公开(公告)号：US10583465B2

公开(公告)日：2020-03-10

申请号：US15487213

申请日：2017-04-13

Applicant: Applied Materials, Inc.

Inventor： Jianqi Wang ,  William Ming-ye Lu ,  Yixing Lin ,  Kevin A. Papke

IPC: B08B3/12 ,  G01N1/38 ,  G01N15/14 ,  G01N1/02

Abstract: The implementations described herein generally relate to 30 nm in-line liquid particle count testing equipment which analyses and cleans semiconductor processing equipment. More specifically, the implementations described relate to a system for diluting, analyzing, and modifying fluids to enable the observation of the contents of the fluids. A dilution sampling tool is coupled with a liquid particle detector for reading the contents of an extraction solution containing particles from semiconductor processing equipment, such as a liner, a shield, a faceplate, or a showerhead, in a cleaning tank. As such, accurate liquid particle readings may be had which reduce oversaturation of the particle detector.

公开(公告)号：US11260498B2

公开(公告)日：2022-03-01

申请号：US14341419

申请日：2014-07-25

Applicant: Applied Materials, Inc.

Inventor： William Ming-ye Lu ,  Wendell Glen Boyd, Jr. ,  Stacy Meyer

IPC: B24B37/04 ,  B24B37/32 ,  H01L21/683

Abstract: Embodiments of the present invention provide a polishing ring assembly suitable for polishing an electrostatic chuck and method of using the same. In one embodiment, the polishing ring assembly has a retaining ring assembly and an electrostatic chuck fixture. The retaining ring assembly includes an inner diameter and a top surface, a plurality of outer drive rings wherein the plurality of outer drive rings are placed on the top surface of the ceramic retaining ring. The electrostatic chuck fixture includes an electrostatic chuck drive plate adjacent to the inner diameter of in the ceramic retaining ring. The electrostatic chuck drive plate has a lock to secure retaining ring assembly with the electrostatic chuck fixture without transferring the weight from one assembly over to the other through the locking mechanism.

公开(公告)号：US11648639B2

公开(公告)日：2023-05-16

申请号：US17457423

申请日：2021-12-02

Applicant: Applied Materials, Inc.

Inventor： William Ming-ye Lu ,  Wendell Glenn Boyd, Jr. ,  Stacy Meyer

IPC: B24B37/04 ,  B24B37/32 ,  H01L21/683

CPC classification number: B24B37/044 ,  B24B37/32 ,  H01L21/6831

Abstract: Embodiments of the present invention provide a polishing ring assembly suitable for polishing an electrostatic chuck and method of using the same. In one embodiment, the polishing ring assembly has a retaining ring assembly and an electrostatic chuck fixture. The retaining ring assembly includes an inner diameter and a top surface, a plurality of outer drive rings wherein the plurality of outer drive rings are placed on the top surface of the ceramic retaining ring. The electrostatic chuck fixture includes an electrostatic chuck drive plate adjacent to the inner diameter of in the ceramic retaining ring. The electrostatic chuck drive plate has a lock to secure retaining ring assembly with the electrostatic chuck fixture without transferring the weight from one assembly over to the other through the locking mechanism.

公开(公告)号：US09101954B2

公开(公告)日：2015-08-11

申请号：US14029108

申请日：2013-09-17

Applicant: Applied Materials, Inc.

Inventor： Jianqi Wang ,  William Ming-ye Lu ,  Yukari Nishimura ,  Joseph F. Sommers ,  Sio On Lo ,  Rajan Balesan

IPC: G03F7/00 ,  B05C21/00

CPC classification number: B05C21/005 ,  C23C14/564 ,  C23C16/4404 ,  Y10T428/24165 ,  Y10T428/24479

Abstract: A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.

Abstract translation: 提供了一种处理室部件及其制造方法。 处理室部件以本文所述的方式制造，并且包括在腔室部件的表面上产生至少宏观纹理。 宏观纹理由在腔室部件的表面上以预定方向布置的多个工程特征限定。 在一些实施例中，工程特征防止形成在特征之间限定的视线表面，以增强沉积在腔室部件上的膜的保留。