公开(公告)号：US20200017971A1

公开(公告)日：2020-01-16

申请号：US16032854

申请日：2018-07-11

Applicant: Applied Materials, Inc.

Inventor： Chien-Teh KAO ,  Jeffrey A. KHO ,  Xiangxin RUI ,  Jianhua ZHOU ,  Shinichi KURITA ,  Shouqian SHAO ,  Guangwei SUN

IPC: C23C16/455 ,  C23C16/44

Abstract: Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas and a gas flow outlet guide to effectively purge process gasses and reduce purge time. The chamber includes a chamber body having a process gas inlet and a process gas outlet, a lid assembly, a process gas inlet and a process gas outlet configured to be in fluid communication with a processing region in the chamber, a gas flow inlet guide disposed in the process gas inlet, and a gas flow outlet guide disposed in the process gas outlet. The gas flow inlet guide includes a flow modulator and at least two first inlet guide channels having first inlet guide channel areas that are different. The gas flow outlet guide includes at least two first outlet guide channels having first outlet guide channel areas that are different.