-
公开(公告)号：US12023850B2
公开(公告)日：2024-07-02
申请号：US17859366
申请日：2022-07-07
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tomokazu Taki , Takafumi Miyaharu
CPC classification number: B29C59/002 , B29C59/02 , B29C2037/906
Abstract: A position detection apparatus comprises an obtaining unit that obtains an image of a moiré that occurs due to first and second diffraction gratings overlapping; and a processor configured to perform a periodic analysis of a luminance distribution of the obtained image of the moiré, obtain a phase measurement value of the luminance distribution, and obtain a relative positioning between the first and second diffraction gratings, wherein the processor determines a phase shift amount for making the obtained phase measurement value be a value outside of a predetermined range including a discontinuous part of the phase, and performs a phase shift to shift the obtained phase measurement value by the determined phase shift amount, and obtains the relative positioning based on the phase-shifted phase measurement value.
-
公开(公告)号：US11204548B2
公开(公告)日：2021-12-21
申请号：US15823338
申请日：2017-11-27
Applicant: CANON KABUSHIKI KAISHA
Inventor： Kazuhiro Sato , Takafumi Miyaharu
Abstract: An imprint apparatus forms a pattern of an imprint material in a shot area of the substrate using the mold, and includes a heating mechanism that changes a shape of the substrate by irradiating the shot area of the substrate with light, wherein the heating mechanism includes a plurality of optical modulators that forms an illuminance distribution in the shot area of the substrate, and light beams from the plurality of optical modulators illuminate mutually different areas of the shot area.
-
公开(公告)号：US12153343B2
公开(公告)日：2024-11-26
申请号：US18082178
申请日：2022-12-15
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tatsuya Hayashi , Takafumi Miyaharu
IPC: G03F7/00
Abstract: An imprint method of curing an imprint material in a state in which the imprint material on a substrate and a mold are in contact with each other, includes curing the imprint material by applying first light to the imprint material using a first light source and applying second light to the imprint material using a second light source, thereby forming a plurality of patterns made of a cured product of the imprint material. An intensity distribution of the second light applied to the imprint material by the second light source in the curing is adjusted such that a distribution of evaluation values of the plurality of patterns formed through the curing satisfies a target distribution.
-
4.发明授权公开(公告)号：US09595447B2
公开(公告)日：2017-03-14
申请号：US14621238
申请日：2015-02-12
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hiroshi Inada , Kazuhiko Mishima , Takafumi Miyaharu
IPC: G06K9/00 , H01L21/304 , G03F9/00 , G06T7/00
CPC classification number: H01L21/304 , G03F9/7038 , G03F9/7076 , G06K9/00 , G06T7/0004 , G06T2207/30148
Abstract: This disclosure provides a detection apparatus configured to detect a moire pattern generated by grid patterns having grid pitches different from each other including: an image-pickup unit configured to pick up an image of the moire pattern; an imaging optical system configured to cause the image-pickup unit to image the moire pattern; and a processing unit configured to process an image-pickup result of the moire pattern imaged by the image-pickup unit, wherein a mark including a plurality of patterns having a width not larger than the resolving power of the imaging optical system arranged in a measuring direction and changed in duty ratio between the widths and intervals of the plurality of patterns is imaged by the image-pickup unit, and the processing unit evaluates the detection apparatus by processing the image-pickup result of the mark picked up by the image-pickup unit.
Abstract translation: 本公开提供一种检测装置，其被配置为检测由具有彼此不同的网格间距的网格图案生成的莫尔图案，包括：图像拾取单元，被配置为拾取莫尔图案的图像; 成像光学系统，其被配置为使所述图像拾取单元对所述波纹图案进行成像; 以及处理单元，被配置为处理由图像拾取单元成像的莫尔图案的图像拾取结果，其中，包括具有不大于被配置在测量中的成像光学系统的分辨率的宽度的多个图案的标记 多个图案的宽度和间隔之间的方向和占空比的改变由图像拾取单元成像，并且处理单元通过处理由图像拾取拾取的标记的图像拾取结果来评估检测装置 单元。
-
公开(公告)号：US20160363875A1
公开(公告)日：2016-12-15
申请号：US15177128
申请日：2016-06-08
Applicant: CANON KABUSHIKI KAISHA
Inventor： Ken-ichiro Shinoda , Shunsuke Ota , Takafumi Miyaharu
CPC classification number: G03F9/7042 , G03F7/0002
Abstract: An imprint apparatus which forms a pattern of an imprint material in a region to be processed on a substrate by using a mold includes an observing unit configured to include a light source which emits first light and a receiving unit which receives the first light which is emitted from the light source, is reflected by the region to be processed, and passes through the mold; a deforming unit configured to thermally deform the region to be processed by illumination with second light; and a combining member which combines the first light of the light source and the second light from the deforming unit and guides the first light and the second light to the region to be processed.
Abstract translation: 通过使用模具在基板上在待处理的区域中形成压印材料的图案的压印装置包括：观察单元，被配置为包括发射第一光的光源和接收发射的第一光的接收单元; 由光源反射，被加工区域反射，通过模具; 变形单元，其被配置为通过用第二光照明来使所述待处理区域热变形; 以及组合部件，其将光源的第一光和来自变形部的第二光组合并将第一光和第二光引导到被处理区域。
-
Patent Agency Ranking
公开(公告)号：US20230031701A1
公开(公告)日：2023-02-02
申请号：US17859366
申请日：2022-07-07
Applicant: CANON KABUSHIKI KAISHA
Inventor： Tomokazu Taki , Takafumi Miyaharu
Abstract: A position detection apparatus comprises an obtaining unit that obtains an image of a moiré that occurs due to first and second diffraction gratings overlapping; and a processor configured to perform a periodic analysis of a luminance distribution of the obtained image of the moiré, obtain a phase measurement value of the luminance distribution, and obtain a relative positioning between the first and second diffraction gratings, wherein the processor determines a phase shift amount for making the obtained phase measurement value be a value outside of a predetermined range including a discontinuous part of the phase, and performs a phase shift to shift the obtained phase measurement value by the determined phase shift amount, and obtains the relative positioning based on the phase-shifted phase measurement value.
-
公开(公告)号：US20200019066A1
公开(公告)日：2020-01-16
申请号：US16508616
申请日：2019-07-11
Applicant: CANON KABUSHIKI KAISHA
Inventor： Takafumi Miyaharu
Abstract: An exposure apparatus comprises a projection optical system for projecting a pattern of a mask, a substrate stage for holding a substrate, and a measurement device installed on the substrate stage, including a plate on which a substrate-side mark is formed, and a sensor for detecting light transmitted through a mask-side mark, the projection optical system, and the substrate-side mark, and configured to measure an amount of the light detected by the sensor. The substrate-side mark includes a central mark arranged in a center of a sensitive region of the sensor, and a peripheral mark arranged in a periphery of the central mark. The central mark is used in measurement of the light amount, including driving the substrate stage in a direction parallel to an optical axis of the projection optical system.
-
公开(公告)号：US20180149969A1
公开(公告)日：2018-05-31
申请号：US15823338
申请日：2017-11-27
Applicant: CANON KABUSHIKI KAISHA
Inventor： Kazuhiro Sato , Takafumi Miyaharu
CPC classification number: G03F7/0002 , B29C37/0028 , B29C2037/0046 , B82Y40/00
Abstract: An imprint apparatus forms a pattern of an imprint material in a shot area of the substrate using the mold, and includes a heating mechanism that changes a shape of the substrate by irradiating the shot area of the substrate with light, wherein the heating mechanism includes a plurality of optical modulators that forms an illuminance distribution in the shot area of the substrate, and light beams from the plurality of optical modulators illuminate mutually different areas of the shot area.
-
公开(公告)号：US11656547B2
公开(公告)日：2023-05-23
申请号：US16824487
申请日：2020-03-19
Applicant: CANON KABUSHIKI KAISHA
Inventor： Naoki Murasato , Takafumi Miyaharu
CPC classification number: G03F7/0002 , B29C33/424 , B29C2033/426
Abstract: An imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold including a pattern formation area, the imprint apparatus includes a detection unit configured to detect a contact state of the imprint material on the substrate with the mold, a light modulation element configured to control an intensity distribution of irradiation light irradiating the substrate, and a control unit configured to control a timing of irradiating the substrate with the irradiation light having the intensity distribution controlled by the light modulation element based on a detection result of the detection unit.
-
10.发明申请公开(公告)号：US20170329217A1
公开(公告)日：2017-11-16
申请号：US15583822
申请日：2017-05-01
Applicant: CANON KABUSHIKI KAISHA
Inventor： Ken Minoda , Takafumi Miyaharu
CPC classification number: G03F7/0002 , G01D5/38 , G03F9/7042 , G05B19/19 , G05B2219/37558
Abstract: A position detector includes a detection unit configured to detect light from a first diffraction grating including a first pattern disposed in a first direction, and light from a second diffraction grating including a second pattern disposed in the first direction, and a control unit configured to obtain a relative position between the first and the second diffraction gratings based on the light detected by the detection unit. The position detector has a third pattern formed in a second direction different from the first direction at edges of the first pattern of the first diffraction grating, the third pattern has a width smaller than a width of the first pattern of the first diffraction grating.
-
-
-
-
-
-
-
-
-
Search Results
22
records
(took 0.018 seconds)
