知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

6 records (took 0.014 seconds)

    MANAGING THERMAL BUDGET IN ANNEALING OF SUBSTRATES
    1.
    发明申请
    MANAGING THERMAL BUDGET IN ANNEALING OF SUBSTRATES 有权
    管理衬底退火中的热预算

    公开(公告)号：US20150357215A1

    公开(公告)日：2015-12-10

    申请号：US14832564

    申请日：2015-08-21

    Applicant: Applied Materials, Inc.

    Inventor： STEPHEN MOFFATT ,  Abhilash J. MAYUR ,  Sundar RAMAMURTHY ,  Joseph M. RANISH ,  Aaron Muir HUNTER

    IPC: H01L21/67 ,  B23K26/06 ,  B23K26/08 ,  B23K26/00

    CPC classification number: H01L21/67115 ,  B23K26/0639 ,  B23K26/064 ,  B23K26/08 ,  B23K26/127 ,  F27B17/0025 ,  H01L21/67248

    Abstract: A method and apparatus are provided for treating a substrate. The substrate is positioned on a support in a thermal treatment chamber. Electromagnetic radiation is directed toward the substrate to anneal a portion of the substrate. Other electromagnetic radiation is directed toward the substrate to preheat a portion of the substrate. The preheating reduces thermal stresses at the boundary between the preheat region and the anneal region. Any number of anneal and preheat regions are contemplated, with varying shapes and temperature profiles, as needed for specific embodiments. Any convenient source of electromagnetic radiation may be used, such as lasers, heat lamps, white light lamps, or flash lamps.

    Abstract translation: 提供了一种处理基板的方法和装置。 衬底位于热处理室中的支撑件上。 电磁辐射被引向衬底以退火衬底的一部分。 其他电磁辐射被引向衬底以预热衬底的一部分。 预热减少了预热区域和退火区域之间的边界处的热应力。 根据具体实施方案的需要，预期任何数量的退火和预热区域具有变化的形状和温度曲线。 可以使用任何方便的电磁辐射源，例如激光器，加热灯，白光灯或闪光灯。

    APPARATUS AND METHODS FOR PHOTO-EXCITATION PROCESSES
    2.
    发明申请
    APPARATUS AND METHODS FOR PHOTO-EXCITATION PROCESSES 有权
    照相工艺的设备和方法

    公开(公告)号：US20140273416A1

    公开(公告)日：2014-09-18

    申请号：US14186837

    申请日：2014-02-21

    Applicant: Applied Materials, Inc.

    Inventor： STEPHEN MOFFATT

    IPC: H01L21/02 ,  C23C16/48

    CPC classification number: C23C16/483 ,  C23C16/28 ,  C23C16/45504 ,  C30B25/02 ,  C30B25/165 ,  C30B30/00 ,  H01L21/02521 ,  H01L21/0262

    Abstract: Embodiments of the invention provide a method and apparatus for depositing a layer on a substrate. In one embodiment, the method includes exposing a surface of the substrate disposed within a processing chamber to a fluid precursor, directing an electromagnetic radiation generated from a radiation source to a light scanning unit such that the electromagnetic radiation is deflected and scanned across the surface of the substrate upon which a material layer is to be formed, and initiating a deposition process with the electromagnetic radiation having a wavelength selected for photolytic dissociation of the fluid precursor to deposit the material layer onto the surface of the substrate. The radiation source may comprise a laser source, a bright light emitting diode (LED) source, or a thermal source. In one example, the radiation source is a fiber laser producing output in the ultraviolet (UV) wavelength range.

    Abstract translation: 本发明的实施例提供了一种用于在衬底上沉积层的方法和装置。 在一个实施例中，该方法包括将设置在处理室内的衬底的表面暴露于流体前体，将从辐射源产生的电磁辐射引导到光扫描单元，使得电磁辐射被偏转并扫描横过表面 要在其上形成材料层的衬底，并且开始沉积过程，其中电磁辐射具有选择用于光解离流体前体的波长，以将材料层沉积到衬底的表面上。 辐射源可以包括激光源，亮发光二极管（LED）源或热源。 在一个示例中，辐射源是在紫外（UV）波长范围内产生输出的光纤激光器。

    APPARATUS AND METHODS FOR PULSED PHOTO-EXCITED DEPOSITION AND ETCH
    4.
    发明申请
    APPARATUS AND METHODS FOR PULSED PHOTO-EXCITED DEPOSITION AND ETCH 有权
    用于脉冲照射沉积和蚀刻的装置和方法

    公开(公告)号：US20140263180A1

    公开(公告)日：2014-09-18

    申请号：US14186783

    申请日：2014-02-21

    Applicant: Applied Materials, Inc.

    Inventor： STEPHEN MOFFATT

    IPC: C23F4/00

    CPC classification number: C23C16/483 ,  C23C16/00 ,  C23C16/46 ,  C23C16/48 ,  C23C16/56 ,  H01L21/00 ,  H01L21/02529 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/0262 ,  H01L21/67069 ,  H01L31/1812 ,  Y02E10/50

    Abstract: Embodiments of the invention provide methods for processing a substrate within a processing chamber. In one embodiment, the method comprises providing a precursor gas mixture into the processing chamber, the precursor gas mixture comprising a deposition precursor gas and an etch precursor gas, subjecting the precursor gas mixture to a thermal energy from a heat source to deposit a material layer on a surface of the substrate, wherein the thermal energy is below the minimum required for pyrolysis of the etch precursor gas, and after the material layer is formed on the surface of the substrate, subjecting the precursor gas mixture to a photon energy from a radiation source, the photon energy having a wavelength and a power level selected to promote photolytic dissociation of the etch precursor gas over the deposition precursor gas and etch a portion of the material layer from the surface of the substrate.

    Abstract translation: 本发明的实施例提供了在处理室内处理衬底的方法。 在一个实施方案中，该方法包括将前体气体混合物提供到处理室中，前体气体混合物包含沉积前体气体和蚀刻前体气体，使来自热源的前体气体混合物经受热能以沉积材料层 在所述衬底的表面上，其中所述热能低于所述蚀刻前体气体的热解所需的最小值，并且在所述衬底表面上形成所述材料层之后，使所述前体气体混合物经受来自辐射的光子能量 源，具有选择波长和功率电平的光子能量以促进蚀刻前体气体在沉积前体气体上的光解离解，并从衬底的表面蚀刻材料层的一部分。

Patent Agency Ranking