公开(公告)号：US20220155678A1

公开(公告)日：2022-05-19

申请号：US17527819

申请日：2021-11-16

Applicant: Applied Materials, Inc.

Inventor： Amita JOSHI ,  Andrew CEBALLOS ,  Kenichi OHNO ,  Rami HOURANI ,  Ludovic GODET

IPC: G03F7/00 ,  C09D7/40 ,  C09D7/62 ,  C09D7/65 ,  G03F7/16 ,  B05D1/00 ,  C23C16/40 ,  C23C16/455

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.

公开(公告)号：US20240094630A1

公开(公告)日：2024-03-21

申请号：US18521853

申请日：2023-11-28

Applicant: Applied Materials, Inc.

Inventor： Amita JOSHI ,  Andrew CEBALLOS ,  Kenichi OHNO ,  Rami HOURANI ,  Ludovic GODET

IPC: G03F7/00 ,  C09D7/40 ,  C09D7/62 ,  C09D7/65 ,  G03F7/16

CPC classification number: G03F7/0002 ,  C09D7/62 ,  C09D7/65 ,  C09D7/67 ,  G03F7/167

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more silicon-containing compounds.

公开(公告)号：US20220229370A1

公开(公告)日：2022-07-21

申请号：US17579349

申请日：2022-01-19

Applicant: Applied Materials, Inc.

Inventor： Jing JIANG ,  Suraj YADAV ,  Amita JOSHI ,  Vivian HSU

IPC: G03F7/20

Abstract: Apparatus and methods of performing nanoimprint lithography using an anti-slip landing ring are provided. In one embodiment, a process chamber for nanoimprint lithography is provided and includes a substrate support and a ring disposed on the substrate support. The ring has a top surface opposite the substrate support, and the top surface has a grid pattern. A bottom surface facing the substrate support has a different pattern compared to the grid pattern.

公开(公告)号：US20220221723A1

公开(公告)日：2022-07-14

申请号：US17647361

申请日：2022-01-07

Applicant: Applied Materials, Inc.

Inventor： Yige GAO ,  Rami HOURANI ,  Xiaopei DENG ,  Amita JOSHI ,  Ludovic GODET ,  Kangkang WANG

IPC: G02B27/01 ,  G02B6/24 ,  F21V8/00 ,  G02F1/225

Abstract: Embodiments described herein include a waveguide combiner having an edge coated with an optically absorbent composition and a method of coating the edge of the waveguide combiner with the optically absorbent composition. The optically absorbent composition includes one or more types of nanoparticles or microparticles, at least one of one or more dyes or one or more pigments, and a polymer matrix of one or more binders. The method includes producing an optically absorbent formulation. The optically absorbent formulation includes one or more types of particles, at least one of one or more dyes or one or more pigments, one or more binders, and one or more solvents. The optically absorbent formulation is applied on an edge of a waveguide combiner using an edge blackening tool. The formulation is cured with radiation to form the optically absorbent composition.

公开(公告)号：US20240319588A1

公开(公告)日：2024-09-26

申请号：US18678002

申请日：2024-05-30

Applicant: Applied Materials, Inc.

Inventor： Amita JOSHI ,  Ian Matthew MCMACKIN ,  Rami HOURANI ,  Yingdong LUO ,  Sivapackia GANAPATHIAPPAN ,  Ludovic GODET

IPC: G03F7/00 ,  B29C59/00 ,  B29C71/02 ,  B29C71/04 ,  B82Y10/00 ,  B82Y40/00 ,  C01G23/04 ,  C01G25/02 ,  C01G33/00

CPC classification number: G03F7/0002 ,  B29C59/005 ,  B29C71/02 ,  B29C71/04 ,  C01G23/043 ,  C01G25/02 ,  C01G33/00 ,  B82Y10/00 ,  B82Y40/00 ,  C01P2004/64

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, a method for preparing an imprinted surface is provided and includes disposing an imprint composition on a substrate, contacting the imprint composition with a stamp having a pattern, converting the imprint composition to an imprint material having the pattern, and removing the stamp from the imprint material. The imprint composition may contain one or more types of nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates.

公开(公告)号：US20210223686A1

公开(公告)日：2021-07-22

申请号：US16941304

申请日：2020-07-28

Applicant: Applied Materials, Inc.

Inventor： Amita JOSHI ,  Ian Matthew MCMACKIN ,  Rami HOURANI ,  Yingdong LUO ,  Sivapackia GANAPATHIAPPAN ,  Ludovic GODET

IPC: G03F7/00 ,  C01G23/04 ,  C01G33/00 ,  C01G25/02 ,  B29C59/00 ,  B29C71/04 ,  B29C71/02

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition contains one or more types of nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates.

公开(公告)号：US20240160099A1

公开(公告)日：2024-05-16

申请号：US18394133

申请日：2023-12-22

Applicant: Applied Materials, Inc.

Inventor： Andrew CEBALLOS ,  Rami HOURANI ,  Kenichi OHNO ,  Yuriy MELNIK ,  Amita JOSHI

IPC: G03F7/00 ,  C23C16/04 ,  C23C16/455 ,  G03F7/20 ,  H01L21/28

CPC classification number: G03F7/0002 ,  C23C16/045 ,  C23C16/45527 ,  C23C16/45553 ,  G03F7/0005 ,  G03F7/2004 ,  H01L21/28123 ,  B82Y10/00

Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.

公开(公告)号：US20210325778A1

公开(公告)日：2021-10-21

申请号：US17136959

申请日：2020-12-29

Applicant: Applied Materials, Inc.

Inventor： Andrew CEBALLOS ,  Rami HOURANI ,  Kenichi OHNO ,  Yuriy MELNIK ,  Amita JOSHI

IPC: G03F7/00 ,  H01L21/28

Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.

公开(公告)号：US20210325777A1

公开(公告)日：2021-10-21

申请号：US17136948

申请日：2020-12-29

Applicant: Applied Materials, Inc.

Inventor： Andrew CEBALLOS ,  Rami HOURANI ,  Kenichi OHNO ,  Yuriy MELNIK ,  Amita JOSHI

IPC: G03F7/00 ,  G03F7/20 ,  C23C16/455 ,  C23C16/04

Abstract: Embodiments of the present disclosure generally relate to optically densified nanoimprint films and processes for making these optically densified nanoimprint films, as well as optical devices containing the optically densified nanoimprint films. In one or more embodiments, a method of forming a nanoimprint film includes positioning a substrate containing a porous nanoimprint film within a processing chamber, where the porous nanoimprint film contains nanoparticles and voids between the nanoparticles, and the porous nanoimprint film has a refractive index of less than 2. The method also includes depositing a metal oxide on the porous nanoimprint film and within at least a portion of the voids to produce an optically densified nanoimprint film during an atomic layer deposition (ALD) process.