公开(公告)号：US20240111075A1

公开(公告)日：2024-04-04

申请号：US18275383

申请日：2022-01-31

Applicant: Applied Materials, Inc.

Inventor： Russell Chin Yee TEO ,  James CONNOLLY ,  Chien-An CHEN ,  Andrew CEBALLOS ,  Jing JIANG ,  Jhenghan YANG ,  Yongan XU

IPC: G02B1/00

CPC classification number: G02B1/002

Abstract: Embodiments described herein relate to flat optical devices with a coating layer including monolayers selected from the group consisting of molybdenum disulfide (MoS2), tungsten disulfide (WS2), tungsten diselenide (WSe2), molybdenum diselenide (MoSe2), molybdenum ditelluride (MoTe2), titanium disulfide (TlS2), zirconium disulfide (ZrS2), zirconium diselenide (ZrSe2), hafnium disulfide (HfS2), platinum disulfide (PtS2), tin disulfide (SnS2), or combinations thereof. The coating layer is disposed over a plurality of optical device structures of the optical device. The monolayers may alternate between the materials to form the coating layer or may be a uniform coating layer of a single material. The coating layer is disposed over each optical device structure of the plurality of optical device structures.

公开(公告)号：US20220229370A1

公开(公告)日：2022-07-21

申请号：US17579349

申请日：2022-01-19

Applicant: Applied Materials, Inc.

Inventor： Jing JIANG ,  Suraj YADAV ,  Amita JOSHI ,  Vivian HSU

IPC: G03F7/20

Abstract: Apparatus and methods of performing nanoimprint lithography using an anti-slip landing ring are provided. In one embodiment, a process chamber for nanoimprint lithography is provided and includes a substrate support and a ring disposed on the substrate support. The ring has a top surface opposite the substrate support, and the top surface has a grid pattern. A bottom surface facing the substrate support has a different pattern compared to the grid pattern.

公开(公告)号：US20220221788A1

公开(公告)日：2022-07-14

申请号：US17227065

申请日：2021-04-09

Applicant: Applied Materials, Inc.

Inventor： Jing JIANG ,  Jinxin FU

IPC: G03F7/00 ,  G02B27/01 ,  G02B6/124 ,  G02B6/136

Abstract: Embodiments described herein provide for methods of forming optical device structures having continuously increasing or decreasing duty cycles. One embodiment includes a device. The device includes a plurality of optical device structures. Each optical device structure of the plurality of optical device structures includes a plurality of discrete zones. Each discrete zone of the plurality of discrete zones has a critical dimension. The device further includes a plurality of transition zones disposed between two discrete zones of the plurality of discrete zones. The critical dimension of each transition zone of the plurality of transition zones continuously increases or decreases across a length of each optical device structure of the plurality of optical device structures.

公开(公告)号：US20220326611A1

公开(公告)日：2022-10-13

申请号：US17703315

申请日：2022-03-24

Applicant: Applied Materials, Inc.

Inventor： Jing JIANG ,  Chien-An CHEN ,  Rutger MEYER TIMMERMAN THIJSSEN

IPC: G03F7/00 ,  G03F7/20

Abstract: Methods of forming optical devices using nanoimprint lithography and etch processes are provided. In one embodiment, a method is provided that includes depositing a first resist layer on a substrate, the substrate having a hardmask disposed thereon, imprinting a first resist portion of the first resist layer with a first single-height stamp, etching the first resist portion of the first resist layer, etching a first hardmask portion of the hardmask corresponding to the first resist portion of the first resist layer, removing the first resist layer and depositing a second resist layer, imprinting a second resist portion of the second resist layer with a second single-height stamp, etching the second resist portion of the second resist layer, and etching a second hardmask portion of the hardmask corresponding to the second resist portion of the second resist layer.

公开(公告)号：US20230375919A1

公开(公告)日：2023-11-23

申请号：US18320683

申请日：2023-05-19

Applicant: Applied Materials, Inc.

Inventor： Jing JIANG ,  Kang LUO

IPC: G03F7/00 ,  G02B27/01

CPC classification number: G03F7/0002 ,  G02B27/0172 ,  G03F7/0005 ,  G02B2207/101 ,  G02B6/0038

Abstract: A system for nanoimprint lithography includes a master holder, a spacer, and a stamp support. The spacer supports the stamp support as a stamp material is cured to create a stamp. A method of forming an optical device using the nanoimprint lithography system with a spacer is provided. A system for the nanoimprint lithography may also include a master and a stamp support holder. The stamp support holder includes a plurality of projections defining a plurality of vacuum channels. The vacuum channels are in fluid communication with a vacuum source to support a stamp support as a stamp material is cured to create a stamp.