公开(公告)号：US09472639B2

公开(公告)日：2016-10-18

申请号：US13945617

申请日：2013-07-18

Applicant: CANON KABUSHIKI KAISHA

Inventor： Hiroyuki Shimoyama ,  Taichi Yonemoto ,  Shuji Koyama ,  Masaki Ohsumi ,  Keiji Matsumoto ,  Seiichiro Yaginuma

IPC: H01L29/66 ,  B41J2/16

CPC classification number: H01L29/66007 ,  B41J2/16 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1632 ,  B41J2/1635

Abstract: A method of manufacturing a substrate of a liquid ejection head including: forming a plurality of recesses in a silicon wafer; etching the silicon wafer with etchant to form a depression and a plurality of through holes formed from the plurality of the recesses in the depression; and manufacturing a plurality of substrates of the liquid ejection head from the silicon wafer by dividing the silicon wafer on the basis of through holes.

Abstract translation: 一种制造液体喷射头的基底的方法，包括：在硅晶片中形成多个凹槽; 用蚀刻剂蚀刻硅晶片以形成凹陷和由凹陷中的多个凹槽形成的多个通孔; 并且通过基于通孔分割硅晶片从硅晶片制造多个液体喷射头的基板。

公开(公告)号：US09421773B2

公开(公告)日：2016-08-23

申请号：US13956607

申请日：2013-08-01

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuhiro Asai ,  Keiji Matsumoto ,  Kunihito Uohashi ,  Shuji Koyama

IPC: B21D53/76 ,  B23P17/00 ,  B41J2/16

CPC classification number: B41J2/1631 ,  B41J2/1603 ,  B41J2/1629 ,  B41J2/1639 ,  B41J2/1645 ,  Y10T29/49401

Abstract: The invention provides a process for producing a liquid ejection head having an ejection orifice forming member in which an ejection orifice for ejecting a liquid has been formed, and a substrate having an energy-generating element for generating energy for ejecting a liquid from the ejection orifice on the side of a front surface thereof, the process includes the steps of providing a film having a support, a first layer and a second layer in this order, arranging the film on the substrate in such a manner that the second layer faces the front surface, detaching the support from the film arranged, forming the ejection orifice in the second layer, and removing at least a part of the first layer from the second layer.

Abstract translation: 本发明提供一种制造液体喷射头的方法，该液体喷射头具有喷射孔形成部件，其中已经形成有用于喷射液体的喷射孔，以及具有用于产生从喷射口喷出液体的能量的能量产生元件的基板 在其前表面侧，该方法包括以下步骤：依次提供具有支撑体，第一层和第二层的膜，以使第二层面向前方的方式将膜设置在基板上 表面，从布置的膜分离支撑体，在第二层中形成喷射孔，以及从第二层去除第一层的至少一部分。

公开(公告)号：US20140212997A1

公开(公告)日：2014-07-31

申请号：US14150181

申请日：2014-01-08

Applicant: CANON KABUSHIKI KAISHA

Inventor： Seiichiro Yaginuma ,  Hiroyuki Shimoyama ,  Masaki Ohsumi ,  Taichi Yonemoto ,  Shuji Koyama

IPC: B41J2/16

CPC classification number: B41J2/1629 ,  B41J2/1601 ,  B41J2/1631

Abstract: A process for producing a substrate for a liquid ejection head in which a depressed portion is formed on a second surface that is a surface opposite to a first surface of a silicon substrate having an element formation region on the first surface with a peripheral side region left, the process including the steps of (1) forming an etching mask layer covering the second surface of the silicon substrate; (2) subjecting the etching mask layer and the silicon substrate to laser abrasion processing to form a pattern opening that does not pass through the silicon substrate; and (3) performing a wet etching process to the silicon substrate where the pattern opening is formed from a side of the second surface to form the depressed portion. The depressed portion is formed over a center side region including a position corresponding to the element formation region.

Abstract translation: 一种用于制造液体喷射头的基板的方法，其中在与第一表面上具有元件形成区域的硅基板的与第一表面相对的表面的第二表面上形成凹部，其中边缘区域为左侧 该方法包括以下步骤：（1）形成覆盖硅衬底的第二表面的蚀刻掩模层; （2）对蚀刻掩模层和硅基板进行激光磨蚀处理，形成不通过硅衬底的图案开口; 和（3）对从硅片的第二表面侧形成图形开口的硅衬底进行湿蚀刻处理，形成凹陷部。 凹陷部形成在包括与元件形成区域对应的位置的中心侧区域上。

公开(公告)号：US20130330673A1

公开(公告)日：2013-12-12

申请号：US13903172

申请日：2013-05-28

Applicant: Canon Kabushiki Kaisha

Inventor： Kunihito Uohashi ,  Shuji Koyama ,  Kazuhiro Asai ,  Keiji Matsumoto ,  Tetsuro Honda ,  Masaki Ohsumi

IPC: B41J2/16

CPC classification number: B41J2/1631 ,  B41J2/1603 ,  B41J2/1629

Abstract: A process for producing an ejection orifice forming member including the steps of forming a laminate including a first negative photosensitive resin layer that contains a first photoacid generator, and a second negative photosensitive resin layer that is formed on the first negative photosensitive resin layer and contains a second photoacid generator; forming a first latent image and a second latent image on the first negative photosensitive resin layer and the second negative photosensitive resin layer, respectively, by collectively subjecting the first negative photosensitive resin layer and the second negative photosensitive resin layer to exposure; performing a heat treatment after the exposure; and forming the ejection orifice by a development treatment. The first photoacid generator in the first latent image has an acid diffusion length greater than the acid diffusion length of the second photoacid generator in the second latent image.

Abstract translation: 一种喷射孔形成部件的制造方法，包括以下步骤：形成包含第一感光性酸性发光体的第一负型感光性树脂层和形成在第一负型感光性树脂层上的第二负型感光性树脂层的层叠体， 第二光酸发生器; 通过共同对第一负感光性树脂层和第二负型感光性树脂层进行曝光，分别在第一负型感光性树脂层和第二负型感光性树脂层上形成第一潜像和第二潜像; 曝光后进行热处理; 并通过显影处理形成喷射孔。 第一潜像中的第一光致酸发生剂的酸扩散长度大于第二潜像中第二光致酸发生剂的酸扩散长度。

公开(公告)号：USRE44945E1

公开(公告)日：2014-06-17

申请号：US13666287

申请日：2012-11-01

Applicant: Canon Kabushiki Kaisha

Inventor： Toshiyasu Sakai ,  Shuji Koyama ,  Kenji Ono ,  Jun Yamamuro

IPC: B41J2/16

CPC classification number: B41J2/1603 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1635 ,  B41J2/1639 ,  B41J2/1645 ,  H01L21/76898

Abstract: A manufacturing method for a substrate for an ink jet head, including formation of an ink supply port in a silicon substrate, the method includes a step of forming, on one side of the substrate, an etching mask layer having an opening at a position corresponding ink supply port; a step of forming unpenetrated holes through the opening of the etching mask layer in at least two rows in a longitudinal direction of the opening; and a step of forming the ink supply port by crystal anisotropic etching of the substrate in the opening.

Abstract translation: 一种用于喷墨头的基​​板的制造方法，包括在硅基板中形成供墨口，该方法包括以下步骤：在基板的一侧上形成在相应位置具有开口的蚀刻掩模层 供墨口; 通过蚀刻掩模层的开口沿开口的纵向至少两行形成未穿透孔的步骤; 以及通过在开口中的基板的晶体各向异性蚀刻形成供墨口的步骤。

公开(公告)号：US20140024148A1

公开(公告)日：2014-01-23

申请号：US13945617

申请日：2013-07-18

Applicant: CANON KABUSHIKI KAISHA

Inventor： Hiroyuki Shimoyama ,  Taichi Yonemoto ,  Shuji Koyama ,  Masaki Ohsumi ,  Keiji Matsumoto ,  Seiichiro Yaginuma

IPC: H01L29/66

CPC classification number: H01L29/66007 ,  B41J2/16 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1632 ,  B41J2/1635

Abstract: A method of manufacturing a substrate of a liquid ejection head including: forming a plurality of recesses in a silicon wafer; etching the silicon wafer with etchant to form a depression and a plurality of through holes formed from the plurality of the recesses in the depression; and manufacturing a plurality of substrates of the liquid ejection head from the silicon wafer by dividing the silicon wafer on the basis of through holes.

Abstract translation: 一种制造液体喷射头的基底的方法，包括：在硅晶片中形成多个凹槽; 用蚀刻剂蚀刻硅晶片以形成凹陷和由凹陷中的多个凹部形成的多个通孔; 并且通过基于通孔分割硅晶片从硅晶片制造多个液体喷射头的基板。

公开(公告)号：US20130161286A1

公开(公告)日：2013-06-27

申请号：US13707904

申请日：2012-12-07

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kenta Furusawa ,  Keiji Matsumoto ,  Keisuke Kishimoto ,  Kazuhiro Asai ,  Shuji Koyama

IPC: B44C1/22

CPC classification number: B44C1/227 ,  B41J2/1603 ,  B41J2/1629 ,  B41J2/1634 ,  B41J2/1639 ,  B41J2/1643 ,  Y10T29/49401

Abstract: Provided is a processing method for an ink jet head substrate, including: forming a barrier layer on a substrate and forming a seed layer on the barrier layer; forming a resist film on the seed layer and patterning the resist film so that the patterned resist film corresponds to a pad portion for electrically connecting an ink jet head to an outside of the ink jet head; forming the pad portion in an opening of the patterned resist film; removing the resist film; subjecting the substrate to anisotropic etching to form an ink supply port; removing the barrier layer and the seed layer; and performing laser processing from a surface of the substrate.

Abstract translation: 提供了一种喷墨头基板的处理方法，包括：在基板上形成阻挡层并在阻挡层上形成种子层; 在种子层上形成抗蚀剂膜并图案化抗蚀剂膜，使得图案化的抗蚀剂膜对应于用于将喷墨头电连接到喷墨头的外部的焊盘部分; 在所述图案化的抗蚀剂膜的开口中形成所述焊盘部分; 去除抗蚀膜; 对基板进行各向异性蚀刻以形成供墨口; 去除阻挡层和种子层; 以及从所述基板的表面进行激光加工。

公开(公告)号：US09799526B2

公开(公告)日：2017-10-24

申请号：US14798024

申请日：2015-07-13

Applicant: CANON KABUSHIKI KAISHA

Inventor： Hirohisa Fujita ,  Taichi Yonemoto ,  Shuji Koyama

IPC: H01B13/00 ,  B23P15/00 ,  C23F1/00 ,  C03C25/00 ,  B44C1/22 ,  H01L21/302 ,  H01L21/461 ,  H01L21/306 ,  H01L21/768 ,  H01L21/311 ,  H01L21/02 ,  H01L21/288 ,  H01L21/56 ,  H01L21/67 ,  C09K13/10

CPC classification number: H01L21/30608 ,  C09K13/10 ,  H01L21/02063 ,  H01L21/288 ,  H01L21/31116 ,  H01L21/568 ,  H01L21/67126 ,  H01L21/76805 ,  H01L21/76816

Abstract: An etching method includes etching a silicon substrate with a liquid composition containing an alkaline organic compound, water, and a boron compound with a content in the range of 1% by mass to 14% by mass. The boron compound is at least one of boron sesquioxide, sodium tetraborate, metaboric acid, sodium perborate, sodium borohydride, zinc borate, and ammonium borate.

公开(公告)号：US09211707B2

公开(公告)日：2015-12-15

申请号：US13655796

申请日：2012-10-19

Applicant: CANON KABUSHIKI KAISHA

Inventor： Hirohisa Fujita ,  Shuji Koyama ,  Hiroyuki Abo

IPC: B21D53/76 ,  B41J2/15 ,  B41J2/14 ,  B41J2/16

CPC classification number: B41J2/14032 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1645 ,  Y10T29/49401

Abstract: A method for manufacturing an inkjet recording head includes preparing a substrate having a mold to become an ink flow passage and an orifice layer covering the mold, and immersing the substrate in a solvent, whereby in immersing the substrate in the solvent, the mold at the substrate immersed in the solvent is irradiated with deep-UV light.

Abstract translation: 一种喷墨记录头的制造方法，其特征在于，准备具有成为油墨流路的模具和覆盖该模具的孔层的基板，将基板浸渍在溶剂中，由此将基板浸渍在溶剂中， 浸渍在溶剂中的基材用深紫外线照射。

公开(公告)号：US09168750B2

公开(公告)日：2015-10-27

申请号：US14089629

申请日：2013-11-25

Applicant: CANON KABUSHIKI KAISHA

Inventor： Koji Sasaki ,  Shuji Koyama ,  Keiji Matsumoto ,  Seiichiro Yaginuma

IPC: C03C15/00 ,  B41J2/16

CPC classification number: B41J2/1634 ,  B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1645

Abstract: A manufacturing method of a liquid discharging head includes: preparing a substrate having an energy-generating element and a resin layer on a first face side; irradiating a laser beam on the substrate so as to pass through the resin layer to form a hole serving as a liquid supply port in the substrate; removing a portion of the resin layer including a region which the laser beam has passed through, thereby forming a portion from which the resin layer has been removed as a channel, and forming a portion in which the resin layer remains as a side wall; and forming a discharge port forming member on a far side from the substrate of the side wall, and to form the channel forming member using the side wall and the discharge port forming member.

Abstract translation: 液体排出头的制造方法包括：在第一面侧准备具有发光元件和树脂层的基板; 在基板上照射激光束以通过树脂层，以在基板中形成用作液体供给口的孔; 除去包括激光束已经通过的区域的树脂层的一部分，从而形成树脂层已被除去的部分作为沟道，并且形成树脂层保留为侧壁的部分; 在侧壁的基板的远侧形成排出口形成部件，并且使用侧壁和排出口形成部件形成流路形成部件。