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    Dry powder deposition apparatus
    1.
    发明授权
    Dry powder deposition apparatus 失效
    干粉沉积装置

    公开(公告)号:US6063194A

    公开(公告)日:2000-05-16

    申请号:US095246

    申请日:1998-06-10

    申请人: Eugene Samuel Poliniak ,  Hoi Cheong Steve Sun ,  Nitin Vithalbhai Desai ,  Nalin Kumar ,  William Ronald Roach ,  Lawrence Harrison Hammer ,  Peter David Southgate ,  Bawa Singh ,  Howard Christopher Rivenburg ,  Peter Zanzucchi ,  David Keller ,  Dominic Stephen Rosati ,  Aaron W. Levine ,  Bogdan Brycki

    发明人: Eugene Samuel Poliniak ,  Hoi Cheong Steve Sun ,  Nitin Vithalbhai Desai ,  Nalin Kumar ,  William Ronald Roach ,  Lawrence Harrison Hammer ,  Peter David Southgate ,  Bawa Singh ,  Howard Christopher Rivenburg ,  Peter Zanzucchi ,  David Keller ,  Dominic Stephen Rosati ,  Aaron W. Levine ,  Bogdan Brycki

    IPC分类号: A61J1/03 ,  A61J3/00 ,  A61K9/70 ,  B05B5/08 ,  B65B1/04 ,  B65B1/30 ,  B65B11/50 ,  B05B5/025

    CPC分类号: A61J3/00 ,  A61K9/70 ,  B65B1/04 ,  B65B1/30 ,  B65B11/50 ,  A61J1/035 ,  B05B5/08

    摘要: Provided is, among other things, a dry deposition apparatus for depositing grains on a substrate comprising:an electrostatic chuck having one or more collection zones, wherein the substrate is layered on the chuck for processing;a charged grain delivery apparatus for directing charged grains for electrostatic deposition on the substrate at the locations of the collection zones; andan optical detection device for quantifying the amount of grains deposited.

    摘要翻译: 尤其提供了用于在基板上沉积晶粒的干式沉积装置,包括:具有一个或多个收集区的静电卡盘,其中所述基板层叠在所述卡盘上用于加工; 带电粒子输送装置,用于在收集区的位置处引导带电粒子在基底上静电沉积; 以及用于量化沉积的晶粒量的光学检测装置。

    Methods using dry powder deposition apparatuses
    2.
    发明授权
    Methods using dry powder deposition apparatuses 失效
    使用干粉沉积设备的方法

    公开(公告)号:US06720024B2

    公开(公告)日:2004-04-13

    申请号:US10305452

    申请日:2002-11-27

    申请人: Eugene Samuel Poliniak ,  Hoi Cheong Steve Sun ,  Nitin Vithalbhai Desai ,  Nalin Kumar ,  William Ronald Roach ,  Lawrence Harrison Hammer ,  Peter David Southgate ,  Bawa Singh ,  Howard Christopher Rivenburg ,  Peter Zanzucchi ,  David Keller ,  Dominic Stephen Rosati

    发明人: Eugene Samuel Poliniak ,  Hoi Cheong Steve Sun ,  Nitin Vithalbhai Desai ,  Nalin Kumar ,  William Ronald Roach ,  Lawrence Harrison Hammer ,  Peter David Southgate ,  Bawa Singh ,  Howard Christopher Rivenburg ,  Peter Zanzucchi ,  David Keller ,  Dominic Stephen Rosati

    IPC分类号: B05D104

    CPC分类号: A61J3/00 ,  A61J1/035 ,  A61K9/70 ,  B05B5/08 ,  B65B1/04 ,  B65B1/30 ,  B65B11/50

    摘要: Provided is, among other things, a dry deposition apparatus for depositing grains on a substrate comprising: an electrostatic chuck having one or more collection zones, wherein the substrate is layered on the chuck for processing; a charged grain delivery apparatus for directing charged grains for electrostatic deposition on the substrate at the locations of the collection zones; and an optical detection device for quantifying the amount of grains deposited.

    摘要翻译: 本发明提供了一种用于在基板上沉积晶粒的干式沉积装置,包括:具有一个或多个收集区的静电卡盘,其中基板层叠在卡盘上用于加工;带电粒子输送装置,用于将带电粒子引导 在收集区的位置处的基板上的静电沉积; 和用于量化沉积的颗粒量的光学检测装置。

    Methods using dry powder deposition apparatuses
    3.
    发明授权
    Methods using dry powder deposition apparatuses 失效
    使用干粉沉积设备的方法

    公开(公告)号:US06511712B1

    公开(公告)日:2003-01-28

    申请号:US09531639

    申请日:2000-03-21

    申请人: Eugene Samuel Poliniak ,  Hoi Cheong Steve Sun ,  Nitin Vithalbhai Desai ,  Nalin Kumar ,  William Ronald Roach ,  Lawrence Harrison Hammer ,  Peter David Southgate ,  Bawa Singh ,  Howard Christopher Rivenburg ,  Peter Zanzucchi ,  David Keller ,  Dominic Stephen Rosati

    发明人: Eugene Samuel Poliniak ,  Hoi Cheong Steve Sun ,  Nitin Vithalbhai Desai ,  Nalin Kumar ,  William Ronald Roach ,  Lawrence Harrison Hammer ,  Peter David Southgate ,  Bawa Singh ,  Howard Christopher Rivenburg ,  Peter Zanzucchi ,  David Keller ,  Dominic Stephen Rosati

    IPC分类号: B05D104

    CPC分类号: A61J3/00 ,  A61J1/035 ,  A61K9/70 ,  B05B5/08 ,  B65B1/04 ,  B65B1/30 ,  B65B11/50

    摘要: Provided is a method using a dry deposition apparatus for depositing grains on a substrate comprising: an electrostatic chuck having one or more collection zones, wherein the substrate is layered on the chuck for processing; a charged grain delivery apparatus for directing charged grains for electrostatic deposition on the substrate at the locations of the collection zones; and an optical detection device for quantifying the amount of grains deposited.

    摘要翻译: 提供了一种使用用于在基板上沉积晶粒的干式沉积装置的方法,包括:具有一个或多个收集区的静电卡盘,其中基板层叠在卡盘上用于加工;带电粒子输送装置,用于引导带电粒子进行静电沉积 在收集区的位置处的基底上; 和用于量化沉积的颗粒量的光学检测装置。

    Pharmaceutical product
    4.
    发明授权
    Pharmaceutical product 失效
    药品

    公开(公告)号:US06303143B1

    公开(公告)日:2001-10-16

    申请号:US09095616

    申请日:1998-06-10

    申请人: Suggy S. Chrai ,  Ramaswamy Murari ,  Eugene Samuel Poliniak ,  Hoi Cheong (Steve) Sun ,  Nitin Vithalbhai Desai ,  Dominic Stephen Rosati ,  Nalin Kumar ,  William Ronald Roach ,  Lawrence Harrison Hammer ,  Peter David Southgate ,  Bawa Singh ,  Howard Christopher Rivenburg ,  David Keller ,  Peter John Zanzucchi ,  Aaron William Levine ,  Prince Lal

    发明人: Suggy S. Chrai ,  Ramaswamy Murari ,  Eugene Samuel Poliniak ,  Hoi Cheong (Steve) Sun ,  Nitin Vithalbhai Desai ,  Dominic Stephen Rosati ,  Nalin Kumar ,  William Ronald Roach ,  Lawrence Harrison Hammer ,  Peter David Southgate ,  Bawa Singh ,  Howard Christopher Rivenburg ,  David Keller ,  Peter John Zanzucchi ,  Aaron William Levine ,  Prince Lal

    IPC分类号: A61K948

    CPC分类号: A61J3/00 ,  A61J1/035 ,  A61K9/70 ,  B05B5/08 ,  B65B1/04 ,  B65B1/30 ,  B65B11/50 ,  G01N33/521

    摘要: A substrate is roboticaly picked up at a station and transported to a measuring station to measure the distance to a reference. The substrate is aligned to a robot before measurement. The measured substrate is then transported to a pharmaceutical or diagnostic powder/grain deposition station where the powder/grains are controllably deposited on the substrate to predetermined thicknesses over a plurality of powder/grain collection zones. The deposited powder/grains are then measured to determine the thickness and area covered by the deposited powder/grains at each collection zone. The substrate is then transported to a lamination station and each collection zone of powder/grains is welded to a cover substrate. The system remembers which collection zones are out of specification so that they can be later selectively discarded.

    摘要翻译: 机器人被机器人拾取并运送到测量站以测量到参考的距离。 在测量之前,将基板与机器人对准。 然后将测量的基底输送到药物或诊断粉末/颗粒沉积站,其中粉末/颗粒可控地沉积在基底上至多个粉末/颗粒收集区域上的预定厚度。 然后测量沉积的粉末/颗粒以确定在每个收集区域沉积的粉末/颗粒覆盖的厚度和面积。 然后将基板输送到层压站,并将粉末/颗粒的每个收集区域焊接到覆盖基板。 系统会记住哪些收集区域超出规范,以便随后可以选择性地丢弃它们。

    AC waveforms biasing for bead manipulating chucks
    5.
    发明授权
    AC waveforms biasing for bead manipulating chucks 失效

    公开(公告)号:US6149774A

    公开(公告)日:2000-11-21

    申请号:US095425

    申请日:1998-06-10

    申请人: Hoi Cheong Steve Sun ,  Eugene Samuel Poliniak ,  Dominic Stephen Rosati ,  Bawa Singh ,  Nitin Vithalbhai Desai

    发明人: Hoi Cheong Steve Sun ,  Eugene Samuel Poliniak ,  Dominic Stephen Rosati ,  Bawa Singh ,  Nitin Vithalbhai Desai

    IPC分类号: B01J19/08 ,  B01J19/00 ,  G01N35/00 ,  H02N13/00

    CPC分类号: H02N13/00 ,  B01J19/0046 ,  B01J2219/00468 ,  B01J2219/005 ,  G01N2035/00574 ,  Y10S118/02 ,  Y10T279/23

    摘要: AC waveforms biasing of bead transporter chucks and their accumulated charge sensing circuits tailored for low resistivity substrates and beads where if traditional DC quasi-static biasing potentials were used, the bead attraction potentials of the chuck would undergo rapid RC decay and cause the bead transporter chuck to stop working. Methods for selecting AC waveforms are given, including those that maximize the time average of the bead attraction potential at the bead collection zone of the bead contact surface.

    AC waveforms biasing for bead manipulating chucks
    6.
    发明授权
    AC waveforms biasing for bead manipulating chucks 失效
    交流波形偏置用于珠操纵卡盘

    公开(公告)号:US06187149B1

    公开(公告)日:2001-02-13

    申请号:US09455678

    申请日:1999-12-07

    申请人: Hoi Cheong Sun ,  Dominic Stephen Rosati ,  Eugene Samuel Poliniak ,  Bawa Singh ,  Nitin Vithalbhai Desai

    发明人: Hoi Cheong Sun ,  Dominic Stephen Rosati ,  Eugene Samuel Poliniak ,  Bawa Singh ,  Nitin Vithalbhai Desai

    IPC分类号: B01J1908

    CPC分类号: H02N13/00 ,  B01J19/0046 ,  B01J2219/00468 ,  B01J2219/005 ,  G01N2035/00574 ,  Y10S118/02 ,  Y10T279/23

    摘要: AC waveforms biasing of bead transporter chucks and their accumulated charge sensing circuits tailored for low resistivity substrates and beads where if traditional DC quasi-static biasing potentials were used, the bead attraction potentials of the chuck would undergo rapid RC decay and cause the bead transporter chuck to stop working. Methods for selecting AC waveforms are given, including those that maximize the time average of the bead attraction potential at the bead collection zone of the bead contact surface.

    摘要翻译: 针对低电阻率基板和珠子的珠子运输卡盘的交流波形偏置及其积累的电荷感应电路,如果使用传统的直流准静态偏置电位,卡盘的珠子吸引电位将经历快速的RC衰减,并导致珠子运输卡盘 停止工作 给出了选择交流波形的方法,包括使珠接触表面的珠收集区的珠吸引电位的时间平均最大化的方法。

    AC waveforms biasing for bead manipulating chucks
    7.
    发明授权
    AC waveforms biasing for bead manipulating chucks 失效
    交流波形偏置用于珠操纵卡盘

    公开(公告)号:US06475351B2

    公开(公告)日:2002-11-05

    申请号:US09772536

    申请日:2001-01-30

    申请人: Hoi Cheong Sun ,  Dominic Stephen Rosati ,  Eugene Samuel Puliniak ,  Bawa Singh ,  Nitin Vithalbhai Desai

    发明人: Hoi Cheong Sun ,  Dominic Stephen Rosati ,  Eugene Samuel Puliniak ,  Bawa Singh ,  Nitin Vithalbhai Desai

    IPC分类号: B01J1908

    CPC分类号: H02N13/00 ,  B01J19/0046 ,  B01J2219/00468 ,  B01J2219/005 ,  G01N2035/00574 ,  Y10S118/02 ,  Y10T279/23

    摘要: AC waveforms biasing of bead transporter chucks and their accumulated charge sensing circuits tailored for low resistivity substrates and beads where if traditional DC quasi-static biasing potentials were used, the bead attraction potentials of the chuck would undergo rapid RC decay and cause the bead transporter chuck to stop working. Methods for selecting AC waveforms are given, including those that maximize the time average of the bead attraction potential at the bead collection zone of the bead contact surface.

    摘要翻译: 针对低电阻率基板和珠子的珠子运输卡盘的交流波形偏置及其积累的电荷感应电路,如果使用传统的直流准静态偏置电位,卡盘的珠子吸引电位将经历快速的RC衰减,并导致珠子运输卡盘 停止工作 给出了选择交流波形的方法,包括使珠接触表面的珠收集区的珠吸引电位的时间平均最大化的方法。

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