公开(公告)号：US20240409350A1

公开(公告)日：2024-12-12

申请号：US18697050

申请日：2021-10-26

Applicant: Frank SCHNAPPENBERGER ,  Applied Materials, Inc.

Inventor： Frank SCHNAPPENBERGER

IPC: B65H20/12 ,  B65H18/10 ,  H01L31/18

Abstract: An apparatus for transportation of a thin film substrate under vacuum conditions is described. The apparatus for transportation includes a rotatable roller with a substrate facing surface including a first substrate facing surface portion, wherein the substrate facing surface includes one or more gas outlets, wherein the one or more gas outlets are configured for releasing a gas flow and the roller includes a deposition region and at least one non-deposition region. The apparatus further includes a gas distribution for providing the gas flow through the one or more gas outlets into an interspace between the thin film substrate and the first substrate facing surface portion, and a sealing belt conveyor system including one or more sealing belts provided at the at least one non-deposition region.

公开(公告)号：US20230406663A1

公开(公告)日：2023-12-21

申请号：US18029860

申请日：2020-11-05

Applicant: Applied Materials, Inc.

Inventor： Frank SCHNAPPENBERGER ,  Thomas LEIPNITZ

IPC: B65H19/18

CPC classification number: B65H19/1873 ,  B65H2301/4631

Abstract: A roll exchange chamber for exchanging a substrate roll is described. The roll exchange chamber includes a rotatable base construction being rotatable around a central axis. The base construction comprises a first roll holder for holding a first substrate roll, a second roll holder for holding a second substrate roll, and a wall for providing a first compartment and a second compartment in the roll exchange chamber. The wall is arranged between the first roll holder and the second roll holder. Further, a roll-to-roll processing system with a roll exchange chamber as well as a method of continuously providing a flexible substrate in a roll-to-roll processing system are described.

公开(公告)号：US20220356027A1

公开(公告)日：2022-11-10

申请号：US17307195

申请日：2021-05-04

Applicant: Applied Materials, Inc.

Inventor： Thomas DEPPISCH ,  Stefan BANGERT ,  Claire ARMSTRONG ,  Frank SCHNAPPENBERGER

IPC: B65H27/00 ,  C23C14/56 ,  C23C16/54 ,  B23K26/382 ,  B65H20/02

Abstract: A roller for transporting a flexible substrate is described. The roller includes a main body having a plurality of gas supply slits provided in an outer surface of the main body. The plurality of gas supply slits extends in a direction of a central rotation axis of the roller. Further, the roller includes a sleeve provided circumferentially around and in contact with the main body. The sleeve has a plurality of gas outlets being provided above the plurality of gas supply slits. Further, the sleeve includes a metal layer embedded within isolating material.

公开(公告)号：US20230113276A1

公开(公告)日：2023-04-13

申请号：US17946716

申请日：2022-09-16

Applicant: Applied Materials, Inc.

Inventor： Wei-Sheng LEI ,  Girish Kumar GOPALAKRISHNAN NAIR ,  Kent Qiujing ZHAO ,  Daniel STOCK ,  Tobias STOLLEY ,  Thomas DEPPISCH ,  Jean DELMAS ,  Kenneth S. LEDFORD ,  Subramanya P. HERLE ,  Kiran VACHHANI ,  Mahendran CHIDAMBARAM ,  Roland TRASSL ,  Neil MORRISON ,  Frank SCHNAPPENBERGER ,  Kevin Laughton CUNNINGHAM ,  Stefan BANGERT ,  James CUSHING ,  Visweswaren SIVARAMAKRISHNAN

IPC: H01M50/102

Abstract: Methods and apparatuses for processing lithium batteries with a laser source having a wide process window, high efficiency, and low cost are provided. The laser source is adapted to achieve high average power and a high frequency of picosecond pulses. The laser source can produce a line-shaped beam either in a fixed position or in scanning mode. The system can be operated in a dry room or vacuum environment. The system can include a debris removal mechanism, for example, inert gas flow, to the processing site to remove debris produced during the patterning process.

公开(公告)号：US20200332413A1

公开(公告)日：2020-10-22

申请号：US16759696

申请日：2017-11-16

Applicant: Applied Materials, Inc.

Inventor： Claire ARMSTRONG ,  Frank SCHNAPPENBERGER ,  Thomas DEPPISCH

IPC: C23C14/54 ,  C23C14/24

Abstract: A method (100) of cooling a deposition source (200) is described. The method includes stopping (110) depositing material from the deposition source, the deposition source being arranged in a deposition chamber (250), and introducing (120) a cooling gas into the deposition chamber (250), the cooling gas comprising a thermal conductivity λ of λ≥0.05 [W/(m*K)]. Further, a chamber for cooling a deposition source is described. The chamber includes a deposition source being arranged in the chamber. Further, the chamber includes a cooling gas supply system configured for providing a cooling gas into the chamber, the cooling gas comprising a thermal conductivity λ of λ≥0.05 [W/(m*K)].

公开(公告)号：US20180135160A1

公开(公告)日：2018-05-17

申请号：US15852820

申请日：2017-12-22

Applicant: Applied Materials, Inc.

Inventor： Frank SCHNAPPENBERGER ,  Anke HELLMICH ,  Thomas KOCH ,  Thomas DEPPISCH

IPC: C23C14/00 ,  C23C14/54 ,  H01J37/32

CPC classification number: C23C14/0042 ,  C23C14/544 ,  H01J37/32449 ,  H01J37/32981 ,  H01J37/3299

Abstract: A method for controlling a gas supply to a process chamber is provided. The method includes: measuring a gas parameter by each of two or more sensors provided in the process chamber; determining a combined gas parameter from the measured gas parameters; and controlling the gas supply to the process chamber based on the determined combined gas parameter.