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公开(公告)号：US20240292510A1
公开(公告)日：2024-08-29
申请号：US18571490
申请日：2022-06-02
Applicant: ASML Netherlands B.V.
Inventor： Alexander Igorevich Ershov , Theodorus Wilhelmus Driessen , Dietmar Uwe Herbert Trees , Vikas Giridhar Telkar
IPC: H05G2/00
Abstract: Apparatus for and method of accelerating droplets used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting a nozzle (200) in a stream that breaks up into droplets that then undergo coalescence. A gas provided for the purpose of accelerating the droplets is caused to flow past the nozzle in a streamwise direction.
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公开(公告)号：US20240164004A1
公开(公告)日：2024-05-16
申请号：US18280917
申请日：2022-02-10
Applicant: ASML Netherlands B.V.
Inventor： Dietmar Uwe Herbert Trees , Theodorus Wilhelmus Driessen , Benjamin Andrew Sams , Edgardo Zamora Atencio , Ondrej Dvorak
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/008
Abstract: A component for a target material transfer system for a laser-produced plasma radiation source and a method of manufacturing such a component are disclosed. The component, which may, for example, be a target material transfer line, a freeze valve, or a flow restrictor, or some combination of this functionality, is made up of a glass capillary body sealed with glass-to-metal seals at both of its ends to a respective metal fitting. The method of manufacturing involves heating the ends of the glass capillary and then forming them to conform with, and forming a glass-to-metal seal with, the interior contours of the respective channels in each of the metal fittings.
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公开(公告)号：US10481498B2
公开(公告)日：2019-11-19
申请号：US16061847
申请日：2016-12-15
Applicant: ASML Netherlands B.V.
Inventor： Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Koen Gerhardus Winkels , Theodorus Wilhelmus Driessen , Georgiy O. Vaschenko , Peter Michael Baumgart , Wilhelmus Henricus Theodorus Maria Aangenent , Jan Okke Nieuwenkamp , Wim Ronald Kampinga , Jari Ruotsalainen
Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.
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4.发明授权公开(公告)号：US12295088B2
公开(公告)日：2025-05-06
申请号：US17922056
申请日：2021-04-26
Applicant: ASML Netherlands B.V.
Inventor： Benjamin Andrew Sams , Dietmar Uwe Herbert Trees , Theodorus Wilhelmus Driessen , Herman Harry Borggreve , Brandon Michael Johnson , Vikas Giridhar Telkar
Abstract: A droplet generator nozzle (800, 820/830) includes a metal body (802, 822), a metal fitting (812, 823/833) arranged adjacent to the metal body, and a capillary (804, 824/834) comprising a first end and a second end. The first end of the capillary is disposed within the metal fitting, and the capillary is configured to eject initial droplets of a material from the second end of the capillary. The droplet generator nozzle further includes an electromechanical element (808 828/838) disposed within the metal body and coupled to the first end of the capillary and a fastener element (810) configured to clamp around a portion of the metal body and around the metal fitting. The electromechanical element is configured to apply a change that affects droplet generation from the capillary. The second end of the capillary protrudes out from an opening in the fastener element of the droplet generator nozzle. Droplet generator nozzle 830 of FIG. 8C represents the embodiment shown in FIG. 8B, in a cross section orthogonal to the cross section shown in FIG. 8B.
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公开(公告)号：US20230279974A1
公开(公告)日：2023-09-07
申请号：US18010312
申请日：2021-07-13
Applicant: ASML Netherlands B.V.
Inventor： Benjamin Andrew Sams , Dietmar Uwe Herbert Trees , Vikas Giridhar Telkar , Alexander Igorevich Ershov , Theodorus Wilhelmus Driessen , Serkan Kincal
IPC: F16L17/02
Abstract: A target material supply apparatus includes: first and second fluid flow components (1122, 1126) that define an axial flow path when joined together, in which the axial flow path is between a source of target material fluid and a nozzle supply apparatus; and a coupling apparatus configured to seal the joint between the first and second fluid flow components. The coupling apparatus includes a gasket (1105) having an annular shape defining an inner opening that is a part of the axial flow path when seated and sealed. When the gasket is seated between the first and second fluid flow components to thereby seal the joint formed by attaching the first and second fluid flow components, pressure applied to the gasket from target material fluid traversing the gasket inner opening along the axial flow path improves the hermetic function of the seal at the joint. Optionally, a functional insert like e.g. a flow restrictor (1160) can be seated in the gasket.
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Patent Agency Ranking
公开(公告)号：US20180364580A1
公开(公告)日：2018-12-20
申请号：US16061847
申请日：2016-12-15
Applicant: ASML Netherlands B.V.
Inventor： Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Koen Gerhardus Winkels , Theodorus Wilhelmus Driessen , Georgiy O. Vaschenko , Peter Michael Baumgart , Wilhelmus Henricus Theodorus Maria Aangenent , Jan Okke Nieuwenkamp , Wim Ronald Kampinga , Jari Ruotsalainen
CPC classification number: G03F7/70033 , H05G2/006 , H05G2/008
Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.
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公开(公告)号：US12222050B2
公开(公告)日：2025-02-11
申请号：US18010312
申请日：2021-07-13
Applicant: ASML Netherlands B.V.
Inventor： Benjamin Andrew Sams , Dietmar Uwe Herbert Trees , Vikas Giridhar Telkar , Alexander Igorevich Ershov , Theodorus Wilhelmus Driessen , Serkan Kincal
Abstract: A target material supply apparatus includes: first and second fluid flow components (1122, 1126) that define an axial flow path when joined together, in which the axial flow path is between a source of target material fluid and a nozzle supply apparatus; and a coupling apparatus configured to seal the joint between the first and second fluid flow components. The coupling apparatus includes a gasket (1105) having an annular shape defining an inner opening that is a part of the axial flow path when seated and sealed. When the gasket is seated between the first and second fluid flow components to thereby seal the joint formed by attaching the first and second fluid flow components, pressure applied to the gasket from target material fluid traversing the gasket inner opening along the axial flow path improves the hermetic function of the seal at the joint. Optionally, a functional insert like e.g. a flow restrictor (1160) can be seated in the gasket.
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公开(公告)号：US20220213981A1
公开(公告)日：2022-07-07
申请号：US17609842
申请日：2020-05-22
Applicant: ASML Netherlands B.V.
Inventor： Benjamin Andrew Sams , Dietmar Uwe Herbert Trees , Theodorus Wilhelmus Driessen , Bob Rollinger
Abstract: A fluid control device (100) includes a structure (120) defining a valve cavity, a first fluid port (135), a second fluid port (140), and a third fluid port (145) configured to be fluidly coupled to a hermetic interior (105) of a body; and a plunger valve (130) within the valve cavity and configured to move between first and second modes while maintaining the hermetic interior of the body. In the first mode, the plunger valve is open such that a first fluid flow path is open between the hermetic interior and the first fluid port and fluid is free to pass between the first fluid port and the hermetic interior. In the second mode, the plunger valve is closed such that the first fluid port is blocked from the hermetic interior by the plunger valve and a second fluid flow path is open between the hermetic interior and the second fluid port.
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公开(公告)号：US10904994B2
公开(公告)日：2021-01-26
申请号：US16671348
申请日：2019-11-01
Applicant: ASML Netherlands B.V.
Inventor： Koen Gerhardus Winkels , Georgiy O. Vaschenko , Theodorus Wilhelmus Driessen , Johan Frederik Dijksman , Bastiaan Lambertus Wilhelmus Marinus van de Ven , Wilhelmus Henricus Theodorus Maria Aangenent
Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.
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10.发明公开公开(公告)号：US20230171869A1
公开(公告)日：2023-06-01
申请号：US17922056
申请日：2021-04-26
Applicant: ASML Netherlands B.V.
Inventor： Benjamin Andrew Sams , Dietmar Uwe Herbert Trees , Theodorus Wilhelmus Driessen , Herman Harry Borggreve , Brandon Michael Johnson , Vikas Giridhar Telkar
CPC classification number: H05G2/006 , B05B1/02 , G03F7/70033 , H05G2/008
Abstract: A droplet generator nozzle (800, 820/830) includes a metal body (802, 822), a metal fitting (812, 823/833) arranged adjacent to the metal body, and a capillary (804, 824/834) comprising a first end and a second end. The first end of the capillary is disposed within the metal fitting, and the capillary is configured to eject initial droplets of a material from the second end of the capillary. The droplet generator nozzle further includes an electromechanical element (808 828/838) disposed within the metal body and coupled to the first end of the capillary and a fastener element (810) configured to clamp around a portion of the metal body and around the metal fitting. The electromechanical element is configured to apply a change that affects droplet generation from the capillary. The second end of the capillary protrudes out from an opening in the fastener element of the droplet generator nozzle. Droplet generator nozzle 830 of FIG. 8C represents the embodiment shown in FIG. 8B, in a cross section orthogonal to the cross section shown in FIG. 8B.
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