公开(公告)号：US20190257991A1

公开(公告)日：2019-08-22

申请号：US16333664

申请日：2016-10-12

Applicant: Applied Materials, Inc.

Inventor： Kevin CUNNINGHAM ,  Christopher BENCHER

IPC: G02B5/30 ,  G02F1/1335 ,  G02F1/1368 ,  F21V8/00

Abstract: A method for manufacturing a polarizer apparatus is described. The method includes forming a patterned resist structure having lines with a top surface and two or more side surfaces; depositing a conductive material over the patterned resist structure, wherein the conductive material is provided at the top surface and the two or more side surfaces, and wherein a layer structure is formed; and etching the layer structure to remove the conductive material from the top surface of the lines to form conductive lines of the conductive material at the two or more side surfaces.