Invention Grant
- Patent Title: Plasma cleaning for mass spectrometers
- Patent Title (中): 质谱仪等离子体清洗
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Application No.: US14814147Application Date: 2015-07-30
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Publication No.: US09589775B2Publication Date: 2017-03-07
- Inventor: Gershon Perelman , Mark Denning , Mehrnoosh Vahidpour , Guthrie Partridge
- Applicant: Agilent Technologies, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Agilent Technologies, Inc.
- Current Assignee: Agilent Technologies, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01J49/26
- IPC: H01J49/26 ; H01J49/00

Abstract:
A mass spectrometry (MS) system may be cleaned by generating plasma and contacting an internal surface of the system to be cleaned with the plasma. The system may be switched between operating in an analytical mode and in a cleaning mode. In the analytical mode a sample is analyzed, and plasma may or may not be actively generated. In the cleaning mode the plasma is actively generated, and the sample may or may not be analyzed.
Public/Granted literature
- US20160035550A1 PLASMA CLEANING FOR MASS SPECTROMETERS Public/Granted day:2016-02-04
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