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公开(公告)号：US08999182B2
公开(公告)日：2015-04-07
申请号：US13921101
申请日：2013-06-18
Applicant: Canon Kabushiki Kaisha
Inventor： Hiroyuki Abo , Keiji Matsumoto
CPC classification number: B41J2/1629 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1639 , B41J2/1645
Abstract: A method for manufacturing a liquid discharge head includes a step of preparing a first substrate having an energy generating element at a front surface side thereof; a step of forming a wall member, which is to become a wall for a liquid flow passage, at the front surface side of the first substrate; a step of forming a mask having an opening on the wall member and forming a second substrate, which is composed of silicon and is to become an orifice plate, on the mask; and a step of forming a liquid supply port in the first substrate and a liquid discharge port in the second substrate by supplying an etchant from a back surface side of the first substrate, the back surface being a surface opposite the front surface.
Abstract translation: 一种液体排出头的制造方法，其特征在于，具有在前表面侧具有能量产生元件的第一基板的制造工序。 在第一基板的前表面侧形成用于形成液体流路的壁的壁部件的工序; 在所述面罩上形成具有开口的掩模的步骤，在所述掩模上形成由硅构成并成为孔板的第二基板; 以及通过从第一基板的背面侧供给蚀刻剂，在第一基板中形成液体供给口的步骤和第二基板中的液体排出口，后表面是与前表面相对的表面。
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Patent Agency Ranking
公开(公告)号：US20140008322A1
公开(公告)日：2014-01-09
申请号：US13926636
申请日：2013-06-25
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hiroyuki Abo , Toshiyasu Sakai , Kazuya Abe
CPC classification number: B44C1/227 , B41J2/1628 , B41J2/1631 , B41J2/1639 , H01L21/3065
Abstract: According to one aspect of the present invention, there is provided a dry etching method which carries out patterning of a resin film provided on a substrate, by reactive ion etching using a resist mask, wherein a gas mixture containing CF4 gas with a percentage flow rate of 1.0 to 5.0% is used as an etching gas; and pressure in an etching reaction chamber in an apparatus used for the reactive ion etching is 1.0 Pa or more.
Abstract translation: 根据本发明的一个方面，提供了一种干蚀刻方法，其通过使用抗蚀剂掩模的反应离子蚀刻来进行设置在基板上的树脂膜的图案化，其中含有流量百分比的CF 4气体的气体混合物 1.0〜5.0％作为蚀刻气体使用; 在用于反应离子蚀刻的装置中的蚀刻反应室中的压力为1.0Pa以上。
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公开(公告)号：US09067460B2
公开(公告)日：2015-06-30
申请号：US13926636
申请日：2013-06-25
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hiroyuki Abo , Toshiyasu Sakai , Kazuya Abe
IPC: B44C1/22 , B41J2/16 , H01L21/3065
CPC classification number: B44C1/227 , B41J2/1628 , B41J2/1631 , B41J2/1639 , H01L21/3065
Abstract: According to one aspect of the present invention, there is provided a dry etching method which carries out patterning of a resin film provided on a substrate, by reactive ion etching using a resist mask, wherein a gas mixture containing CF4 gas with a percentage flow rate of 1.0 to 5.0% is used as an etching gas; and pressure in an etching reaction chamber in an apparatus used for the reactive ion etching is 1.0 Pa or more.
Abstract translation: 根据本发明的一个方面，提供了一种干蚀刻方法，其通过使用抗蚀剂掩模的反应离子蚀刻来进行设置在基板上的树脂膜的图案化，其中含有流量百分比的CF 4气体的气体混合物 1.0〜5.0％作为蚀刻气体使用; 在用于反应离子蚀刻的装置中的蚀刻反应室中的压力为1.0Pa以上。
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公开(公告)号：US20130097861A1
公开(公告)日：2013-04-25
申请号：US13655796
申请日：2012-10-19
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hirohisa Fujita , Shuji Koyama , Hiroyuki Abo
IPC: B23P17/00
CPC classification number: B41J2/14032 , B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1639 , B41J2/1645 , Y10T29/49401
Abstract: A method for manufacturing an inkjet recording head includes preparing a substrate having a mold to become an ink flow passage and an orifice layer covering the mold, and immersing the substrate in a solvent, whereby in immersing the substrate in the solvent, the mold at the substrate immersed in the solvent is irradiated with deep-UV light.
Abstract translation: 一种喷墨记录头的制造方法，其特征在于，准备具有成为油墨流路的模具和覆盖该模具的孔层的基板，将基板浸渍在溶剂中，由此将基板浸渍在溶剂中， 浸渍在溶剂中的基材用深紫外线照射。
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公开(公告)号：US09211707B2
公开(公告)日：2015-12-15
申请号：US13655796
申请日：2012-10-19
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hirohisa Fujita , Shuji Koyama , Hiroyuki Abo
CPC classification number: B41J2/14032 , B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1639 , B41J2/1645 , Y10T29/49401
Abstract: A method for manufacturing an inkjet recording head includes preparing a substrate having a mold to become an ink flow passage and an orifice layer covering the mold, and immersing the substrate in a solvent, whereby in immersing the substrate in the solvent, the mold at the substrate immersed in the solvent is irradiated with deep-UV light.
Abstract translation: 一种喷墨记录头的制造方法，其特征在于，准备具有成为油墨流路的模具和覆盖该模具的孔层的基板，将基板浸渍在溶剂中，由此将基板浸渍在溶剂中， 浸渍在溶剂中的基材用深紫外线照射。
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公开(公告)号：US20130341302A1
公开(公告)日：2013-12-26
申请号：US13921101
申请日：2013-06-18
Applicant: CANON KABUSHIKI KAISHA
Inventor： Hiroyuki Abo , Keiji Matsumoto
IPC: B41J2/16
CPC classification number: B41J2/1629 , B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1639 , B41J2/1645
Abstract: A method for manufacturing a liquid discharge head includes a step of preparing a first substrate having an energy generating element at a front surface side thereof; a step of forming a wall member, which is to become a wall for a liquid flow passage, at the front surface side of the first substrate; a step of forming a mask having an opening on the wall member and forming a second substrate, which is composed of silicon and is to become an orifice plate, on the mask; and a step of forming a liquid supply port in the first substrate and a liquid discharge port in the second substrate by supplying an etchant from a back surface side of the first substrate, the back surface being a surface opposite the front surface.
Abstract translation: 一种液体排出头的制造方法，其特征在于，具有在前表面侧具有能量产生元件的第一基板的制造工序。 在第一基板的前表面侧形成用于形成液体流路的壁的壁部件的工序; 在所述面罩上形成具有开口的掩模的步骤，在所述掩模上形成由硅构成并成为孔板的第二基板; 以及通过从第一基板的背面侧供给蚀刻剂，在第一基板中形成液体供给口的步骤和第二基板中的液体排出口，后表面是与前表面相对的表面。
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