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10 条记录 (耗时 0.023 秒)

    Controlled penetration subpad
    1.
    发明授权
    Controlled penetration subpad 有权
    受控的渗透子垫

    公开(公告)号：US08602851B2

    公开(公告)日：2013-12-10

    申请号：US10457316

    申请日：2003-06-09

    申请人： Brian Scott Lombardo ,  Joseph Cianciolo

    发明人： Brian Scott Lombardo ,  Joseph Cianciolo

    IPC分类号： B24D11/00

    CPC分类号： B24B37/22 ,  B24B21/04

    摘要： Provided is a seamless polishing pad comprising a seamless polishing layer having a substantially uniform depth of penetration into a porous subpad. In one embodiment, the polishing pad comprises a polishing layer produced by applying to the subpad a hardenable fluid. In another embodiment, the subpad is coated with a barrier before coating with the hardenable fluid. In each embodiment, the depth of penetration of the polishing layer and/or barrier is substantially uniform. Also provided is a method of producing a seamless polishing pad comprising a seamless polishing layer having a substantially uniform depth of penetration into a porous subpad.

    摘要翻译： 提供了一种无缝抛光垫，其包括具有基本均匀的渗入多孔子垫的深度的无缝抛光层。 在一个实施例中，抛光垫包括通过向子垫施加可硬化流体而产生的抛光层。 在另一个实施方案中，在用可硬化流体涂覆之前，该子垫被涂覆有屏障。 在每个实施例中，抛光层和/或屏障的穿透深度基本均匀。 还提供了一种生产无缝抛光垫的方法，该无缝抛光垫包括具有基本均匀的渗入多孔子垫的深度的无缝抛光层。

    Removal of unreacted diisocyanate monomer from polyurethane prepolymers
    2.
    发明授权
    Removal of unreacted diisocyanate monomer from polyurethane prepolymers 失效
    从聚氨酯预聚物中除去未反应的二异氰酸酯单体

    公开(公告)号：US5703193A

    公开(公告)日：1997-12-30

    申请号：US657135

    申请日：1996-06-03

    申请人： Ronald Owen Rosenberg ,  Ajaib Singh ,  Christopher James Maupin ,  Brian Scott Lombardo

    发明人： Ronald Owen Rosenberg ,  Ajaib Singh ,  Christopher James Maupin ,  Brian Scott Lombardo

    IPC分类号： C08G18/10

    CPC分类号： C08G18/10

    摘要： A process for reducing the amount of residual organic diisocyanate monomer in a polyurethane prepolymer reaction product mixture which comprises distilling the polyurethane prepolymer reaction product mixture in the presence of a combination of at least one inert first solvent with a boiling point below the boiling point of the residual organic diisocyanate monomer and at least one inert second solvent with a boiling point above the boiling point of the residual organic diisocyanate monomer, at a temperature which exceeds the vaporization temperature of the residual organic diisocyanate monomer and which is below the decomposition temperature of the polyurethane prepolymer.

    摘要翻译： 一种用于减少聚氨酯预聚物反应产物混合物中剩余的有机二异氰酸酯单体的量的方法，该方法包括在至少一种惰性的第一溶剂的沸点低于沸点的沸点存在下蒸馏聚氨酯预聚物反应产物混合物 残留的有机二异氰酸酯单体和至少一种沸点高于残余有机二异氰酸酯单体的沸点的惰性第二溶剂，其温度超过残余的有机二异氰酸酯单体的汽化温度，低于聚氨酯的分解温度 预聚物。