Geometries and patterns for surface texturing to increase deposition retention
    1.
    发明授权
    Geometries and patterns for surface texturing to increase deposition retention 有权
    用于表面纹理的几何图形和图案,以增加沉积保持力

    公开(公告)号:US09101954B2

    公开(公告)日:2015-08-11

    申请号:US14029108

    申请日:2013-09-17

    Abstract: A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.

    Abstract translation: 提供了一种处理室部件及其制造方法。 处理室部件以本文所述的方式制造,并且包括在腔室部件的表面上产生至少宏观纹理。 宏观纹理由在腔室部件的表面上以预定方向布置的多个工程特征限定。 在一些实施例中,工程特征防止形成在特征之间限定的视线表面,以增强沉积在腔室部件上的膜的保留。

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