公开(公告)号：US4758804A

公开(公告)日：1988-07-19

申请号：US5544

申请日：1987-01-21

Applicant: Atsushi Inoue ,  Tsukasa Senba ,  Toshiaki Fujimura

Inventor： Atsushi Inoue ,  Tsukasa Senba ,  Toshiaki Fujimura

IPC: H03B1/04 ,  H03B5/18

CPC classification number: H03B5/1847 ,  H03B2202/03

Abstract: A high-frequency oscillator having a high-frequency oscillation circuit formed through use of a microstripline. The high-frequency oscillation circuit has a resonator and a transistor connected to a reference potential and coupled with the resonator through a first capacitor. A first electrode of the transistor is connected with the resonator through the first capacitor. A second electrode of the transistor is connected to the reference potential and a third electrode thereof is adapted to derive an output. A substrate is provided with a land portion to be connected with the first electrode of the transistor, and a capacitor electrode is formed on the opposite surface of the substrate to be opposite to the first electrode connection land portion through the substrate. The capacitor electrode, the first electrode connection land portion and the substrate form a second capacitor, which is connected to the reference potential between the first capacitor and the first electrode of the transistor.

Abstract translation: 具有通过使用微带线形成的高频振荡电路的高频振荡器。 高频振荡电路具有连接到参考电位的谐振器和晶体管，并通过第一电容器与谐振器耦合。 晶体管的第一电极通过第一电容器与谐振器连接。 晶体管的第二电极连接到参考电位，并且其第三电极适于导出输出。 衬底设置有与晶体管的第一电极连接的焊盘部分，并且电容器电极通过衬底形成在与第一电极连接焊盘部分相对的衬底的相对表面上。 电容器电极，第一电极连接接合部和基板形成第二电容器，其连接到第一电容器和晶体管的第一电极之间的参考电位。

公开(公告)号：US4699859A

公开(公告)日：1987-10-13

申请号：US648095

申请日：1984-09-07

Applicant: Toshiaki Fujimura ,  Yoshio Katoh ,  Satoshi Imahashi ,  Koichi Seto ,  Shinichi Tanaka

Inventor： Toshiaki Fujimura ,  Yoshio Katoh ,  Satoshi Imahashi ,  Koichi Seto ,  Shinichi Tanaka

IPC: G03F1/56 ,  G03C1/68 ,  G03F7/02

CPC classification number: G03F1/56 ,  Y10S430/118 ,  Y10S430/119

Abstract: A reducible image-containing element which comprises a support material and a photopolymerized layer provided thereon, said photopolymerized layer having an image area which is cured at the upper part and not cured at the lower part, said non-cured lower part containing at least one of polyvalent phenols and their derivatives in an amount effective in preventing said non-cured lower part from curing.

Abstract translation: 一种可还原图像的元件，其包括支撑材料和设置在其上的光聚合层，所述光聚合层具有在上部固化而不在下部固化的图像区域，所述未固化下部包含至少一个 的多价酚及其衍生物，其量有效地防止所述未固化的下部固化。

公开(公告)号：US06333134B1

公开(公告)日：2001-12-25

申请号：US09614120

申请日：2000-07-11

Applicant: Yuji Taguchi ,  Toshiaki Fujimura ,  Hajime Kouda

Inventor： Yuji Taguchi ,  Toshiaki Fujimura ,  Hajime Kouda

IPC: G03C1492

CPC classification number: G03F7/0955 ,  Y10S430/107

Abstract: A multilayered photopolymer element made up of at least a support, a photosensitive layer and a cover film. The photosensitive layer is composed of at least two layers and the uppermost layer in the photosensitive layer contains a sensitivity controlling agent bonded with a polymer. The shape of the shoulder at a relief top is made sharp-edged whereby a printing plate having excellent print quality without being thickened by impression is prepared.

Abstract translation: 至少由支持体，感光层和覆盖膜构成的多层光聚合物元件。 感光层由至少两层构成，感光层中的最上层含有与聚合物结合的感光度控制剂。 在凸起顶部的肩部的形状被制成锋利的边缘，由此制备具有优异的印刷质量的印版，而不被印模增厚。

公开(公告)号：US5780202A

公开(公告)日：1998-07-14

申请号：US417549

申请日：1995-04-06

Applicant: Shigenori Nagahara ,  Toshiaki Fujimura ,  Shinichi Tanaka

Inventor： Shigenori Nagahara ,  Toshiaki Fujimura ,  Shinichi Tanaka

IPC: G03C1/85 ,  G03F7/09 ,  G03C1/492

CPC classification number: G03F7/093 ,  G03C1/85 ,  Y10S430/162

Abstract: An antistatic photosensitive multilayered structure of the present invention has at least a photosensitive layer and an antistatic cover film on a substrate in this order.

Abstract translation: 本发明的抗静电感光性多层结构体在基板上依次具有至少一层感光层和抗静电覆盖膜。

公开(公告)号：US5204223A

公开(公告)日：1993-04-20

申请号：US742046

申请日：1991-08-08

Applicant: Yuji Taguchi ,  Toshiaki Fujimura

Inventor： Yuji Taguchi ,  Toshiaki Fujimura

IPC: C08F2/50 ,  C08F283/00 ,  G03F7/035

CPC classification number: C08F283/00 ,  G03F7/035 ,  Y10S430/107

Abstract: A photosensitive resin composition which is excellent in flexibility and impact resilience, which is less affected by humidity is provided. This composition comprises a soluble synthetic polymer, a photo-polymerizable unsaturated compound, and a photo-polymerization initiator, wherein the soluble synthetic polymer comprises an addition polymer obtained by the reaction between a diamine compound having amino groups selected from primary and secondary amino groups and having no amide bonds in its molecule and a diisocyanate compound; and the addition polymer contains a polyoxyalkylene glycol component in an amount of 20 to 80% by weight.

Abstract translation: 提供了柔软性和冲击弹性优异的感光树脂组合物，其受湿度影响较小。 该组合物包含可溶性合成聚合物，可光聚合不饱和化合物和光聚合引发剂，其中可溶性合成聚合物包含通过具有选自伯氨基和仲氨基的氨基的二胺化合物与选自伯氨基和仲氨基的氨基的二胺化合物反应获得的加成聚合物和 在其分子中不具有酰胺键和二异氰酸酯化合物; 加成聚合物含有20〜80重量％的聚氧亚烷基二醇成分。

公开(公告)号：US4544624A

公开(公告)日：1985-10-01

申请号：US688402

申请日：1985-01-02

Applicant: Masaru Nanpei ,  Akira Tomita ,  Toshiaki Fujimura ,  Kuniomi Etoh

Inventor： Masaru Nanpei ,  Akira Tomita ,  Toshiaki Fujimura ,  Kuniomi Etoh

IPC: G03F7/035 ,  C08F2/00 ,  C08F2/48 ,  C08F283/00 ,  C08G18/00 ,  C08G18/60 ,  G03F7/032 ,  G03C1/68

CPC classification number: C08F283/00 ,  G03F7/032 ,  Y10S430/107

Abstract: The invention provides a photosensitive resin composition containing a soluble synthetic linear high-molecular compound in an amount of 25 to 95 weight percent based on the whole composition, a monomer having at least one photopolymerizable unsaturated bond and a photopolymerization initiator and characterized in that part or all of the soluble synthetic linear high-molecular compound is an addition polymer of an organic diisocyanate compound with an amide compound, both terminals of the amide compound being either primary or secondary amide groups and the equivalent ratio of amino groups to isocyanate groups in the addition polymer is not less than 1.0. The high-molecular weight compound makes up at least 50% by weight base on the total amount of the polymer material present in the composition.

Abstract translation: 本发明提供一种感光性树脂组合物，其含有基于整个组合物的25〜95重量％的可溶性合成线性高分子化合物，具有至少一个光聚合性不饱和键的单体和光聚合引发剂，其特征在于， 所有可溶性合成线性高分子化合物是有机二异氰酸酯化合物与酰胺化合物的加成聚合物，酰胺化合物的两个末端是伯酰胺基团或仲酰胺基团，加成物中氨基与异氰酸酯基团的当量比例 聚合物不小于1.0。 基于组合物中存在的聚合物材料的总量，高分子量化合物占至少50重量％。

公开(公告)号：US4188221A

公开(公告)日：1980-02-12

申请号：US904168

申请日：1978-05-08

Applicant: Masaru Nanpei ,  Toshiaki Fujimura ,  Hajime Kouda ,  Yoshihiro Kasho ,  Kuniomi Etoh

Inventor： Masaru Nanpei ,  Toshiaki Fujimura ,  Hajime Kouda ,  Yoshihiro Kasho ,  Kuniomi Etoh

IPC: C08F2/00 ,  C08F2/48 ,  C08F283/00 ,  C08F283/04 ,  C08F290/00 ,  C08F299/00 ,  G03F7/032 ,  G03F7/037 ,  G03C1/68

CPC classification number: G03F7/037 ,  Y10S430/107

Abstract: Photosensitive polyamide resin composition which can be developed with water to give a relief printing plate having an excellent moisture resistance, comprising 30 to 90% by weight of a water-soluble polyamide having ammonium type nitrogen atoms and 5 to 70% by weight of a photopolymerizable unsaturated compound prepared by reacting (meth)acrylic acid (I) and a polyglycidyl ether of an aliphatic polyvalent alcohol (II) in an equivalent ratio of 0.5.ltoreq.(I)/(II).ltoreq.2.0, and 0.01 to 10% by weight of a photopolymerization initiator.

Abstract translation: 可以用水显影以得到具有优异耐湿性的凸版印刷版的感光性聚酰胺树脂组合物，包含30-90％重量的具有铵型氮原子的水溶性聚酰胺和5-70％重量的可光聚合的 通过使（甲基）丙烯酸（I）与脂族多元醇（II）的多缩水甘油醚以0.5（I）/（II）≤2.0的比例和0.01至10 重量％的光聚合引发剂。