309/06 ,  C07C311/48 ,  C07C317/04 ,  C07C381/12 ,  C07J9/00 ,  C07J17/00 ,  C07J31/00 ,  G03F7/038

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group).

公开(公告)号：US09482958B2

公开(公告)日：2016-11-01

申请号：US14749035

申请日：2015-06-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Enomoto ,  Shinji Tarutani ,  Sou Kamimura ,  Kaoru Iwato ,  Keita Kato ,  Kana Fujii

IPC: G03F7/20 ,  G03F7/42 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  G03F7/004

CPC classification number: G03F7/325 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/422

Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.

公开(公告)号：US09086627B2

公开(公告)日：2015-07-21

申请号：US14257314

申请日：2014-04-21

Applicant: FUJIFILM Corporation

Inventor： Keita Kato ,  Michihiro Shirakawa ,  Tadahiro Odani ,  Atsushi Nakamura ,  Hidenori Takahashi ,  Kaoru Iwato

IPC: G03F7/26 ,  G03F7/09 ,  G03F7/095 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/094 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/095 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）通过使用第一树脂组合物（I）在基材上形成底部抗反射涂层的步骤，（ii）在底部抗反射涂层上形成抗蚀剂膜的步骤， 使用第二树脂组合物（II），（iii）暴露具有底部抗反射涂层和抗蚀剂膜的多层膜的步骤，以及（iv）显影底部抗反射涂层和抗蚀剂的步骤 通过使用含有机溶剂的显影剂来形成负图案的曝光的多层膜中的膜。

公开(公告)号：US20230367212A1

公开(公告)日：2023-11-16

申请号：US18355053

申请日：2023-07-19

Applicant: FUJIFILM Corporation

Inventor： Keita Kato ,  Michihiro Shirakawa ,  Satomi Takahashi ,  Tetsuya Shimizu

IPC: G03F7/039 ,  G03F7/32

CPC classification number: G03F7/039 ,  G03F7/325

Abstract: A pattern forming method including: (1) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition that contains a resin (A) which is decomposed by action of acid to increase polarity and a compound (B) which generates an acid by irradiation with an actinic ray or a radiation; (2) exposing the film; and (3) subjecting the exposed film to at least one of development or rinsing with an organic treatment liquid containing butyl acetate and a hydrocarbon having 11 or more carbon atoms, in which a content of the hydrocarbon having 11 or more carbon atoms in the organic treatment liquid is 1% by mass or more and 35% by mass or less.

公开(公告)号：US10802399B2

公开(公告)日：2020-10-13

申请号：US16110394

申请日：2018-08-23

Applicant: FUJIFILM Corporation

Inventor： Ryo Nishio ,  Masafumi Kojima ,  Akiyoshi Goto ,  Tomotaka Tsuchimura ,  Michihiro Shirakawa ,  Keita Kato

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  C07C309/12 ,  C07C309/17 ,  C07C381/12 ,  C07C309/15 ,  C07C321/28 ,  C07D213/70 ,  C07D217/08 ,  C07D327/08 ,  C07D333/46 ,  C07D335/16 ,  C07J31/00 ,  C07J9/00 ,  C07J43/00

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is capable of forming a pattern having a low LWR and is further suppressed in the collapse of the formed pattern, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a photoacid generator represented by General Formula (1) or a resin having a residue obtained by removing one hydrogen atom from the photoacid generator represented by General Formula (1).