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    Cleaning method for recycling a printing substrate by laser ablation
    1.
    发明授权
    Cleaning method for recycling a printing substrate by laser ablation 失效
    通过激光烧蚀回收印刷基板的清洁方法

    公开(公告)号：US06820552B2

    公开(公告)日：2004-11-23

    申请号：US10068519

    申请日：2002-02-06

    申请人： Eric Verschueren ,  Marc Van Damme

    发明人： Eric Verschueren ,  Marc Van Damme

    IPC分类号： B41C110

    CPC分类号： B41N3/006

    摘要： A method is disclosed for removing ink-accepting areas from a printing master by laser ablation, characterized in that the printing master comprises a substrate which comprises a support and a base layer, wherein the base layer contains a crosslinked hydrophilic binder and a metal oxide. The base layer prevents deterioration of the quality of the substrate due to the laser ablation. In a preferred embodiment, the same substrate is used in a number of consecutive printing cycles of on-press coating, on-press exposure, printing and cleaning.

    摘要翻译： 公开了一种用于通过激光烧蚀从打印母版去除油墨接受区域的方法，其特征在于，所述打印母版包括包含支撑体和基底层的基底，其中所述基底层包含交联的亲水性粘合剂和金属氧化物。 基层防止由于激光烧蚀引起的基板质量的劣化。 在优选的实施方案中，在印刷涂布，印刷机曝光，印刷和清洁的多个连续印刷循环中使用相同的基材。

    Method for making positive working printing plates from a heat mode sensitive image element
    3.
    发明授权
    Method for making positive working printing plates from a heat mode sensitive image element 有权
    从加热模式敏感图像元件制作正性印刷版的方法

    公开(公告)号：US6083663A

    公开(公告)日：2000-07-04

    申请号：US161469

    申请日：1998-09-28

    申请人： Joan Vermeersch ,  Marc Van Damme ,  Guido Hauquier ,  Eric Verschueren

    发明人： Joan Vermeersch ,  Marc Van Damme ,  Guido Hauquier ,  Eric Verschueren

    IPC分类号： B41C1/10 ,  B41M5/36 ,  G03F7/004

    CPC分类号： B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

    摘要： According to the present invention there is provided a method for making lithographic printing plates including the following steps:a) preparing a heat mode imaging element having on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution, a compound capable of converting light to heat and a top layer on the same side of the lithographic base as the first layer which top layer is unpenetrable for an alkaline developer containing SiO.sub.2 as silicate;b) exposing imagewise the heat mode imaging element to actinic light;c) developing the imagewise exposed heat mode imaging element with the alkaline developer so that the exposed areas of the top layer and the underlying areas of the first layer are dissolved and the unexposed areas of the first layer remain undissolved characterized in that said top layer includes an organic quaternary ammonium salt.

    摘要翻译： 根据本发明，提供一种制备平版印刷版的方法，包括以下步骤：a）制备具有亲水表面的平版印刷基底上的热模式成像元件，该第一层包括可溶于碱性水溶液的聚合物 能够将光转换成热的化合物和在与第一层相同的一侧上的顶层，该顶层对于含有SiO 2作为硅酸盐的碱性显影剂是不可穿透的; b）将热模式成像元件成像曝光成光化光; c）用碱性显影剂显影图像曝光的热模式成像元件，使得顶层的暴露区域和第一层的下面的区域被溶解，并且第一层的未曝光区域保持不溶解，其特征在于所述顶层包括 有机季铵盐。

    Method for postbaking a lithographic printing plate
    5.
    发明申请
    Method for postbaking a lithographic printing plate 审中-公开
    印刷平版印刷版的方法

    公开(公告)号：US20050037287A1

    公开(公告)日：2005-02-17

    申请号：US10914336

    申请日：2004-08-09

    申请人： Eric Verschueren ,  Marc Van Damme

    发明人： Eric Verschueren ,  Marc Van Damme

    IPC分类号： G03F7/26

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41N3/08 ,  G03F7/40

    摘要： A method for making a lithographic printing plate is disclosed wherein the method comprises the steps of: (i) providing a lithographic printing plate precursor comprising a photosensitive coating on a substrate having a hydrophilic surface, (ii) image-wise exposing said photosensitive coating, (iii) developing said exposed coating to form an image on said substrate and optionally gumming the plate and (iv) baking the image on the plate, wherein said baking step is carried out within a dwell-time of less than 1 minute and wherein the chemical resistance of the coating against printing liquids and press chemicals is improved. This baking step is preferably carried out by exposing the printing plate to an infrared radiation source, preferably in a dynamic configuration.

    摘要翻译： 公开了一种制备平版印刷版的方法，其中所述方法包括以下步骤：（i）提供平版印刷版前体，其包含在具有亲水表面的基底上的感光涂层，（ii）成像曝光所述光敏涂层， （iii）显影所述暴露的涂层以在所述基底上形成图像，并且任选地涂覆所述板，和（iv）在所述板上烘烤图像，其中所述烘烤步骤在小于1分钟的停留时间内进行，并且其中 提高了涂料对印刷液和印刷化学品的耐化学性。 该烘烤步骤优选通过将印刷版暴露于红外辐射源，优选以动态构型进行。

    Heat mode sensitive imaging element for making positive working printing plates
    9.
    发明授权
    Heat mode sensitive imaging element for making positive working printing plates 有权
    加热模式敏感成像元件，用于制作正性印刷版

    公开(公告)号：US06447977B2

    公开(公告)日：2002-09-10

    申请号：US09260062

    申请日：1999-03-02

    申请人： Joan Vermeersch ,  Marc Van Damme ,  Eric Verschueren ,  Guido Hauquier

    发明人： Joan Vermeersch ,  Marc Van Damme ,  Eric Verschueren ,  Guido Hauquier

    IPC分类号： G03F7039

    CPC分类号： B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S430/165

    摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate having on a lithographic base with a hydrophilic surface a first layer including a polymer soluble in an aqueous alkaline solution, and a top layer on the same side of the lithographic base as the first layer that is IR-sensitive and unpenetrable for an aqueous alkaline developer wherein said first layer and said top layer may be one and the same layer; characterized in that the surface of said element upon exposure and treatment with an aqueous alkaline developer is such that a) the contact angle between the unexposed areas of the imaging element and the aqueous alkaline developer changes for at most 6° during the first minute of contact with said developer; b) the contact angle between the exposed areas of the imaging element and the aqueous alkaline developer changes more than 15° during the first minute of contact with said developer; c) the difference in contact angle between on the one side the unexposed areas and on the other side the exposed areas of the imaging element with the aqueous alkaline solution at the onset of the measurement is not higher than 10°.

    摘要翻译： 根据本发明，提供了一种用于制造平版印刷版的热模式成像元件，该平版印刷版在具有亲水表面的光刻基底上具有包含可溶于碱性水溶液的聚合物的第一层， 作为第一层的平版印刷基底，其对于碱性水溶液的IR敏感性和不透气性，其中所述第一层和所述顶层可以是同一层; 其特征在于，当用碱性显影剂水溶液曝光和处理时，所述元件的表面是这样的：a）成像元件的未曝光区域与含水碱性显影剂之间的接触角在接触第一分钟期间变化最多6° 所述显影剂; b）在与所述显影剂接触的第一分钟期间，成像元件的暴露区域和碱性水性显影剂之间的接触角变化大于15°; c）一侧上未曝光的接触角之间的差异 在测量开始时，成像元件与碱性水溶液的曝光区域不高于10°。

    Heat mode sensitive imaging element for making positive working printing plates
    10.
    发明授权
    Heat mode sensitive imaging element for making positive working printing plates 有权
    加热模式敏感成像元件，用于制作正性印刷版

    公开(公告)号：US06489079B1

    公开(公告)日：2002-12-03

    申请号：US09391421

    申请日：1999-09-08

    申请人： Eric Verschueren ,  Joan Vermeersch ,  Marc Van Damme ,  Guido Hauquier ,  Huub Van Aert

    发明人： Eric Verschueren ,  Joan Vermeersch ,  Marc Van Damme ,  Guido Hauquier ,  Huub Van Aert

    IPC分类号： G03F7004

    CPC分类号： B41C1/1025 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/24 ,  B41N1/083 ,  Y10S430/165

    摘要： According to the present invention there is provided a heat mode imaging element for making a lithographic printing plate comprising on a lithographic base with a hydrophilic surface a first layer including a polymer, soluble in an aqueous alkaline solution and a top layer on the same side of the lithographic base as the first layer which top layer is IR-sensitive and unpenetrable for an alkaline developer wherein said first layer and said top layer may be one and the same layer; characterized in that said top layer contains at least one blockcopolymer in an amount between 0.5 and 500 mg/m2.

    摘要翻译： 根据本发明，提供一种用于制造平版印刷版的热模式成像元件，该平版印刷版包括在具有亲水表面的平版印刷基底上，第一层包括可溶于碱性水溶液的聚合物和位于同一侧上的顶层 作为第一层的光刻基底，其顶层对于碱性显影剂是IR敏感的和不可穿透的，其中所述第一层和所述顶层可以是同一层; 其特征在于所述顶层含有至少一种0.5-500mg / m 2的嵌段共聚物。