Abstract:
The present disclosure provides a sample analyzer and an analyzing method thereof. The sample analyzer includes a first beam source configured to provide a first energy beam to a sample, a second beam source configured to provide a second energy beam, which is different from the first energy beam, to the sample, a reflected beam sensor disposed between the second beam source and the sample to detect a reflected beam of the second energy beam, which is reflected by one side of the sample, and a transmitted beam sensor disposed adjacent to the other side of the sample to detect a transmitted beam of the second energy beam.
Abstract:
Provided is an apparatus for analyzing a bio-material. According to an embodiment of the inventive concept, the apparatus may include a light distribution part having grooves, a reflective layer provided on the grooves, and a light emitting part configured to emit light to the light distribution part. The grooves may be recessed from a top surface of the light distribution part, and sidewalls of the grooves may be inclined with respect to the top surface of the light distribution part. The grooves may include a first groove and a second groove. A distance between the light emitting part and the second groove may be greater than that between the light emitting part and the first groove, and a bottom surface of the second groove may be disposed at a level lower than that of a bottom surface of the first groove.
Abstract:
Disclosed is a pulsed laser system. The pulsed laser system comprises a laser oscillator, a first optical amplifier on a rear end of the laser oscillator, a first optical adjustor on a rear end of the first optical amplifier, and a second optical adjustor on a rear end of the first optical adjustor. The first optical adjustor comprises a saturable absorber, an adjusting compressor on a rear end of the saturable absorber, and a first plasma mirror on a rear end of the adjusting compressor.
Abstract:
Provided is a method of doping a substrate. The method includes providing the substrate, providing a target material on the substrate, and implanting a dopant of the target material into the substrate by providing a laser beam to the target material.
Abstract:
Provided is a chromium ion-doped laser apparatus for medical application and a method of operating the laser apparatus, the apparatus including a laser beam generating unit to generate a laser beam, a converting unit to convert a wavelength of the generated laser beam to be a set wavelength, and an emitting unit to emit the laser beam having the converted wavelength to an object.
Abstract:
Provided is an ion beam treatment apparatus including the target. The ion beam treatment apparatus includes a substrate having a first surface and a second surface opposed to the first surface, and including a cone type hole decreasing in width from the first surface to the second surface to pass through the substrate, wherein an inner wall of the substrate defining the cone type hole is formed of a metal, an ion generation thin film attached to the second surface to generate ions by a laser beam incident into the cone type hole through the first surface and strengthen, and a laser that emits a laser beam to generate ions from the ion generation thin film and project the ions onto a tumor portion of a patient. The laser beam incident into the cone type hole is focused by the cone type hole and is strengthened.
Abstract:
Provided is a charged particle generation device. The charged particle generation device includes a light source unit configured to emit a laser, a target layer that receives the laser and emits charged particles, and a focusing structure disposed on the target layer to focus the laser. The focusing structure includes solid films extending on an upper surface of the target layer in a direction away from the target layer, and a pore section disposed between the solid films and having a porous structure. The focusing structure includes a material having a higher atomic number than carbon.
Abstract:
Provided is an ion beam treatment apparatus. The ion beam treatment apparatus includes a laser generation unit, a dividing part dividing a pulse laser beam generated in the laser generation unit into a first laser beam and a second laser beam, a first target part receiving the first laser beam from the dividing part to generate a first ion beam, a second target part receiving the second laser beam from the dividing part to generate a second ion beam, a first path adjusting part adjusting a path of the first ion beam to irradiate the first ion beam to a treated patient, and a second path adjusting part adjusting a path of the second ion beam to irradiate the second ion beam to the treated patient.
Abstract:
Provided is a method for measuring a depth profile of a particle beam, the method including providing first sensors in a first direction in auditory organs of a human body, providing second sensors in a second direction that intersects with the first direction on a top of a head and in a mouth of the human body, providing a particle beam into the head of the human body, detecting an acoustic signal generated by the particle beam through the first and second sensors, and calculating a depth profile of the first and second directions of the particle beam corresponding to a Bragg peak position of the particle beam in the head using the acoustic signal.
Abstract:
Provided is a therapy method using an ion beam, including injecting the ion beam to a target spot in a body of an examinee, measuring a Bragg peak spot of the ion beam injected into the body of the examinee, and adjusting the target spot using the measured Bragg peak spot, wherein the measuring of the Bragg peak spot comprises measuring a spot of a microbubble generated inside the body of the examinee.