公开(公告)号：US09418867B2

公开(公告)日：2016-08-16

申请号：US14152982

申请日：2014-01-10

Applicant: Applied Materials, Inc.

Inventor： Byungkook Kong ,  Hung Sang Kim ,  Hoon Sang Lee ,  Jeong Hyun Yoo ,  Jun-Wan Kim

IPC: H01L21/311 ,  H01L21/02 ,  H01L21/308 ,  H01L21/3213 ,  H01L21/30

CPC classification number: H01L21/31144 ,  H01L21/02118 ,  H01L21/02274 ,  H01L21/3003 ,  H01L21/3086 ,  H01L21/31122 ,  H01L21/32139

Abstract: A gas comprising hydrogen is supplied to a plasma source. Plasma comprising hydrogen plasma particles is generated from the gas. A passivation layer is deposited on a first mask layer on a second mask layer over a substrate using the hydrogen plasma particles.

Abstract translation: 包含氢的气体被供应到等离子体源。 从气体产生包含氢等离子体颗粒的等离子体。 使用氢等离子体颗粒，在衬底上的第二掩模层上的第一掩模层上沉积钝化层。

公开(公告)号：US20190115240A1

公开(公告)日：2019-04-18

申请号：US16213594

申请日：2018-12-07

Applicant: Applied Materials, Inc.

Inventor： Hung Sang Kim ,  Michael D. Willwerth

IPC: H01L21/683 ,  H01L21/67 ,  C23C16/458 ,  H01J37/32

Abstract: A gas flow is described to reduce condensation with a substrate processing chuck. In one example, a workpiece holder in the chamber having a puck to carry the workpiece for fabrication processes, a top plate thermally coupled to the puck, a cooling plate fastened to and thermally coupled to the top plate, the cooling plate having a cooling channel to carry a heat transfer fluid to transfer heat from the cooling plate, a base plate fastened to the cooling plate opposite the puck, and a dry gas inlet of the base plate to supply a dry gas under pressure to a space between the base plate and the cooling plate to drive ambient air from between the base plate and the cooling plate.

公开(公告)号：US20150200109A1

公开(公告)日：2015-07-16

申请号：US14152982

申请日：2014-01-10

Applicant: Applied Materials, Inc.

Inventor： Byungkook Kong ,  Hung Sang Kim ,  Hoon Sang Lee ,  Jeong Hyun Yoo ,  Jun-Wan Kim

IPC: H01L21/311 ,  C23C16/50 ,  H01L21/3213 ,  H01L21/02 ,  H01L21/308

CPC classification number: H01L21/31144 ,  H01L21/02118 ,  H01L21/02274 ,  H01L21/3003 ,  H01L21/3086 ,  H01L21/31122 ,  H01L21/32139

Abstract: A gas comprising hydrogen is supplied to a plasma source. Plasma comprising hydrogen plasma particles is generated from the gas. A passivation layer is deposited on a first mask layer on a second mask layer over a substrate using the hydrogen plasma particles.

Abstract translation: 包含氢的气体被供应到等离子体源。 从气体产生包含氢等离子体颗粒的等离子体。 使用氢等离子体颗粒，在衬底上的第二掩模层上的第一掩模层上沉积钝化层。