公开(公告)号：US10658223B2

公开(公告)日：2020-05-19

申请号：US15494840

申请日：2017-04-24

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Alexander S. Polyak

IPC: H01L21/683 ,  C23C16/458 ,  C23C16/44 ,  C23C16/455 ,  H01L21/687

Abstract: Susceptor assemblies comprising a susceptor with a support post are described. The susceptor has a body with a top surface and a bottom surface. The top surface has a plurality of recesses therein. The support post is connected to the bottom surface of the susceptor to rotate the susceptor assembly. The support post includes support post vacuum plenum in fluid communication with a susceptor vacuum plenum in the body of the susceptor. The support post also includes a purge gas line extending through the support post to a purge gas plenum in the body of the susceptor.

公开(公告)号：US10959294B2

公开(公告)日：2021-03-23

申请号：US15392453

申请日：2016-12-28

Applicant: Applied Materials, Inc.

Inventor： Alexander S. Polyak ,  Joseph Yudovsky ,  Garry K. Kwong

IPC: H05B3/18 ,  H01L21/67 ,  H01L21/687

Abstract: Heater assemblies comprising a cylindrical body with a surface and a central axis including a plurality of heating elements are described. The plurality of heating elements is axially spaced on the surface of the cylindrical body. Each of the heating elements forms an axially spaced heating zone. Each heating element has a spiral shape with an inner end and an outer end defining a length of the heating element. Each coil of the spiral shape is spaced from an adjacent coil by a distance sufficient to prevent arcing between adjacent coils.

公开(公告)号：US20170309512A1

公开(公告)日：2017-10-26

申请号：US15494840

申请日：2017-04-24

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Alexander S. Polyak

IPC: H01L21/687 ,  H01L21/67 ,  C23C16/458 ,  C23C16/455

CPC classification number: H01L21/68764 ,  C23C16/4412 ,  C23C16/45551 ,  C23C16/4584 ,  H01L21/6838 ,  H01L21/68735 ,  H01L21/68771 ,  H01L21/68792

Abstract: Susceptor assemblies comprising a susceptor with a support post are described. The susceptor has a body with a top surface and a bottom surface. The top surface has a plurality of recesses therein. The support post is connected to the bottom surface of the susceptor to rotate the susceptor assembly. The support post includes support post vacuum plenum in fluid communication with a susceptor vacuum plenum in the body of the susceptor. The support post also includes a purge gas line extending through the support post to a purge gas plenum in the body of the susceptor.

公开(公告)号：US20170196047A1

公开(公告)日：2017-07-06

申请号：US15392453

申请日：2016-12-28

Applicant: Applied Materials, Inc.

Inventor： Alexander S. Polyak ,  Joseph Yudovsky ,  Garry K. Kwong

IPC: H05B6/10 ,  H05B6/36

CPC classification number: H05B6/105 ,  H01L21/67103 ,  H01L21/68764 ,  H01L21/68771 ,  H05B6/362

Abstract: Heater assemblies comprising a cylindrical body with a surface and a central axis including a plurality of heating elements are described. The plurality of heating elements is axially spaced on the surface of the cylindrical body. Each of the heating elements forms an axially spaced heating zone. Each heating element has a spiral shape with an inner end and an outer end defining a length of the heating element. Each coil of the spiral shape is spaced from an adjacent coil by a distance sufficient to prevent arcing between adjacent coils.

公开(公告)号：US11798825B2

公开(公告)日：2023-10-24

申请号：US16396683

申请日：2019-04-27

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Alexander S. Polyak

IPC: H01L21/67 ,  H01L21/68 ,  H01L21/687 ,  C23C16/458 ,  C23C16/455

CPC classification number: H01L21/6719 ,  C23C16/4584 ,  C23C16/45544 ,  H01L21/67196 ,  H01L21/68 ,  H01L21/68764 ,  H01L21/68792 ,  H01L2221/68309

Abstract: Apparatus and methods of processing a substrate in a carousel processing chamber are described. A wafer pedestal has a support surface with a support shaft extending below the wafer pedestal. A roller pinion wheel is below the wafer support around the support shaft. The roller pinion wheel has a plurality of spokes in contact with the support shaft and a wheel with a plurality of roller pinions spaced around the outer periphery of the wheel. Processing chambers incorporating the wafer pedestal and processing methods using the wafer pedestal for in-situ rotation are also described.

公开(公告)号：US11085129B2

公开(公告)日：2021-08-10

申请号：US16685447

申请日：2019-11-15

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Alexander S. Polyak

IPC: C23C16/44 ,  C30B25/10 ,  H01L21/67 ,  H01L21/687 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  C30B25/12

Abstract: Susceptor assemblies comprising a susceptor with a top surface with a plurality of recesses and a bottom surface are described. A heater is positioned below the susceptor to heat the susceptor. A shield is positioned between the bottom surface of the susceptor and the heater. The shield increases deposition uniformity across the susceptor.

公开(公告)号：US20180155834A1

公开(公告)日：2018-06-07

申请号：US15827498

申请日：2017-11-30

Applicant: Applied Materials, Inc.

Inventor： Mukund Srinivasan ,  Hari Ponnekanti ,  Joseph Yudovsky ,  Alexander S. Polyak

IPC: C23C16/455 ,  H01L21/285 ,  H01L21/67 ,  H01L21/02

CPC classification number: C23C16/45544 ,  C23C16/45534 ,  C23C16/45542 ,  C23C16/45551 ,  C23C16/4583 ,  C23C16/54 ,  H01L21/02005 ,  H01L21/28562 ,  H01L21/67098 ,  H01L21/67167 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/68764 ,  H01L21/68771

Abstract: Processing platforms having a central transfer station with a robot, a first batch processing chamber connected to a first side of the central transfer station and a first single wafer processing chamber connected to a second side of the central transfer station, where the first batch processing chamber configured to process x wafers at a time for a batch time and the first single wafer processing chamber configured to process a wafer for about 1/x of the batch time. Methods of using the processing platforms and processing a plurality of wafers are also described.

公开(公告)号：US09022715B2

公开(公告)日：2015-05-05

申请号：US14029307

申请日：2013-09-17

Applicant: Applied Materials, Inc.

Inventor： Alexander S. Polyak ,  James L'Heureux ,  Christopher T. Lane ,  Susanne Schlaefer ,  Juergen Henrich ,  Josef Thomas Hoog ,  Calvin R. Augason

IPC: B65G53/46 ,  H01L21/677 ,  H01L21/67

CPC classification number: H01L21/677 ,  H01L21/67201

Abstract: Methods and apparatus for transferring one or more substrates from a first pressure environment to a second pressure environment is provided. In one embodiment, a load lock chamber is provided. The load lock chamber comprises a first circular housing, and a second circular housing disposed within and movable relative to the first circular housing, one of the first circular housing or the second circular housing comprising a plurality of discrete regions, wherein at least a portion of the plurality of discrete regions are in selective fluid communication with one of at least two vacuum pumps based on the angular position of the second circular housing relative to the first circular housing.

Abstract translation: 提供了将一个或多个基板从第一压力环境转移到第二压力环境的方法和装置。 在一个实施例中，提供了一种加载锁定室。 负载锁定室包括第一圆形壳体和设置在第一圆形壳体内并可相对于第一圆形壳体移动的第二圆形壳体，第一圆形壳体或第二圆形壳体中的一个包括多个离散区域，其中至少一部分 基于第二圆形壳体相对于第一圆形壳体的角位置，多个离散区域与至少两个真空泵中的一个选择性流体连通。

公开(公告)号：US10954596B2

公开(公告)日：2021-03-23

申请号：US16467817

申请日：2017-12-05

Applicant: Applied Materials, Inc.

Inventor： Alexander S. Polyak ,  Joseph Yudovsky

IPC: C23C16/40 ,  C23C16/455

Abstract: A dual channel showerhead comprising a first plurality of channels formed in the back surface of the showerhead and extending from a first end to a second end, a second plurality of channels formed through the thickness of the showerhead and extending from a first end to a second end, a first end plenum in fluid connection with the second plurality of channels at the first end and a second end plenum in fluid connection with the second plurality of channels at the second end. Processing chambers including the dual channel showerhead and a blocker ring separating the edge ring from the pumping ring are also discussed.

公开(公告)号：US20190333783A1

公开(公告)日：2019-10-31

申请号：US16396683

申请日：2019-04-27

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Alexander S. Polyak

IPC: H01L21/67 ,  C23C16/458 ,  C23C16/455 ,  H01L21/68 ,  H01L21/687

Abstract: Apparatus and methods of processing a substrate in a carousel processing chamber are described. A wafer pedestal has a support surface with a support shaft extending below the wafer pedestal. A roller pinion wheel is below the wafer support around the support shaft. The roller pinion wheel has a plurality of spokes in contact with the support shaft and a wheel with a plurality of roller pinions spaced around the outer periphery of the wheel. Processing chambers incorporating the wafer pedestal and processing methods using the wafer pedestal for in-situ rotation are also described.