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公开(公告)号：US09875884B2
公开(公告)日：2018-01-23
申请号：US14634745
申请日：2015-02-28
Applicant: Agilent Technologies, Inc.
Inventor： Viorica Lopez-Avila , Mark Denning , Mehrnoosh Vahidpour
CPC classification number: H01J49/102 , G01N21/714 , G01N30/95 , H01J27/16 , H01J49/0031 , H01J49/0409 , H01J49/049 , H01J49/105 , H01J49/161 , H05H1/46
Abstract: An ion source includes a plasma generator for supplying plasma at an ionization region proximate to a sample surface. The plasma generator applies energy that may be utilized for desorbing analytes from the sample surface as well as for generating plasma by which analytes are excited or ionized. Desorption and ionization/excitation may be controlled as individual modes. The ion source may be interfaced with an ion-based or optical-based spectrometer. A sample support may be provided, which may be capable of performing analytical separation.
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公开(公告)号：US09330889B2
公开(公告)日：2016-05-03
申请号：US13939373
申请日：2013-07-11
Applicant: AGILENT TECHNOLOGIES, INC.
Inventor： Mark Denning , Mehrnoosh Vahidpour
CPC classification number: H01J37/32247 , H05H1/46 , H05H2001/4667
Abstract: A plasma generation device, a system including a plasma generation device, and a method of generating plasma and vacuum UV (VUV) photons are described. In a representative embodiment, plasma generation device, includes: a substrate having a first surface and a second surface; a resonant ring-shaped structure disposed over the first surface of the substrate, the resonant ring-shaped structure having dimensions selected to support at least one standing wave having more than one electric field maximum along a length of the resonant ring-shaped structure; a ground plane disposed on the second surface of the substrate; and an apparatus configured to provide a gas at locations of the electric field maxima.
Abstract translation: 描述了等离子体产生装置，包括等离子体产生装置的系统和产生等离子体和真空UV（VUV）光子的方法。 在代表性的实施例中，等离子体产生装置包括：具有第一表面和第二表面的基底; 设置在所述基板的所述第一表面上的共振环形结构，所述共振环形结构具有选择为沿所述共振环形结构的长度支撑具有多于一个电场最大值的至少一个驻波的尺寸; 设置在所述基板的第二表面上的接地平面; 以及被配置为在电场最大值的位置处提供气体的装置。
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公开(公告)号：US09247629B2
公开(公告)日：2016-01-26
申请号：US13838474
申请日：2013-03-15
Applicant: Agilent Technologies, Inc.
Inventor： Mehrnoosh Vahidpour , Geraint Owen
CPC classification number: H05H1/26 , H05H1/30 , H05H1/46 , H05H2001/4622
Abstract: An apparatus includes an electromagnetic waveguide; an iris structure providing an iris in the waveguide. The iris structure may define an iris hole, a first iris slot at a first side of the iris hole, and a second iris slot at a second side of the iris hole. A plasma torch is disposed within the iris hole. An electric field in the waveguide changes direction from the first iris slot to the second iris slot. The plasma torch generates a plasma which is substantially symmetrical around a longitudinal axis of the plasma torch, such that the plasma may have a substantially toroidal shape. In some embodiments, a dielectric material is disposed in the iris hole, outside of the plasma torch. In some embodiments, the height of at least one of the iris slots is greater at the ends thereof than in the middle.
Abstract translation: 一种装置包括电磁波导; 在波导中提供虹膜的虹膜结构。 虹膜结构可以限定虹膜孔，在虹膜孔的第一侧的第一虹膜槽和在虹膜孔的第二侧的第二虹膜槽。 等离子体焰炬设置在虹膜孔内。 波导中的电场改变从第一光圈槽到第二光圈槽的方向。 等离子体焰炬产生基本上围绕等离子体焰炬的纵向轴对称的等离子体，使得等离子体可以具有基本上环形的形状。 在一些实施例中，电介质材料设置在等离子体焰炬的外部的虹膜孔中。 在一些实施例中，至少一个虹膜槽的高度在其端部比在中间大。
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公开(公告)号：US20160035550A1
公开(公告)日：2016-02-04
申请号：US14814147
申请日：2015-07-30
Applicant: Agilent Technologies, Inc.
Inventor： Gershon Perelman , Mark Denning , Mehrnoosh Vahidpour , Guthrie Partridge
CPC classification number: H01J49/00
Abstract: A mass spectrometry (MS) system may be cleaned by generating plasma and contacting an internal surface of the system to be cleaned with the plasma. The system may be switched between operating in an analytical mode and in a cleaning mode. In the analytical mode a sample is analyzed, and plasma may or may not be actively generated. In the cleaning mode the plasma is actively generated, and the sample may or may not be analyzed.
Abstract translation: 质谱（MS）系统可以通过产生等离子体并且与待清洁系统的内表面与等离子体接触来清洁。 可以在分析模式和清洁模式之间切换系统。 在分析模式下，分析样品，并且等离子体可能或可能不被主动产生。 在清洁模式中，主动地产生等离子体，并且样品可以被分析也可以不被分析。
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公开(公告)号：US20150015140A1
公开(公告)日：2015-01-15
申请号：US13939373
申请日：2013-07-11
Applicant: AGILENT TECHNOLOGIES, INC.
Inventor： Mark Denning , Mehrnoosh Vahidpour
IPC: H01J37/32
CPC classification number: H01J37/32247 , H05H1/46 , H05H2001/4667
Abstract: A plasma generation device, a system comprising a plasma generation device, and a method of generating plasma and vacuum UV (VUV) photons are described. In a representative embodiment, plasma generation device, comprises: a substrate having a first surface and a second surface; a resonant ring-shaped structure disposed aver the first surface of the substrate, the resonant ring-shaped structure having dimensions selected to support at least one standing wave having more than one electric field maximum along a length of the resonant ring-shaped structure; a ground plane disposed on the second surface of the substrate; and an apparatus configured to provide a gas at locations of the electric field maxima,
Abstract translation: 描述了等离子体产生装置，包括等离子体产生装置的系统和产生等离子体和真空UV（VUV）光子的方法。 在代表性的实施例中，等离子体产生装置包括：具有第一表面和第二表面的基底; 一个谐振环形结构，设置在基板的第一表面之外，所述共振环形结构的尺寸被选择为沿着所述谐振环形结构的长度支撑具有多于一个电场最大值的至少一个驻波; 设置在所述基板的第二表面上的接地平面; 以及被配置为在电场最大值的位置处提供气体的装置，
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Patent Agency Ranking
公开(公告)号：US20140265850A1
公开(公告)日：2014-09-18
申请号：US13838474
申请日：2013-03-15
Applicant: AGILENT TECHNOLOGIES, INC.
Inventor： Mehrnoosh Vahidpour , Geraint Owen
IPC: H05H1/26
CPC classification number: H05H1/26 , H05H1/30 , H05H1/46 , H05H2001/4622
Abstract: An apparatus includes an electromagnetic waveguide; an iris structure providing an iris in the waveguide. The iris structure may define an iris hole, a first iris slot at a first side of the iris hole, and a second iris slot at a second side of the iris hole. A plasma torch is disposed within the iris hole. An electric field in the waveguide changes direction from the first iris slot to the second iris slot. The plasma torch generates a plasma which is substantially symmetrical around a longitudinal axis of the plasma torch, such that the plasma may have a substantially toroidal shape. In some embodiments, a dielectric material is disposed in the iris hole, outside of the plasma torch. In some embodiments, the height of at least one of the iris slots is greater at the ends thereof than in the middle.
Abstract translation: 一种装置包括电磁波导; 在波导中提供虹膜的虹膜结构。 虹膜结构可以限定虹膜孔，在虹膜孔的第一侧的第一虹膜槽和在虹膜孔的第二侧的第二虹膜槽。 等离子体焰炬设置在虹膜孔内。 波导中的电场改变从第一光圈槽到第二光圈槽的方向。 等离子体焰炬产生基本上围绕等离子体焰炬的纵向轴对称的等离子体，使得等离子体可以具有基本上环形的形状。 在一些实施例中，电介质材料设置在等离子体焰炬的外部的虹膜孔中。 在一些实施例中，至少一个虹膜槽的高度在其端部比在中间大。
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公开(公告)号：US08773225B1
公开(公告)日：2014-07-08
申请号：US13839028
申请日：2013-03-15
Applicant: Agilent Technologies, Inc.
Inventor： Mehrnoosh Vahidpour , Miao Zhu , Geraint Owen
CPC classification number: H01P5/12 , H01P1/208 , H01P5/024 , H05H1/46 , H05H2001/4622
Abstract: An apparatus includes: an electromagnetic waveguide and an iris structure providing an iris in the electromagnetic waveguide. The iris structure defines an iris hole. The apparatus further includes an electric field rotation arrangement configured to establish a 2N-pole electric field around a circumference of the iris hole, wherein N is an integer which is at least two. The electric field rotation arrangement may include at least four iris slots, each in communication with the iris hole, wherein a first one of the iris slots is further in disposed at a first side of the iris hole and a second one of the iris slots is disposed at a second side of the iris hole which is opposite the first side.
Abstract translation: 一种装置包括：电磁波导和在电磁波导中提供虹膜的虹膜结构。 虹膜结构定义了虹膜孔。 该装置还包括电场旋转装置，其被配置为在虹膜孔的圆周周围建立2N极电场，其中N是至少为2的整数。 电场旋转装置可以包括至少四个光圈槽，每个光阑槽与光阑孔连通，其中虹膜槽中的第一个进一步设置在虹膜孔的第一侧，并且第二个虹膜槽是 设置在与第一侧相对的虹膜孔的第二侧。
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公开(公告)号：US09589775B2
公开(公告)日：2017-03-07
申请号：US14814147
申请日：2015-07-30
Applicant: Agilent Technologies, Inc.
Inventor： Gershon Perelman , Mark Denning , Mehrnoosh Vahidpour , Guthrie Partridge
CPC classification number: H01J49/00
Abstract: A mass spectrometry (MS) system may be cleaned by generating plasma and contacting an internal surface of the system to be cleaned with the plasma. The system may be switched between operating in an analytical mode and in a cleaning mode. In the analytical mode a sample is analyzed, and plasma may or may not be actively generated. In the cleaning mode the plasma is actively generated, and the sample may or may not be analyzed.
Abstract translation: 质谱（MS）系统可以通过产生等离子体并且与待清洁系统的内表面与等离子体接触来清洁。 可以在分析模式和清洁模式之间切换系统。 在分析模式下，分析样品，并且等离子体可能或可能不被主动产生。 在清洁模式中，主动地产生等离子体，并且样品可以被分析也可以不被分析。
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公开(公告)号：US20150282289A1
公开(公告)日：2015-10-01
申请号：US14229779
申请日：2014-03-28
Applicant: Agilent Technologies, Inc.
Inventor： Mehrnoosh Vahidpour , Peter T. Williams , Syed Zaidi
CPC classification number: H05H1/30 , G01J3/443 , H01J49/421 , H01P3/127
Abstract: An apparatus includes an electromagnetic which supports propagation of an electromagnetic wave in a first direction between a first end thereof and a second end thereof, and an electromagnetic-field shaping structure within the electromagnetic waveguide. The electromagnetic-field shaping structure defines a channel extending from a first aperture in a first wall of the apparatus to a second aperture in a second, opposite, wall. The channel has an axis extending in a second direction which is nonparallel with the first direction. The distance between the first aperture and the second aperture in the second direction is less than the width of the interior region of the waveguide at the first and second ends thereof. In some embodiments, a plasma torch is disposed within the channel. The length of the torch closely matches its interaction region.
Abstract translation: 一种装置，包括电磁波，其支持电磁波在其第一端和第二端之间沿第一方向的传播，以及电磁波成形结构。 电磁场成形结构限定了从设备的第一壁中的第一孔延伸到第二相对的壁中的第二孔的通道。 通道具有沿与第一方向不平行的第二方向延伸的轴。 第一孔和第二孔在第二方向上的距离小于波导在其第一和第二端处的内部区域的宽度。 在一些实施例中，等离子体焰炬设置在通道内。 火炬的长度与其相互作用区域紧密匹配。
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公开(公告)号：US20160254133A1
公开(公告)日：2016-09-01
申请号：US14634745
申请日：2015-02-28
Applicant: Agilent Technologies, Inc.
Inventor： Viorica Lopez-Avila , Mark Denning , Mehrnoosh Vahidpour
CPC classification number: H01J49/102 , G01N21/714 , G01N30/95 , H01J27/16 , H01J49/0031 , H01J49/0409 , H01J49/049 , H01J49/105 , H01J49/161 , H05H1/46
Abstract: An ion source includes a plasma generator for supplying plasma at an ionization region proximate to a sample surface. The plasma generator applies energy that may be utilized for desorbing analytes from the sample surface as well as for generating plasma by which analytes are excited or ionized. Desorption and ionization/excitation may be controlled as individual modes. The ion source may be interfaced with an ion-based or optical-based spectrometer. A sample support may be provided, which may be capable of performing analytical separation.
Abstract translation: 离子源包括用于在靠近样品表面的电离区域提供等离子体的等离子体发生器。 等离子体发生器施加可用于从样品表面解吸分析物的能量，以及产生分析物被激发或电离的等离子体。 解吸和电离/激发可以作为各种模式来控制。 离子源可以与基于离子或光学的光谱仪接口。 可以提供样品载体，其可以进行分析分离。
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