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公开(公告)号:US10236197B2
公开(公告)日:2019-03-19
申请号:US14589990
申请日:2015-01-05
Applicant: Applied Materials, Inc.
Inventor: Karthik Janakiraman , Abhijit Basu Mallick , Hari K. Ponnekanti , Mandyam Sriram , Alexandros T. Demos , Mukund Srinivasan , Juan Carlos Rocha-Alvarez , Dale R. Dubois
IPC: H01L21/67 , C23C16/458 , H01L21/687 , C23C14/58 , C23C14/50 , B05C13/00 , C23C16/56 , H01L21/677
Abstract: An apparatus and method for processing a substrate in a processing system containing a deposition chamber, a treatment chamber, and an isolation region, separating the deposition chamber from the treatment is described herein. The deposition chamber deposits a film on a substrate. The treatment chamber receives the substrate from the deposition chamber and alters the film deposited in the deposition chamber with a film property altering device. Processing systems and methods are provided in accordance with the above embodiment and other embodiments.
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公开(公告)号:US09725806B2
公开(公告)日:2017-08-08
申请号:US14738610
申请日:2015-06-12
Applicant: Applied Materials, Inc.
Inventor: Xing Lin , Bozhi Yang , Jianhua Zhou , Dale R. Dubois , Juan Carlos Rocha-Alvarez , Ramprakash Sankarakrishnan
IPC: C23C16/458 , H01L21/687 , H01L21/67 , H01J37/32
CPC classification number: H01L21/687 , C23C16/4586 , C23C16/50 , H01J37/32577 , H01J37/32724 , H01L21/67103 , H01L21/67109 , H01L21/68792
Abstract: A method and apparatus for a heated pedestal is provided. In one embodiment, the heated pedestal includes a body comprising a ceramic material, a plurality of heating elements encapsulated within the body, and one or more grooves formed in a surface of the body adjacent each of the plurality of heating elements, at least one side of the grooves being bounded by a ceramic plate.
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公开(公告)号:US10971389B2
公开(公告)日:2021-04-06
申请号:US16148639
申请日:2018-10-01
Applicant: Applied Materials, Inc.
Inventor: Xing Lin , Bozhi Yang , Jianhua Zhou , Dale R. Dubois , Juan Carlos Rocha-Alvarez , Ramprakash Sankarakrishnan
IPC: H01L21/687 , C23C16/458 , H01J37/32 , H01L21/67 , C23C16/50
Abstract: A method and apparatus for a heated pedestal is provided. In one embodiment, the heated pedestal includes a body comprising a ceramic material, a plurality of heating elements encapsulated within the body, and one or more grooves formed in a surface of the body adjacent each of the plurality of heating elements, at least one side of the grooves being bounded by a ceramic plate.
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公开(公告)号:US10113231B2
公开(公告)日:2018-10-30
申请号:US15138209
申请日:2016-04-25
Applicant: Applied Materials, Inc.
Inventor: Dale R. Dubois , Kalyanjit Ghosh , Kien N. Chuc , Mayur G. Kulkarni , Sanjeev Baluja , Yanjie Wang , Sungjin Kim
Abstract: A process chamber is provided including a sidewall, a substrate support having an outer ledge, and a gas inlet beneath the substrate support. The process chamber further includes a first liner disposed around a bottom surface of the outer ledge of the substrate support. The first liner has an inner surface separated from the outer ledge of the substrate support by a first gap. The process chamber further includes a flow isolator ring having an inner bottom surface disposed on the outer ledge of the substrate support and an outer bottom surface extending outwardly relative to the inner bottom surface, the outer bottom surface overlying the first gap.
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公开(公告)号:US10090187B2
公开(公告)日:2018-10-02
申请号:US15608472
申请日:2017-05-30
Applicant: Applied Materials, Inc.
Inventor: Xing Lin , Bozhi Yang , Jianhua Zhou , Dale R. Dubois , Juan Carlos Rocha-Alvarez , Ramprakash Sankarakrishnan
IPC: H05B3/68 , H01L21/687 , H01L21/67 , C23C16/458 , C23C16/50
Abstract: A method and apparatus for a heated pedestal is provided. In one embodiment, the heated pedestal includes a body comprising a ceramic material, a plurality of heating elements encapsulated within the body, and one or more grooves formed in a surface of the body adjacent each of the plurality of heating elements, at least one side of the grooves being bounded by a ceramic plate.
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