公开(公告)号：US12063823B2

公开(公告)日：2024-08-13

申请号：US17432280

申请日：2021-02-05

Applicant: Chengdu BOE Optoelectronics Technology Co., Ltd. ,  BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Guang Jin ,  Chao Kong ,  Ming Zhao ,  Wanmei Qing

IPC: H10K59/13 ,  H10K50/852 ,  H10K50/854 ,  H10K50/856 ,  H10K59/12 ,  H10K59/35 ,  H10K71/00 ,  H10K102/00

CPC classification number: H10K59/13 ,  H10K50/852 ,  H10K50/854 ,  H10K50/856 ,  H10K71/00 ,  H10K59/1201 ,  H10K59/35 ,  H10K2102/00 ,  H10K2102/351

Abstract: The present application relates to the field of display technologies, and provides a display panel including a base substrate; a plurality of pixel structures arranged in an array on the base substrate including a main light-emitting portion and an auxiliary light-emitting portion independently driven and having a same light-emitting color, as well as a microstructure covering the main light-emitting portion and the auxiliary light-emitting portion, light emitted by the main light-emitting portion and the auxiliary light-emitting portion of the same organic light-emitting sub-pixel is emitted through the microstructure; and wherein the initial brightness of the organic light-emitting sub-pixel is the initial brightness of the main light-emitting portion; and a control structure configured to control brightness of the auxiliary light-emitting portion according to brightness of the main light-emitting portion to compensate the brightness of the main light-emitting portion, so that brightness of the organic light-emitting sub-pixel remains consistent with its initial brightness.

公开(公告)号：US09484393B2

公开(公告)日：2016-11-01

申请号：US14428563

申请日：2014-05-26

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Yonglian Qi ,  Shi Shu ,  Ming Zhao

IPC: H01L27/32 ,  H01L27/12 ,  H01L51/52 ,  H01L51/56

CPC classification number: H01L27/3248 ,  H01L27/124 ,  H01L27/322 ,  H01L27/3246 ,  H01L27/3272 ,  H01L51/5206 ,  H01L51/5209 ,  H01L51/5253 ,  H01L51/5284 ,  H01L51/56 ,  H01L2227/323

Abstract: An array substrate, a manufacturing method thereof and a display device are disclosed. The array substrate comprises a base substrate and a thin-film transistor (TFT) unit, a color filter and a planarization protective layer disposed on the base substrate. The planarization protective layer is electrically connected with a drain electrode of the TFT unit and is conductive. The array substrate has the advantages of simplifying the layer structures of the array substrate, reducing the manufacturing difficulty of the array substrate, and improving the production yield of the array substrate.

Abstract translation: 公开了阵列基板，其制造方法和显示装置。 阵列基板包括基底和薄膜晶体管（TFT）单元，滤色器和设置在基底基板上的平坦化保护层。 平坦化保护层与TFT单元的漏电极电连接并且是导电的。 阵列基板具有简化阵列基板的层结构，降低阵列基板的制造难度，提高阵列基板的制造成品率的优点。

公开(公告)号：US20140051814A1

公开(公告)日：2014-02-20

申请号：US13968106

申请日：2013-08-15

Applicant: BOE Technology Group Co., Ltd.

Inventor： Lin Li ,  Shi Shu ,  Wenwen Sun ,  Ming Zhao

IPC: G03F7/00

CPC classification number: G03F7/0007 ,  C08F220/20 ,  C08F222/06 ,  C08F2220/306 ,  C08G65/2606 ,  C08G65/2612 ,  C08G65/2615 ,  C08G65/32 ,  C08G65/324 ,  C08G81/025 ,  G03F7/033 ,  C08F212/08

Abstract: Provided is a photosensitive alkali-soluble resin comprising a compound of formula (I), a method of preparing the same, and a color photosensitive resist containing the same, wherein n1, n2, R1, R2 and R3 are defined as herein. The photosensitive alkali-soluble resin is prepared by: copolymerizing ethylene oxide with α-hydroxyalkyl phenyl ketone to obtain the first intermediate product, followed by copolymerizing the first intermediate product with a copolymerization product of glycerin acrylate, styrene, and maleic anhydride to obtain the second intermediate product, and oxidizing the second intermediate product to produce the photosensitive alkali-soluble resin.

Abstract translation: 提供包含式（I）化合物的光敏碱溶性树脂及其制备方法和含有该化合物的光敏抗蚀剂，其中n1，n2，R1，R2和R3如本文所定义。 感光性碱溶性树脂通过以下方法制备：将环氧乙烷与α-羟基烷基苯基酮共聚以获得第一中间产物，然后将第一中间产物与丙烯酸甘油酯，苯乙烯和马来酸酐的共聚产物共聚，得到第二个 中间产物，并氧化第二中间产物以产生感光性碱溶性树脂。

公开(公告)号：US10988840B2

公开(公告)日：2021-04-27

申请号：US16400425

申请日：2019-05-01

Applicant: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. ,  BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Yifan Yang ,  Peng Cao ,  Ming Zhao ,  Wanmei Qing

IPC: C23C14/54 ,  C23C14/24 ,  G01B17/02 ,  G01N29/24 ,  H01L41/053 ,  H01L51/56 ,  G01B7/06

Abstract: A crystal oscillation probe structure and an evaporation device are provided. The crystal oscillation probe structure includes a guide cover, a crystal oscillation probe and a mesh screen structure, the guide cover includes a chamber with a guide opening, the crystal oscillation probe is fixed in the chamber, the crystal oscillation probe includes at least one crystal oscillation sheet, the mesh screen structure includes a plurality of openings, and the mesh screen structure is located on a traveling path of a material traveling toward the at least one crystal oscillation sheet and disposed on a side of the at least one crystal oscillation sheet facing the guide opening.

公开(公告)号：US09006352B2

公开(公告)日：2015-04-14

申请号：US13968106

申请日：2013-08-15

Applicant: BOE Technology Group Co., Ltd.

Inventor： Lin Li ,  Shi Shu ,  Wenwen Sun ,  Ming Zhao

IPC: C08F222/08 ,  C08F8/00 ,  C08F8/06 ,  C08F212/08 ,  C08F220/28 ,  G03F7/004 ,  G03F7/027 ,  G03F7/00 ,  C08G81/02 ,  C08F222/06 ,  C08G65/32 ,  G03F7/033

CPC classification number: G03F7/0007 ,  C08F220/20 ,  C08F222/06 ,  C08F2220/306 ,  C08G65/2606 ,  C08G65/2612 ,  C08G65/2615 ,  C08G65/32 ,  C08G65/324 ,  C08G81/025 ,  G03F7/033 ,  C08F212/08

Abstract: Provided is a photosensitive alkali-soluble resin comprising a compound of formula (I), a method of preparing the same, and a color photosensitive resist containing the same, wherein n1, n2, R1, R2 and R3 are defined as herein. The photosensitive alkali-soluble resin is prepared by: copolymerizing ethylene oxide with α-hydroxyalkyl phenyl ketone to obtain the first intermediate product, followed by copolymerizing the first intermediate product with a copolymerization product of glycerin acrylate, styrene, and maleic anhydride to obtain the second intermediate product, and oxidizing the second intermediate product to produce the photosensitive alkali-soluble resin.

Abstract translation: 提供包含式（I）化合物的光敏碱溶性树脂及其制备方法和含有该化合物的光敏抗蚀剂，其中n1，n2，R1，R2和R3如本文所定义。 感光性碱溶性树脂通过以下方法制备：使环氧乙烷与α-羟基烷基苯基酮共聚得到第一中间产物，然后将第一中间产物与丙烯酸甘油酯，苯乙烯和马来酸酐的共聚产物共聚，得到第二个 中间产物，并氧化第二中间产物以产生感光性碱溶性树脂。

公开(公告)号：US10138390B2

公开(公告)日：2018-11-27

申请号：US14389105

申请日：2013-12-11

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Ming Zhao

IPC: C09D133/10 ,  C09C1/28 ,  C09C1/30 ,  C09D133/12 ,  C09D133/24 ,  G02B5/20 ,  C09B67/00 ,  C09B67/46 ,  G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031 ,  G03F7/032 ,  G03F7/033 ,  G03F7/075 ,  G03F7/085 ,  G03F7/105

Abstract: The invention relates to the field of materials technology and provides a modified nano-silica and a method for preparing the same, a pigment dispersion and a photosensitive resin composition, so as to solve the problem that conventional nano-silica cannot crosslink with other polymeric materials, and pigment dispersions are apt to aggregate and have a poor film-forming property. The modified nano-silica according to the invention has unsaturated double bonds on the surface thereof and can crosslink with other polymeric materials, such that the pigment dispersion comprising the modified nano-silica can effectively prevent agglomeration and has a good film-forming property, and the photosensitive resin composition comprising the pigment dispersion can reduce the thermal expansion of a film made thereby, as well as the occurrence of shrinkage and collapse phenomena in the surface of the film, and enhance the heat-resistance, chemical-resistance, mechanical properties and abrasion-resistance of the film.