公开(公告)号：US4145222A

公开(公告)日：1979-03-20

申请号：US781307

申请日：1977-03-25

Applicant: Kuniomi Etoh ,  Masaru Nanpei

Inventor： Kuniomi Etoh ,  Masaru Nanpei

IPC: C08F283/04 ,  G03F7/037 ,  G03C1/68

CPC classification number: G03F7/037 ,  Y10S430/107

Abstract: A photosensitive resin composition which comprises a polymer having a basic nitrogen atom in the main or side chain, which is represented by the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are each a hydrogen atom or a substituted or unsubstituted hydrocarbon group, at least one of R.sub.1 to R.sub.3 representing a polymeric chain, a photopolymerizable unsaturated monomer and a photosensitizer.

Abstract translation: 一种感光性树脂组合物，其包含在主链或侧链具有碱性氮原子的聚合物，其由下式表示：其中R 1，R 2和R 3各自为氢原子或取代或未取代的烃基， 代表聚合物链的R1至R3中的至少一个，可光聚合的不饱和单体和光敏剂。

公开(公告)号：US4220704A

公开(公告)日：1980-09-02

申请号：US7197

申请日：1979-01-29

Applicant: Kuniomi Etoh ,  Masaru Nanpei

Inventor： Kuniomi Etoh ,  Masaru Nanpei

IPC: C08F283/04 ,  G03F7/037 ,  G03C1/68

CPC classification number: G03F7/037 ,  C08F283/04 ,  Y10S430/106

Abstract: A photosensitive resin composition which comprises a polymer having a basic nitrogen atom in the main or side chain, which is represented by the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are each a hydrogen atom or a substituted or unsubstituted hydrocarbon group, at least one of R.sub.1 to R.sub.3 representing a polymeric chain, a photopolymerizable unsaturated monomer and a photosensitizer.

Abstract translation: 一种感光性树脂组合物，其包含在主链或侧链具有碱性氮原子的聚合物，其由下式表示：其中R 1，R 2和R 3各自为氢原子或取代或未取代的烃基， 代表聚合物链的R1至R3中的至少一个，可光聚合的不饱和单体和光敏剂。

公开(公告)号：US4187112A

公开(公告)日：1980-02-05

申请号：US843850

申请日：1977-10-20

Applicant: Kuniomi Etoh ,  Masaru Nanpei ,  Morio Miyagi

Inventor： Kuniomi Etoh ,  Masaru Nanpei ,  Morio Miyagi

IPC: C08F291/18 ,  G03F7/032 ,  G03C1/68 ,  G03C1/78 ,  G03C5/00

CPC classification number: G03F7/032 ,  C08F291/18 ,  Y10S430/109

Abstract: A photosensitive resin composition which comprises a polyester having a nitrogen atom in the ammonium salt form in the main or side chain representable by the formula: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are each a hydrogen atom or a substituted or unsubstituted hydrocarbon group, at least one of R.sub.1 to R.sub.4 representing a polymeric chain, and X is an anion to be paired with the ammonium ion, a photopolymerizable unsaturated monomer and a photosensitizer.

Abstract translation: 一种感光性树脂组合物，其包含在主链或侧链中具有铵盐形式的氮原子的聚酯，其可以由下式表示：其中R 1，R 2，R 3和R 4各自为氢原子或取代或未取代的烃 基团，R 1至R 4中至少一个表示聚合物链，X为与铵离子配对的阴离子，可光聚合的不饱和单体和光敏剂。

公开(公告)号：US4096123A

公开(公告)日：1978-06-20

申请号：US640388

申请日：1975-12-12

Applicant: Yoshiharu Niinami ,  Kuniomi Etoh

Inventor： Yoshiharu Niinami ,  Kuniomi Etoh

IPC: C09J7/00 ,  C08G63/00 ,  C08G63/685 ,  C09J7/02 ,  C09J167/00 ,  C09J167/02 ,  C08G63/68 ,  C08G63/12

CPC classification number: C08G63/6856 ,  C09J167/02

Abstract: Disclosed is a polyester adhesive suitable for various substrates, especially metals, having as the effective component thereof a copolyester containing a tertiary amino group comprising: (1) a terephthalic acid residue,(2) at least one dicarboxylic acid residue selected from the class consisting of aliphatic dicarboxylic acid residues and aromatic dicarboxylic acid residues other than a terephthalic acid residue,(3) at least one alkylene glycol residue, and(4) at least one glycol residue or dicarboxylic acid residue selected from the class consisting of glycol residues and dicarboxylic acid residues each possessed of the group represented by the generic formulas (I) through (V) given hereinbelow. ##STR1## (wherein, R.sub.1, R.sub.2, R.sub.5, R.sub.7, R.sub.8, R.sub.9, R.sub.10, R.sub.13, R.sub.14, R.sub.16, R.sub.19, and R.sub.20 are each an alkylene group of 1 to 15 carbon atoms, R.sub.6, R.sub.11, and R.sub.12 are each a hydrogen atom or an alkyl group of 1 to 10 carbon atoms, R.sub.17 and R.sub.18 are either, independently, a hydrogen atom or an alkyl group of 1 to 4 carbon atoms or, in combination, make up a polyethylene group which may form a heterogeneous ring in conjunction with the adjoining nitrogen atom, R.sub.3 and R.sub.4 are each an alkyl group of 1 to 10 carbon atoms, and R.sub.15 is an alkyl group of 1 to 3 carbon atoms or ##STR2##

Abstract translation: 公开了适用于各种基材，特别是金属的聚酯粘合剂，其作为其有效成分是含有叔氨基的共聚酯，其包含：（1）对苯二甲酸残基，（2）从所述类别选择的至少一个二羧酸残基 除三羧酸残留物外的二氧化二油酸残留物和芳族二羧酸残留物，（3）至少一种烷基甘氨酸残留物，以及（4）至少一种从糖类残留物和二羧酸类别中选择的一种甘油残留或二羧酸残留物 根据下文给出的通用公式（I）至（V）所表示的集团所拥有的酸性残留。 （IV）（VI）（VI）其中R1，R2，R5，R7，R8，R9，R10，R13，R14 R16，R19和R20各自为1至15个碳原子的亚烷基，R6，R11和R12各自为氢原子或1-10个碳原子的烷基，R17和R18独立地为 氢原子或1〜4个碳原子的烷基，或者组合形成与相邻的氮原子结合形成异质环的聚乙烯基团，R 3和R 4各自为1〜10个碳原子的烷基 ，R 15为1〜3个碳原子的烷基或

公开(公告)号：US4405705A

公开(公告)日：1983-09-20

申请号：US286825

申请日：1981-07-27

Applicant: Kuniomi Etoh ,  Masaru Nampei ,  Shinichi Tanaka

Inventor： Kuniomi Etoh ,  Masaru Nampei ,  Shinichi Tanaka

IPC: G03F7/038 ,  G03C1/68

CPC classification number: G03F7/038

Abstract: A photosensitive resin composition which comprises(1) at least one of the group comprising basic polymeric compounds which have a molecular weight of not less than 1,000, contain basic nitrogen atoms and are themselves poor in hydrophilic properties but, in the presence of an acidic substance, show good hydrophilic properties due to the acid-base interaction, and(2) at least one of the group comprising organic carboxylic acids which are themselves acidic but, when irradiated with light, lose their acidic property due to a chemical conversion.

Abstract translation: 一种感光性树脂组合物，其包含（1）分子量不小于1000的碱性聚合物中的至少一种，含有碱性氮原子，亲水性本身差，但在酸性物质 由于酸碱相互作用，显示出良好的亲水性，和（2）至少一种本身是酸性的有机羧酸，但当被光照射时，由于化学转化而失去其酸性。

公开(公告)号：US4111692A

公开(公告)日：1978-09-05

申请号：US693127

申请日：1976-06-04

Applicant: Kuniomi Etoh ,  Shinichi Tanaka ,  Yoshio Kato ,  Watanabe Kazuo

Inventor： Kuniomi Etoh ,  Shinichi Tanaka ,  Yoshio Kato ,  Watanabe Kazuo

IPC: G03G5/026 ,  G03G5/04 ,  G03F7/02

CPC classification number: G03G5/026 ,  Y10S430/117

Abstract: An electrostatic printing plate is obtained by forming a permanent electroconductive pattern on its exposed portion, which is effected by irradiation of light to expose a light image on a photosensitive material comprising a photosensitive composition containing an aliphatic nitrogen compound and an organic halogen compound capable of generating a free radical upon irradiation by light.

公开(公告)号：US4544624A

公开(公告)日：1985-10-01

申请号：US688402

申请日：1985-01-02

Applicant: Masaru Nanpei ,  Akira Tomita ,  Toshiaki Fujimura ,  Kuniomi Etoh

Inventor： Masaru Nanpei ,  Akira Tomita ,  Toshiaki Fujimura ,  Kuniomi Etoh

IPC: G03F7/035 ,  C08F2/00 ,  C08F2/48 ,  C08F283/00 ,  C08G18/00 ,  C08G18/60 ,  G03F7/032 ,  G03C1/68

CPC classification number: C08F283/00 ,  G03F7/032 ,  Y10S430/107

Abstract: The invention provides a photosensitive resin composition containing a soluble synthetic linear high-molecular compound in an amount of 25 to 95 weight percent based on the whole composition, a monomer having at least one photopolymerizable unsaturated bond and a photopolymerization initiator and characterized in that part or all of the soluble synthetic linear high-molecular compound is an addition polymer of an organic diisocyanate compound with an amide compound, both terminals of the amide compound being either primary or secondary amide groups and the equivalent ratio of amino groups to isocyanate groups in the addition polymer is not less than 1.0. The high-molecular weight compound makes up at least 50% by weight base on the total amount of the polymer material present in the composition.

Abstract translation: 本发明提供一种感光性树脂组合物，其含有基于整个组合物的25〜95重量％的可溶性合成线性高分子化合物，具有至少一个光聚合性不饱和键的单体和光聚合引发剂，其特征在于， 所有可溶性合成线性高分子化合物是有机二异氰酸酯化合物与酰胺化合物的加成聚合物，酰胺化合物的两个末端是伯酰胺基团或仲酰胺基团，加成物中氨基与异氰酸酯基团的当量比例 聚合物不小于1.0。 基于组合物中存在的聚合物材料的总量，高分子量化合物占至少50重量％。

公开(公告)号：US4419438A

公开(公告)日：1983-12-06

申请号：US356410

申请日：1982-03-09

Applicant: Kuniomi Etoh ,  Toshikiyo Tanaka ,  Yoshio Katoh ,  Takeo Sugiura ,  Yoshiyasu Itoh ,  Takeo Kohira

Inventor： Kuniomi Etoh ,  Toshikiyo Tanaka ,  Yoshio Katoh ,  Takeo Sugiura ,  Yoshiyasu Itoh ,  Takeo Kohira

IPC: G03C1/72 ,  G03C1/00 ,  G03F1/54 ,  G03F7/004 ,  G03F7/027 ,  G03F7/105 ,  G03F7/02 ,  G03C1/76 ,  G03C5/00

CPC classification number: G03F1/54 ,  G03F7/105 ,  Y10S430/117 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/124

Abstract: An image reproducing material comprising a supporting sheet bearing a metal or metallic compound layer having a thickness of 100 to 1000 .ANG. and a photosensitive resin layer, which is characterized in that said photosensitive resin layer contains (1) an ethylenically unsaturated compound which is polymerizable by the action of free radical and chain propagative, (2) a compound showing photochromism by radical mechanism, (3) a free radical producing agent and (4) an acitinic light absorber. There is also provided an image formed (reproduced) material obtained by patterned exposing the above image reproducing material and then processing the same, a method for obtaining such image formed material and also a method for dot-etching such image formed material. By the use of these materials and methods, dot-etching can be effected easily and there are obtained sharp images without the formation of pin holes.

Abstract translation: 一种图像再现材料，包括承载厚度为100至1000埃的金属或金属化合物层的支撑片和感光性树脂层，其特征在于，所述感光性树脂层含有（1）烯属不饱和化合物，其可以由 自由基和链传播的作用，（2）通过自由基机制显示光致变色的化合物，（3）自由基产生剂和（4）丙酸光吸收剂。 还提供了通过对上述图像再现材料进行图案化曝光，然后对其进行处理而获得的图像形成（再现）材料，获得这种图像形成材料的方法以及用于点蚀这种图像形成材料的方法。 通过使用这些材料和方法，可以容易地进行点蚀刻，并且在没有形成针孔的情况下获得清晰的图像。

公开(公告)号：US4188221A

公开(公告)日：1980-02-12

申请号：US904168

申请日：1978-05-08

Applicant: Masaru Nanpei ,  Toshiaki Fujimura ,  Hajime Kouda ,  Yoshihiro Kasho ,  Kuniomi Etoh

Inventor： Masaru Nanpei ,  Toshiaki Fujimura ,  Hajime Kouda ,  Yoshihiro Kasho ,  Kuniomi Etoh

IPC: C08F2/00 ,  C08F2/48 ,  C08F283/00 ,  C08F283/04 ,  C08F290/00 ,  C08F299/00 ,  G03F7/032 ,  G03F7/037 ,  G03C1/68

CPC classification number: G03F7/037 ,  Y10S430/107

Abstract: Photosensitive polyamide resin composition which can be developed with water to give a relief printing plate having an excellent moisture resistance, comprising 30 to 90% by weight of a water-soluble polyamide having ammonium type nitrogen atoms and 5 to 70% by weight of a photopolymerizable unsaturated compound prepared by reacting (meth)acrylic acid (I) and a polyglycidyl ether of an aliphatic polyvalent alcohol (II) in an equivalent ratio of 0.5.ltoreq.(I)/(II).ltoreq.2.0, and 0.01 to 10% by weight of a photopolymerization initiator.

Abstract translation: 可以用水显影以得到具有优异耐湿性的凸版印刷版的感光性聚酰胺树脂组合物，包含30-90％重量的具有铵型氮原子的水溶性聚酰胺和5-70％重量的可光聚合的 通过使（甲基）丙烯酸（I）与脂族多元醇（II）的多缩水甘油醚以0.5（I）/（II）≤2.0的比例和0.01至10 重量％的光聚合引发剂。