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公开(公告)号：US08945799B2
公开(公告)日：2015-02-03
申请号：US13805460
申请日：2011-06-29
申请人： Daiki Taneichi , Takashi Kozeki , Akihiro Koide
发明人： Daiki Taneichi , Takashi Kozeki , Akihiro Koide
IPC分类号： G03F1/00 , G03F1/62 , G03F1/64 , C09J135/06 , C08L23/20 , C09J153/02
CPC分类号： G03F1/62 , C08L23/20 , C08L57/02 , C08L91/06 , C08L2205/02 , C09J135/06 , C09J153/025 , G03F1/64
摘要： A pellicle which has a mask adhesive layer that can be plastic-deformed readily particularly at a temperature at which exposure to light is carried out, rarely provides a residue of an adhesive agent upon the removal of the mask adhesive layer from a mask and has good handling properties, and which can prevent the position gap of a pattern. The pellicle comprises a pellicle frame, a pellicle membrane and a mask adhesive layer containing a mask adhesive agent. The mask adhesive agent comprises 100 parts by mass of a thermoplastic elastomer (A) having a tan δ peak temperature of −20 to 30 DEG C and 20 to 150 parts by mass of an adhesiveness-imparting resin (B).
摘要翻译： 具有掩模粘合剂层的防护薄膜，特别是在进行曝光的温度下易于塑性变形，在从掩模上去除掩模粘合剂层时很少提供粘合剂残留物，并且具有良好的 处理性能，并且可以防止图案的位置间隙。 防护薄膜组件包括防护薄膜框架，防护薄膜和含有掩模粘合剂的掩模粘合剂层。 掩模粘合剂包含100质量份tanδ峰值温度为-20〜30℃的热塑性弹性体（A）和20〜150质量份粘合性赋予树脂（B）。
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公开(公告)号：US20130101927A1
公开(公告)日：2013-04-25
申请号：US13805460
申请日：2011-06-29
申请人： Daiki Taneichi , Takashi Kozeki , Akihiro Koide
发明人： Daiki Taneichi , Takashi Kozeki , Akihiro Koide
IPC分类号： G03F1/62
CPC分类号： G03F1/62 , C08L23/20 , C08L57/02 , C08L91/06 , C08L2205/02 , C09J135/06 , C09J153/025 , G03F1/64
摘要： A pellicle which has a mask adhesive layer that can be plastic-deformed readily particularly at a temperature at which exposure to light is carried out, rarely provides a residue of an adhesive agent upon the removal of the mask adhesive layer from a mask and has good handling properties, and which can prevent the position gap of a pattern. The pellicle comprises a pellicle frame, a pellicle membrane and a mask adhesive layer containing a mask adhesive agent. The mask adhesive agent comprises 100 parts by mass of a thermoplastic elastomer (A) having a tan δ peak temperature of −20 to 30 DEG C and 20 to 150 parts by mass of an adhesiveness-imparting resin (B).
摘要翻译： 具有掩模粘合剂层的防护薄膜，特别是在进行曝光的温度下易于塑性变形，在从掩模上去除掩模粘合剂层时很少提供粘合剂残留物，并且具有良好的 处理性能，并且可以防止图案的位置间隙。 防护薄膜组件包括防护薄膜框架，防护薄膜和含有掩模粘合剂的掩模粘合剂层。 面膜粘合剂包括100质量份具有-20至30℃的tanδ峰值温度的热塑性弹性体（A）和20至150质量份的粘合性赋予树脂（B）。
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公开(公告)号：US08815476B2
公开(公告)日：2014-08-26
申请号：US13805724
申请日：2011-06-29
申请人： Takashi Kozeki
发明人： Takashi Kozeki
IPC分类号： G03F1/62
CPC分类号： G03F1/62
摘要： The purpose of the present invention is to produce a pellicle film, which is suppressed in light deterioration or photodecomposition due to lithography light exposure, by simpler processes. Specifically disclosed is a pellicle film for lithography containing an amorphous fluoropolymer, which is characterized by containing 5-800 ppm by mass of a fluorine-based solvent. Also specifically disclosed is a method for producing a pellicle film, which comprises: a step A wherein a coating film of a solution that contains an amorphous fluoropolymer and a fluorine-based solvent is formed; and a step B wherein the fluorine-based solvent in the coating film is removed. The method for producing a pellicle film is characterized in that 5-800 ppm by mass of the fluorine-based solvent is caused to remain in the coating film in the step B.
摘要翻译： 本发明的目的是通过更简单的工艺来制造防止由光刻曝光引起的光劣化或光分解的防护薄膜。 具体公开了含有无定形含氟聚合物的光刻用防护薄膜，其特征在于含有5-800质量ppm的氟系溶剂。 还具体公开了一种防护薄膜的制造方法，其特征在于，包括：形成含有无定形含氟聚合物和氟系溶剂的溶液的涂膜的工序A， 以及除去涂膜中的氟系溶剂的工序B。 防护薄膜的制造方法的特征在于，在步骤B中，将5-800质量ppm的氟系溶剂残留在涂膜中。
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公开(公告)号：US20120122025A1
公开(公告)日：2012-05-17
申请号：US13383891
申请日：2010-07-06
申请人： Shuichi Murakami , Takashi Kozeki
发明人： Shuichi Murakami , Takashi Kozeki
CPC分类号： G03F1/64 , Y10T428/265 , Y10T428/31511 , Y10T428/31529
摘要： Provided is a pellicle that has appropriate membrane strength, high resistance to chemicals, and a low degree of sulfate ion generation and outgassing. A provided pellicle frame supports the outer rim of a pellicle membrane, and an epoxy resin coating is formed on the surface of the pellicle frame. In the infrared absorption spectrum of said epoxy resin coating, the ratio of the absorbance of a peak in the range between 1450 cm−1 and 1550 cm−1 to the absorbance of a peak in the range between 1200 cm−1 and 1275 cm−1 is at least 0.5 and at most 3; also, the ratio of the absorbance of a peak in the range between 1450 cm−1 and 1550 cm−1 to the absorbance of a peak in the range between 905 cm−1 and 930 cm−1 is at least 1 and less than 7.
摘要翻译： 提供了具有合适的膜强度，高耐化学性和低硫酸根离子产生和脱气的防护薄膜组件。 提供的防护薄膜框架支撑防护薄膜组件的外缘，并且在防护薄膜组件框架的表面上形成环氧树脂涂层。 在所述环氧树脂涂层的红外吸收光谱中，1450cm -1和1550cm -1之间的峰的吸光度与在1200cm -1和1275cm -1之间范围内的峰的吸光度的比率， 1至少为0.5，最多为3; 另外，在1450cm -1与1550cm -1之间的峰的吸光度与在905cm -1和930cm -1之间的峰的吸光度的比率也至少为1且小于7 。
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公开(公告)号：US20130095417A1
公开(公告)日：2013-04-18
申请号：US13805724
申请日：2011-06-29
申请人： Takashi Kozeki
发明人： Takashi Kozeki
IPC分类号： G03F1/62
CPC分类号： G03F1/62
摘要： The purpose of the present invention is to produce a pellicle film, which is suppressed in light deterioration or photodecomposition due to lithography light exposure, by simpler processes. Specifically disclosed is a pellicle film for lithography containing an amorphous fluoropolymer, which is characterized by containing 5-800 ppm by mass of a fluorine-based solvent. Also specifically disclosed is a method for producing a pellicle film, which comprises: a step A wherein a coating film of a solution that contains an amorphous fluoropolymer and a fluorine-based solvent is formed; and a step B wherein the fluorine-based solvent in the coating film is removed. The method for producing a pellicle film is characterized in that 5-800 ppm by mass of the fluorine-based solvent is caused to remain in the coating film in the step B.
摘要翻译： 本发明的目的是通过更简单的工艺来制造防止由光刻曝光引起的光劣化或光分解的防护薄膜。 具体公开了含有无定形含氟聚合物的光刻用防护薄膜，其特征在于含有5-800质量ppm的氟系溶剂。 还具体公开了一种防护薄膜的制造方法，其特征在于，包括：形成含有无定形含氟聚合物和氟系溶剂的溶液的涂膜的工序A， 以及除去涂膜中的氟系溶剂的工序B。 防护薄膜的制造方法的特征在于，在步骤B中，将5-800质量ppm的氟系溶剂残留在涂膜中。
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公开(公告)号：US20120202144A1
公开(公告)日：2012-08-09
申请号：US13500513
申请日：2010-10-06
申请人： Shuichi Murakami , Takashi Kozeki , Minehiro Mori
发明人： Shuichi Murakami , Takashi Kozeki , Minehiro Mori
IPC分类号： G03F1/62 , C09J123/20
CPC分类号： C09J123/10 , C08L23/10 , C08L23/142 , C08L23/145 , C08L23/18 , C08L2205/02 , C08L2666/06 , C08L2666/08 , C09J153/025 , G03F1/64
摘要： Disclosed is a pellicle having a mask adhesive layer having appropriate softness, having a small adhesive residue after being peeled off from a mask, and having good handling characteristics; and a pellicle for preventing position deviation of patterns, in particular in double patterning. The pellicle of the present invention includes a pellicle frame, a pellicle membrane disposed on one end surface of the pellicle frame, and a mask adhesive layer disposed on other end surface of the pellicle frame; wherein the mask adhesive layer includes 35 to 170 weight parts of a hardness adjuster (B) containing a polypropylene (b1) and a propylene based elastomer (b2) per 100 weight parts of a styrene resin (A); and in an electron microscopic photograph of the mask adhesive layer, a phase-separated structure of a continuous phase of the styrene resin (A) and a discontinuous phase of the hardness adjuster (B) is observed.
摘要翻译： 公开了一种具有适当柔软度的掩模粘合剂层的防护薄膜组件，在从掩模剥离之后具有小的粘合剂残留物，并且具有良好的处理特性; 以及用于防止图案的位置偏移的防护薄片，特别是在双重图案化中。 本发明的防护薄膜组件包括防护薄膜组件框架，设置在防护膜框架的一个端面上的防护薄膜组件和设置在防护薄膜组件框架的另一个端面上的掩模粘合剂层; 其中，所述掩模粘合剂层每100重量份苯乙烯树脂（A）含有35〜170重量份含有聚丙烯（b1）和丙烯系弹性体（b2）的硬度调节剂（B） 并且在掩模粘合剂层的电子显微镜照片中，观察到苯乙烯树脂（A）的连续相的相分离结构和硬度调节剂（B）的不连续相。
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公开(公告)号：US20060115741A1
公开(公告)日：2006-06-01
申请号：US10534554
申请日：2003-11-13
申请人： Takashi Kozeki , Hiroaki Nakagawa
发明人： Takashi Kozeki , Hiroaki Nakagawa
IPC分类号： G03F1/00
CPC分类号： G03F1/62
摘要： A pellicle which can prevent the formation of foreign-matter deposits on a photo-mask during laser beam irradiation or storage and keep a high pattern accuracy for an extended period of time even when an exposure is made using a KrF or ArF excimer laser beam by removing deposit-causing materials from the pellicle itself in advance. During a pellicle producing process, a component member used or a completed product is heated or placed under pressure to thereby remove in advance substances produced from the component member used or the completed product.
摘要翻译： 即使在使用KrF或ArF准分子激光束进行曝光的情况下，也可以防止在激光束照射或存储期间在光掩模上形成异物沉积物并且在长时间内保持高图案精度的防护薄膜组件 提前从防护薄膜组件本身去除沉积物。 在防护薄膜组件的制造过程中，使用的部件或完成的产品在加压下被加热或放置，从而预先从所使用的部件或完成的产品中产生的物质去除。
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公开(公告)号：US08685598B2
公开(公告)日：2014-04-01
申请号：US13500513
申请日：2010-10-06
申请人： Shuichi Murakami , Takashi Kozeki , Minehiro Mori
发明人： Shuichi Murakami , Takashi Kozeki , Minehiro Mori
CPC分类号： C09J123/10 , C08L23/10 , C08L23/142 , C08L23/145 , C08L23/18 , C08L2205/02 , C08L2666/06 , C08L2666/08 , C09J153/025 , G03F1/64
摘要： Disclosed is a pellicle having a mask adhesive layer having appropriate softness, having a small adhesive residue after being peeled off from a mask, and having good handling characteristics; and a pellicle for preventing position deviation of patterns, in particular in double patterning. The pellicle of the present invention includes a pellicle frame, a pellicle membrane disposed on one end surface of the pellicle frame, and a mask adhesive layer disposed on other end surface of the pellicle frame; wherein the mask adhesive layer includes 35 to 170 weight parts of a hardness adjuster (B) containing a polypropylene (b1) and a propylene based elastomer (b2) per 100 weight parts of a styrene resin (A); and in an electron microscopic photograph of the mask adhesive layer, a phase-separated structure of a continuous phase of the styrene resin (A) and a discontinuous phase of the hardness adjuster (B) is observed.
摘要翻译： 公开了一种具有适当柔软度的掩模粘合剂层的防护薄膜组件，在从掩模剥离之后具有小的粘合剂残留物，并且具有良好的处理特性; 以及用于防止图案的位置偏移的防护薄片，特别是在双重图案化中。 本发明的防护薄膜组件包括防护薄膜组件框架，设置在防护膜框架的一个端面上的防护薄膜组件和设置在防护薄膜组件框架的另一个端面上的掩模粘合剂层; 其中，所述掩模粘合剂层每100重量份苯乙烯树脂（A）含有35〜170重量份含有聚丙烯（b1）和丙烯系弹性体（b2）的硬度调节剂（B） 并且在掩模粘合剂层的电子显微镜照片中，观察到苯乙烯树脂（A）的连续相的相分离结构和硬度调节剂（B）的不连续相。
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公开(公告)号：US08507158B2
公开(公告)日：2013-08-13
申请号：US13383891
申请日：2010-07-06
申请人： Shuichi Murakami , Takashi Kozeki
发明人： Shuichi Murakami , Takashi Kozeki
IPC分类号： G03F1/00
CPC分类号： G03F1/64 , Y10T428/265 , Y10T428/31511 , Y10T428/31529
摘要： Provided is a pellicle that has appropriate membrane strength, high resistance to chemicals, and a low degree of sulfate ion generation and outgassing. A provided pellicle frame supports the outer rim of a pellicle membrane, and an epoxy resin coating is formed on the surface of the pellicle frame. In the infrared absorption spectrum of said epoxy resin coating, the ratio of the absorbance of a peak in the range between 1450 cm−1 and 1550 cm−1 to the absorbance of a peak in the range between 1200 cm−1 and 1275 cm−1 is at least 0.5 and at most 3; also, the ratio of the absorbance of a peak in the range between 1450 cm−1 and 1550 cm−1 to the absorbance of a peak in the range between 905 cm−1 and 930 cm−1 is at least 1 and less than 7.
摘要翻译： 提供了具有合适的膜强度，高耐化学性和低硫酸根离子产生和脱气的防护薄膜组件。 提供的防护薄膜框架支撑防护薄膜组件的外缘，并且在防护薄膜组件框架的表面上形成环氧树脂涂层。 在所述环氧树脂涂层的红外吸收光谱中，1450cm -1和1550cm -1之间的峰的吸光度与在1200cm -1和1275cm -1之间范围内的峰的吸光度的比率， 1至少为0.5，最多为3; 另外，在1450cm -1与1550cm -1之间的峰的吸光度与在905cm -1和930cm -1之间的峰的吸光度的比率也至少为1且小于7 。
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公开(公告)号：US20050020761A1
公开(公告)日：2005-01-27
申请号：US10491497
申请日：2002-10-03
申请人： Shiro Arai , Katushi Momose , Hiroaki Nakagawa , Takashi Kozeki
发明人： Shiro Arai , Katushi Momose , Hiroaki Nakagawa , Takashi Kozeki
IPC分类号： B65D85/86 , C08J5/00 , C08K3/24 , C08K5/09 , C08L51/00 , C08L51/04 , C08L71/02 , C08L101/00 , C08L101/14 , C08K3/00
摘要： A small account of polyvalent metal compound is added to an antistatic resin composition comprising a hydrophilic thermoplastic polymer. A shaped product of the resin composition retains permanent antistatic property and a beautiful appearance due to not only freeness from attachment of dust, etc., but also suppression of haze or discoloration caused by attachment of a gaseous soiling substance, such as an acidic and a basic gas in the air. The resin composition also provides a shaped container product free from occurrence of attached substance on an electronic part or optical part even when the part is subjected to irradiation with ultraviolet light after storage in the container product.
摘要翻译： 向包含亲水性热塑性聚合物的抗静电树脂组合物中加入少量多价金属化合物。 树脂组合物的成形制品由于不仅由粉尘等附着而使其具有永久的抗静电性和美丽的外观，而且还抑制了通过附着气态污染物质如酸性和酸性物质引起的雾度或变色 空气中的基本气体。 即使在容器产品中储存之后，当紫外线照射该部件时，该树脂组合物还可以在电子部件或光学部件上提供不含附着物的成形容器产品。
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