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    High-purity tungsten hexacarbonyl for solid source delivery
    1.
    发明授权
    High-purity tungsten hexacarbonyl for solid source delivery 有权

    公开(公告)号：US10526697B2

    公开(公告)日：2020-01-07

    申请号：US15556102

    申请日：2016-02-28

    Applicant: ENTEGRIS, INC.

    Inventor： Thomas H. Baum ,  Robert L. Wright, Jr. ,  Scott L. Battle ,  John M. Cleary

    IPC: C01G41/00 ,  C23C16/16

    Abstract: A solid source material is described for forming a tungsten-containing film. The solid source material is tungsten hexacarbonyl, wherein content of molybdenum is less than 1000 ppm. Such solid source material may be formed by a process including provision of particulate tungsten hexacarbonyl raw material of particles of size less than 5 mm, wherein particles of size greater than 1.4 mm are less than 15% of the particles, and wherein content of molybdenum is less than 1000 ppm, and sintering the particulate tungsten hexacarbonyl raw material at temperature below 100° C. to produce the solid source material as a sintered solid.

    SOLID PRECURSOR-BASED DELIVERY OF FLUID UTILIZING CONTROLLED SOLIDS MORPHOLOGY
    4.
    发明申请
    SOLID PRECURSOR-BASED DELIVERY OF FLUID UTILIZING CONTROLLED SOLIDS MORPHOLOGY 审中-公开
    使用固体前驱体的流体利用控制固体物质的流体

    公开(公告)号：US20140329025A1

    公开(公告)日：2014-11-06

    申请号：US14335897

    申请日：2014-07-19

    Applicant: Entegris, Inc.

    Inventor： John M. Cleary ,  Jose I. Arno ,  Bryan C. Hendrix ,  Donn Naito ,  Scott Battle ,  John N. Gregg ,  Michael J. Wodjenski ,  Chongying Xu

    IPC: C23C16/448 ,  C23C16/455 ,  C23C14/48

    CPC classification number: C23C16/4481 ,  C23C14/48 ,  C23C16/08 ,  C23C16/16 ,  C23C16/18 ,  C23C16/30 ,  C23C16/4402 ,  C23C16/45525 ,  C23C16/45544

    Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.

    Abstract translation: 挥发易于产生颗粒的源试剂的源试剂的装置和方法，其中通过蒸气发生系统的结构或加工特征抑制了这种颗粒产生或存在的相应源试剂蒸气。 这种装置和方法适用于液体和固体源试剂，特别是固体源试剂如金属卤化物，例如氯化铪。 一种具体实施方案中的源试剂由源试剂材料的多孔整体块形式构成。 本发明的装置和方法有用地用于提供用于例如原子层沉积（ALD）和离子注入的应用的源试剂蒸气。

    Solid vaporizer
    6.
    发明授权
    Solid vaporizer 有权

    公开(公告)号：US10392700B2

    公开(公告)日：2019-08-27

    申请号：US15525796

    申请日：2015-03-28

    Applicant: ENTEGRIS, INC.

    Inventor： Thomas H. Baum ,  Robert L. Wright, Jr. ,  Bryan C. Hendrix ,  Scott L. Battle ,  John M. Cleary

    IPC: C23C16/448 ,  C23C16/18

    Abstract: Vaporizers are described, suited for vaporizing a vaporizable solid source materials to form vapor for subsequent use, e.g., a deposition of metal from organometallic source material vapor on a substrate for manufacture of integrated circuitry, LEDs, photovoltaic panels, and the like. Methods are described of fabricating such vaporizers, including methods of reconfiguring up-flow vaporizers for down-flow operation to accommodate higher flow rate solid delivery of source material vapor in applications requiring same.

    SOLID PRECURSOR-BASED DELIVERY OF FLUID UTILIZING CONTROLLED SOLIDS MORPHOLOGY
    8.
    发明申请
    SOLID PRECURSOR-BASED DELIVERY OF FLUID UTILIZING CONTROLLED SOLIDS MORPHOLOGY 审中-公开
    使用固体前驱体的流体利用控制固体物质的流体

    公开(公告)号：US20170037511A1

    公开(公告)日：2017-02-09

    申请号：US15334040

    申请日：2016-10-25

    Applicant: Entegris, Inc.

    Inventor： John M. Cleary ,  Jose I. Arno ,  Bryan C. Hendrix ,  Donn Naito ,  Scott Battle ,  John N. Gregg ,  Michael J. Wodjenski ,  Chongying Xu

    IPC: C23C16/448 ,  C23C16/455 ,  C23C16/30 ,  C23C16/16 ,  C23C16/18 ,  C23C14/48 ,  C23C16/08

    CPC classification number: C23C16/4481 ,  C23C14/48 ,  C23C16/08 ,  C23C16/16 ,  C23C16/18 ,  C23C16/30 ,  C23C16/4402 ,  C23C16/45525 ,  C23C16/45544

    Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.

    Abstract translation: 挥发易于产生颗粒的源试剂的源试剂的装置和方法，其中通过蒸气发生系统的结构或加工特征抑制了这种颗粒产生或存在的相应源试剂蒸气。 这种装置和方法适用于液体和固体源试剂，特别是固体源试剂如金属卤化物，例如氯化铪。 一种具体实施方案中的源试剂由源试剂材料的多孔整体块形式构成。 本发明的装置和方法有用地用于提供用于例如原子层沉积（ALD）和离子注入的应用的源试剂蒸气。

    SOURCE REAGENT-BASED DELIVERY OF FLUID WITH HIGH MATERIAL FLUX FOR BATCH DEPOSITION
    9.
    发明申请
    SOURCE REAGENT-BASED DELIVERY OF FLUID WITH HIGH MATERIAL FLUX FOR BATCH DEPOSITION 审中-公开
    基于源试剂的高质量流体输送用于分批沉积

    公开(公告)号：US20150191819A1

    公开(公告)日：2015-07-09

    申请号：US14404633

    申请日：2013-05-31

    Applicant: ENTEGRIS, INC.

    Inventor： Bryan C. Hendrix ,  John N. Gregg ,  Scott L. Battle ,  Donn K. Naito ,  Kyle Bartosh ,  John M. Cleary ,  Sebum Cheon ,  Jordan Hodges

    IPC: C23C16/458 ,  C23C16/455

    CPC classification number: C23C16/458 ,  B01B1/005 ,  C23C16/4402 ,  C23C16/4481 ,  C23C16/455

    Abstract: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.

    Abstract translation: 公开了系统，试剂支撑盘，粒子抑制装置和方法。 在一个方面，一种系统包括蒸发器容器，该蒸发器容器具有包围内部容积的一个或多个内壁和被配置为在内部容积内垂直堆叠的多个试剂支撑盘。 多个试剂支撑托盘中的每一个构造成在内部空间内可垂直堆叠以形成一堆试剂支撑托盘。 多个试剂支撑托盘中的一个或多个配置成将通过相邻的试剂支撑托盘之间的气体流引导到试剂托盘的堆叠中，以引起气体流与特定试剂载体中的源试剂材料相互作用 在进入试剂托盘堆叠中的多个试剂载体托盘中的下一个之前，托盘。

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