公开(公告)号：US20160246182A1

公开(公告)日：2016-08-25

申请号：US14993076

申请日：2016-01-11

申请人： CARL ZEISS SMT GmbH

发明人： Rolf FREIMANN ,  Ulrich WEGMANN

IPC分类号： G03F7/20 ,  G01N21/956 ,  G01B11/00

CPC分类号： G03F7/70491 ,  G01B9/02018 ,  G01B9/02028 ,  G01B9/02065 ,  G01B9/0209 ,  G01B11/002 ,  G01N21/95607 ,  G01N2021/95615 ,  G01N2021/95676 ,  G03F7/70 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/7085

摘要： An optical imaging device, including an imaging unit and a measuring device. The imaging unit includes a first optical element group having at least one first optical element, which contributes to the imaging. The measuring device determines an imaging error, which occurs during the imaging, using a capturing signal. The measuring device includes a measurement light source, a second optical element group and a capturing unit. The measurement light source emits at least one measurement light bundle, The second optical element group includes an optical reference element and a second optical element, which guide the measurement light bundle onto the capturing unit, to generate the capturing signal. Each second optical element has a defined spatial relationship with a respective one of the first optical elements, The second optical elements differ from the first optical elements. The measuring device determines the imaging error with the capturing signal.

摘要翻译： 一种光学成像装置，包括成像单元和测量装置。 成像单元包括具有至少一个有助于成像的第一光学元件的第一光学元件组。 测量装置使用捕获信号确定在成像期间发生的成像误差。 测量装置包括测量光源，第二光学元件组和捕获单元。 测量光源发射至少一个测量光束。第二光学元件组包括将测量光束引导到捕获单元上的光学参考元件和第二光学元件，以产生捕获信号。 每个第二光学元件与第一光学元件中的相应的一个具有限定的空间关系。第二光学元件与第一光学元件不同。 测量装置使用捕获信号确定成像误差。

公开(公告)号：US20190212226A1

公开(公告)日：2019-07-11

申请号：US16242480

申请日：2019-01-08

申请人： Carl Zeiss SMT GmbH

发明人： Ulrich WEGMANN

IPC分类号： G01M11/02 ,  G01J9/02 ,  G03F7/20

CPC分类号： G01M11/0264 ,  G01J9/0215 ,  G01J2009/0219 ,  G01M11/0271 ,  G03F7/706

摘要： The imaging quality of an optical imaging system is interferometrically measured. A wavefront measurement has a first imaging scale β1 in a first direction and a second imaging scale β2 in a second, perpendicular direction. The second imaging scale differs from the first imaging scale by a scale ratio (β1/β2)≠1 (anamorphic imaging system). A first measurement structure (MS1) on a first structure carrier arranged on the object side of the imaging system has a two-dimensional mask structure suitable for shaping the coherence of measurement radiation. A second measurement structure (MS2) on a second structure carrier arranged on the image side of the imaging system has a diffraction grating. The first and second measurement structures are mutually adapted, taking account of the scale ratio so that an interference pattern arises upon imaging the first measurement structure onto the second measurement structure using the anamorphic imaging system.

公开(公告)号：US20140016108A1

公开(公告)日：2014-01-16

申请号：US14027776

申请日：2013-09-16

申请人： CARL ZEISS SMT GmbH

发明人： Rolf FREIMANN ,  Ulrich WEGMANN

IPC分类号： G03F7/20

CPC分类号： G03F7/70491 ,  G01B9/02018 ,  G01B9/02028 ,  G01B9/02065 ,  G01B9/0209 ,  G01B11/002 ,  G01N21/95607 ,  G01N2021/95615 ,  G01N2021/95676 ,  G03F7/70 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/7085

摘要： An optical imaging device, including an imaging unit and a measuring device. The imaging unit includes a first optical element group having at least one first optical element, which contributes to the imaging. The measuring device determines an imaging error, which occurs during the imaging, using a capturing signal. The measuring device includes a measurement light source, a second optical element group and a capturing unit. The measurement light source emits at least one measurement light bundle, The second optical element group includes an optical reference element and a second optical element, which guide the measurement light bundle onto the capturing unit, to generate the capturing signal. Each second optical element has a defined spatial relationship with a respective one of the first optical elements, The second optical elements differ from the first optical elements. The measuring device determines the imaging error with the capturing signal.

摘要翻译： 一种光学成像装置，包括成像单元和测量装置。 成像单元包括具有至少一个有助于成像的第一光学元件的第一光学元件组。 测量装置使用捕获信号确定在成像期间发生的成像误差。 测量装置包括测量光源，第二光学元件组和捕获单元。 测量光源发射至少一个测量光束。第二光学元件组包括将测量光束引导到捕获单元上的光学参考元件和第二光学元件，以产生捕获信号。 每个第二光学元件与第一光学元件中的相应的一个具有限定的空间关系。第二光学元件与第一光学元件不同。 测量装置使用捕获信号确定成像误差。

公开(公告)号：US20180087891A1

公开(公告)日：2018-03-29

申请号：US15818080

申请日：2017-11-20

申请人： Carl Zeiss SMT GmbH

发明人： Ulrich WEGMANN ,  Hans-Michael STIEPAN ,  Jochen HETZLER

IPC分类号： G01B9/02 ,  G01B11/24

CPC分类号： G01B9/02034 ,  G01B11/24 ,  G01M11/0264 ,  G03F7/706 ,  G03F7/7085

摘要： A measurement arrangement and a method for measuring a wavefront aberration of an imaging optical system (10) of a microlithographic projection exposure apparatus. The method includes separate measurement of respective wavefront aberrations of different partial arrangements (M1; M2; M3; M1, M3) of the optical elements.

公开(公告)号：US20130271749A1

公开(公告)日：2013-10-17

申请号：US13913212

申请日：2013-06-07

申请人： CARL ZEISS SMT GmbH

发明人： Thomas KORB ,  Christian HETTICH ,  Michael LAYH ,  Ulrich WEGMANN ,  Karl-Heinz SCHUSTER ,  Matthias MANGER

IPC分类号： G01M11/02

CPC分类号： G01N21/94 ,  G01M11/02 ,  G01N21/9501 ,  G03F7/70483 ,  G03F7/708 ,  G03F7/7085

摘要： First test beams (464a-d), after passing through an optical system on optical paths that differ in pairs, impinge on a first measurement region (461) at angles that differ in pairs with respect to the measurement plane. Second test beams (465a-d), after passing through the optical system on optical paths that differ in pairs, impinge on a second measurement region (462) at angles that differ in pairs, wherein the second region differs from the first. A value of a first measurement variable of the test beam at the first region is detected for each of the first test beams, and comparably for a second measurement variable at the second region for the second test beams. Impingement regions (467a-d) on reference surface(s) (466, 471) of the optical system are determined and a spatial diagnosis distribution of a property of the reference surface(s) for each test beam is calculated.

摘要翻译： 第一测试光束（464a-d）在通过成对不同的光路上的光学系统之后，以相对于测量平面成对不同的角度照射在第一测量区域（461）上。 第二测试光束（465a-d）在穿过成对不同的光路上的光学系统之后，以成对不同的角度撞击第二测量区域（462），其中第二区域与第一区域不同。 对于第一测试光束中的每一个检测第一区域处的测试光束的第一测量变量的值，并且针对第二测试光束的第二测量变量的第二测量变量进行比较。 确定光学系统的参考表面（466,471）上的冲击区域（467a-d），并且计算每个测试光束的参考表面的属性的空间诊断分布。