公开(公告)号：US20190257991A1

公开(公告)日：2019-08-22

申请号：US16333664

申请日：2016-10-12

Applicant: Applied Materials, Inc.

Inventor： Kevin CUNNINGHAM ,  Christopher BENCHER

IPC: G02B5/30 ,  G02F1/1335 ,  G02F1/1368 ,  F21V8/00

Abstract: A method for manufacturing a polarizer apparatus is described. The method includes forming a patterned resist structure having lines with a top surface and two or more side surfaces; depositing a conductive material over the patterned resist structure, wherein the conductive material is provided at the top surface and the two or more side surfaces, and wherein a layer structure is formed; and etching the layer structure to remove the conductive material from the top surface of the lines to form conductive lines of the conductive material at the two or more side surfaces.

公开(公告)号：US20240387481A1

公开(公告)日：2024-11-21

申请号：US18667090

申请日：2024-05-17

Applicant: Applied Materials, Inc.

Inventor： Joseph R. JOHNSON ,  Christopher BENCHER

IPC: H01L25/075 ,  H01L33/00 ,  H01L33/50

Abstract: Embodiments of the present disclosure relates to LED pixels and methods of fabricating LED pixels. The device includes a backplane, the backplane including a plurality of backplane electrodes, one or more LEDs, each LED having at least one LED electrode coupled a respective backplane electrode of the plurality of backplane electrode, at least two pixels, each pixel including sub-pixel isolation (SI) structures disposed over the LEDs, the SI structures defining wells of sub-pixels of each pixel, where a respective pixel includes three operational sub-pixels, each operational sub-pixel having an operational LED and a color conversion material disposed in each well, a defective LED sub-pixel, the defective LED sub-pixel having a defective LED, and where one of the at least two pixels has two operational sub-pixels having a same color conversion material disposed in each well.

公开(公告)号：US20180074311A1

公开(公告)日：2018-03-15

申请号：US15552064

申请日：2015-05-14

Applicant: Applied Materials, Inc.

Inventor： Edward BUDIARTO ,  Mehdi VAEZ-IRAVANI ,  Christopher BENCHER

IPC: G02B26/08 ,  G02B5/08 ,  G03F7/20

CPC classification number: G02B26/0833 ,  G02B5/0833 ,  G03F7/7015

Abstract: Embodiments described herein generally relate to a DMD. The DMD includes a base and a plurality of mirrors disposed on the base. Each mirror of the plurality of mirrors has a surface facing away from the base, and a structure is disposed on the surface of each mirror. The structure enhances the reflectance of the surface of each mirror, which enhances the efficiency of light manipulation and delivery.

公开(公告)号：US20180052396A1

公开(公告)日：2018-02-22

申请号：US15782425

申请日：2017-10-12

Applicant: Applied Materials, Inc.

Inventor： Peng XIE ,  Ludovic GODET ,  Christopher BENCHER

IPC: G03F7/38 ,  G03F7/26 ,  G03F7/004

CPC classification number: G03F7/38 ,  G03F7/0045 ,  G03F7/26

Abstract: Methods and apparatuses for minimizing line edge/width roughness in lines formed by photolithography are provided. The random diffusion of acid generated by a photoacid generator during a lithography process contributes to line edge/width roughness. Methods disclosed herein apply an electric field, a magnetic field, and/or a standing wave during photolithography processes. The field and/or standing wave application controls the diffusion of the acids generated by the photoacid generator along the line and spacing direction, preventing the line edge/width roughness that results from random diffusion. Apparatuses for carrying out the aforementioned methods are also disclosed herein.

公开(公告)号：US20160011518A1

公开(公告)日：2016-01-14

申请号：US14472306

申请日：2014-08-28

Applicant: Applied Materials, Inc.

Inventor： Peng XIE ,  Ludovic GODET ,  Christopher BENCHER

IPC: G03F7/38 ,  G03F7/20 ,  G03F7/16

CPC classification number: G03F7/38 ,  G03F7/0045 ,  G03F7/26

Abstract: Methods and apparatuses for minimizing line edge/width roughness in lines formed by photolithography are provided. The random diffusion of acid generated by a photoacid generator during a lithography process contributes to line edge/width roughness. Methods disclosed herein apply an electric field, a magnetic field, and/or a standing wave during photolithography processes. The field and/or standing wave application controls the diffusion of the acids generated by the photoacid generator along the line and spacing direction, preventing the line edge/width roughness that results from random diffusion. Apparatuses for carrying out the aforementioned methods are also disclosed herein.

Abstract translation: 提供了通过光刻形成的线中的线边缘/宽度粗糙度最小化的方法和装置。 在光刻过程中由光致酸发生器产生的酸的随机扩散有助于线边缘/宽度粗糙度。 本文公开的方法在光刻工艺期间施加电场，磁场和/或驻波。 场和/或驻波应用控制由光致酸发生器沿线和间隔方向产生的酸的扩散，防止由随机扩散引起的线边缘/宽度粗糙度。 用于实施上述方法的装置也在此公开。

公开(公告)号：US20150355549A1

公开(公告)日：2015-12-10

申请号：US14301184

申请日：2014-06-10

Applicant: Applied Materials, Inc.

Inventor： Peng XIE ,  Ludovic GODET ,  Tristan MA ,  Joseph C. OLSON ,  Christopher BENCHER

IPC: G03F7/38 ,  G03F7/20

CPC classification number: G03F7/38 ,  B82Y10/00 ,  G03F7/20 ,  G03F7/26 ,  G03F7/70

Abstract: Methods and apparatuses for minimizing line edge/width roughness in lines formed by photolithography are provided. The random diffusion of acid generated by a photoacid generator during a lithography process contributes to line edge/width roughness. Methods disclosed herein apply an electric field and/or a magnetic field during photolithography processes. The field application controls the diffusion of the acids generated by the photoacid generator along the line and spacing direction, preventing the line edge/width roughness that results from random diffusion. Apparatuses for carrying out the aforementioned methods are also disclosed herein.

Abstract translation: 提供了通过光刻形成的线中的线边缘/宽度粗糙度最小化的方法和装置。 在光刻过程中由光致酸发生器产生的酸的随机扩散有助于线边缘/宽度粗糙度。 本文公开的方法在光刻工艺期间施加电场和/或磁场。 场应用控制由光致酸发生器沿线和间隔方向产生的酸的扩散，防止由随机扩散引起的线边缘/宽度粗糙度。 用于实施上述方法的装置也在此公开。

公开(公告)号：US20150277232A1

公开(公告)日：2015-10-01

申请号：US14242690

申请日：2014-04-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Christopher BENCHER

IPC: G03F7/20

CPC classification number: G03F7/70275 ,  G03F7/70291

Abstract: Multi-beam pattern generators employing yaw correction when writing upon large substrates, and associated methods are disclosed. A multi-beam pattern generator may include a spatial light modulator (SLM) with independently controllable mirrors to reflect light onto a substrate to write a pattern. The pattern may be written in writing cycles where the substrate is moved to writing cycle zone locations. The light is reflected by the SLM onto the substrate by mirrors of the SLM in active positions to write the pattern upon the substrate. By determining a location and yaw of the substrate with respect to the SLM in each writing cycle, some mirrors of the SLM may be digitally controlled to either inactive positions or the active positions to compensate for the yaw of the substrate. In this manner, the pattern written upon the substrate may be precisely written with compensation for yaw.

Abstract translation: 公开了在大基板上写入时使用偏航校正的多光束图案发生器以及相关联的方法。 多光束图案发生器可以包括具有独立可控反射镜的空间光调制器（SLM），以将光反射到衬底上以写入图案。 该图案可以以写入周期写入，其中衬底被移动到写入周期区域位置。 通过SLM的反射镜将SLM的SLM反射到衬底上，从而将图案写入衬底。 通过在每个写周期中确定衬底相对于SLM的位置和偏转，SLM的一些反射镜可以被数字地控制到无效位置或有效位置以补偿衬底的偏转。 以这种方式，写入衬底的图案可以精确地写入偏航补偿。