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公开(公告)号:US09893165B2
公开(公告)日:2018-02-13
申请号:US14905733
申请日:2015-08-24
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Jianbang Huang , Yucheng Chan , Chienhung Liu
IPC: H01L29/66 , H01L27/12 , H01L21/28 , H01L21/3105 , H01L21/266
CPC classification number: H01L29/66492 , H01L21/0273 , H01L21/266 , H01L21/28123 , H01L21/3105 , H01L27/127 , H01L27/1288 , H01L29/66757 , H01L29/78621
Abstract: Embodiments of the present invention disclose a manufacturing method for an array substrate and corresponding manufacturing device, which belong to the technical field of metal oxide semiconductor. The method comprises: forming an active layer, a gate insulating layer and a gate metal layer successively on a substrate; forming a gate pattern with a gate photoresist pattern on the substrate having the gate metal layer; altering a temperature of the gate photoresist pattern, so as to enable the width of the gate photoresist sub-pattern in the gate photoresist pattern to be changed; forming lightly doped drains (LDDs) at two sides of a preset area of the active layer sub-pattern in the active layer of the substrate having the changed gate photoresist pattern, the preset area being a projection area of the gate sub-pattern on the active layer sub-pattern, the length of each of the LDDs being (a−b)/2, wherein a is the width of the gate photoresist sub-pattern in the changed gate photoresist pattern, b is the width of the gate sub-pattern; stripping the changed gate photoresist pattern. The embodiment of the present invention mitigates or alleviates the problem of relatively low control flexibility and relatively poor feasibility to the LDD length, which improves the control flexibility and feasibility to the LDD length, and can be used for manufacturing an array substrate.
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公开(公告)号:US11552148B2
公开(公告)日:2023-01-10
申请号:US16812619
申请日:2020-03-09
Inventor: Weilin Lai , Yucheng Chan , Jianbang Huang
IPC: H01L21/02 , H01L27/32 , H01L29/66 , H01L51/56 , H01L29/786 , H01L21/84 , H01L27/12 , H01L21/8234 , H01L21/265 , H01L21/266 , H01L21/768 , H01L51/52
Abstract: An array substrate, its manufacturing method, and a display apparatus are provided. The array substrate having a substrate, includes: a monocrystalline silicon substrate employed as the substrate including a central display area, a first peripheral area, and a second peripheral area; substrate circuits integrated with a scan drive circuit in the first peripheral area, a data drive circuit in the second peripheral area, and a plurality of pixel circuits in the central display area; a plurality of scan lines in the central display area and coupled to the scan drive circuit; and a plurality of data lines in the central display area and coupled to the data drive circuit. The scan drive circuit, the data drive circuit, and the plurality of pixel circuits include a plurality of transistors, each of which has an active region inside the monocrystalline silicon layer.
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公开(公告)号:US10324678B2
公开(公告)日:2019-06-18
申请号:US15520336
申请日:2016-09-30
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor: Wenbo Wang , Jianbang Huang , Zhilei Wu
Abstract: The present disclosure provides a display device comprising: at least one flexible display panel; and a connective assembly capable of getting the display device into a ring display state where the at least one flexible display panel forms a ring shape, and getting the display device into a flat panel display state where the at least one flexible display panel all has a display surface towards the same direction. The display device can be used as a flat panel display device, e.g., mobile phone, in the flat panel display state, while in the ring display state, the display device can be used as a bracelet. When used as a bracelet, the display device requires no other assistant devices.
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公开(公告)号:US11600234B2
公开(公告)日:2023-03-07
申请号:US16814119
申请日:2020-03-10
Inventor: Weilin Lai , Yucheng Chan , Jianbang Huang , Dachao Li , Shengji Yang , Pengcheng Lu , Kuanta Huang , Xiaochuan Chen , Xue Dong , Hui Wang , Yanming Wang , Chen Xu , Dacheng Zhang , Yongfa Dong , Qing Wang , Hui Tong , Yunlong Li
IPC: H01L27/32 , G09G3/3291 , G09G3/3258 , G09G3/3266
Abstract: A display substrate and a driving method thereof are provided. The display substrate includes a base substrate containing a monocrystalline silicon layer, a thickness of the monocrystalline silicon layer being less than that of the base substrate; an array circuit layer, disposed on the base substrate and including a plurality of transistors, each of which has an active layer inside the monocrystalline silicon layer; and a plurality of light-emitting elements, located at a side of the array circuit layer away from the base substrate. The array circuit layer includes a scan driving circuit, a data driving circuit and a plurality of pixel sub-circuits, and the plurality of pixel sub-circuits are connected to the plurality of light-emitting elements, respectively, to form a plurality of sub-pixels.
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