Abstract:
The present disclosure provides a circuit testing method and a circuit testing system for testing the circuit of a transmissive capacitive touch panel, wherein, the method comprises: when testing a certain induction line in a first electrode matrix or a second electrode matrix, configuring all induction lines in the first electrode matrix and the second electrode matrix except for the induction line to be tested as ground wires, applying a first voltage to the induction line to be tested, and detecting current on the induction line to be tested, and determining that the induction line to be tested is in a short-circuit state when the current is generated on the induction line to be tested; repeating the above step, and testing other induction lines in turn.
Abstract:
The present disclosure provides a thin film transistor and its manufacturing method, an array substrate, a display device. The thin film transistor includes a gate electrode, a gate insulating layer, an active layer, a source electrode and a drain electrode. The source electrode and the drain electrode are formed above the active layer and located at a first end and a second end of the active layer which are opposite to each other, respectively. The drain electrode completely covers the second end of the active layer.
Abstract:
Provided are a semiconductor device and a method for manufacturing the same. The semiconductor device comprises an insulating layer and a metal oxide semiconductor layer which are adjacent to each other, and the insulating layer is formed by steps of: forming a first silicon oxide film; and stabilizing the first silicon oxide film by filling a silicon dangling bond therein with a filling atom capable of being bonded to the silicon dangling bond.
Abstract:
A method for manufacturing the thin film transistor, including: forming a gate, an active layer and a gate insulating layer disposed between the gate and the active layer; wherein the gate insulating layer is in a double-layer structure comprising a first gate insulating layer next to the gate and a second gate insulating layer next to the active layer, and one of the first gate insulating layer and the second gate insulating layer is annealed.
Abstract:
The present invention relate to a display device, an array substrate and a method for manufacturing the same. The array substrate includes a substrate and a thin film transistor and a pixel electrode which are formed on the substrate, the thin film transistor includes a gate electrode, a gate insulating layer, an active layer, and source and drain electrodes and is overlaid with a passivation layer, the active layer of the thin film transistor is of an oxide semiconductor, and the passivation layer comprises at least one layer of inorganic insulating thin film or organic insulating thin film. With this array substrate, the oxide semiconductor can be effectively avoided from being affected by hydrogen-containing groups, so that stability of the whole TFT device is enhanced to a great extent, and yield of final products is increased.
Abstract:
Embodiments of the present invention relate to a display device, an array substrate, and a thin film transistor. The thin film transistor comprises a gate, an active layer and a gate insulating layer disposed between the gate and the active layer, the active layer is an oxide semiconductor, and the gate insulating layer comprises at least one layer of inorganic insulating thin film. With the gate insulating layer of the thin film transistor, it is possible that an adverse effect on the oxide semiconductor given by hydrogen-containing groups is effectively avoided, stability of the whole TFT device is enhanced to the most extent, and yield of final products is increased.