公开(公告)号：US20190361357A1

公开(公告)日：2019-11-28

申请号：US16477955

申请日：2017-12-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Jeroen Johan Emanuel HOEFNAGELS ,  Ronald Frank KOX ,  John Maria BOMBEECK ,  Johannes Cornelis Paulus MELMAN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Patricius Jacobus NEEFS

IPC: G03F7/20

Abstract: A device manufacturing method includes: confining a liquid to an immersion space between a projection system and an object; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object; moving the support table along a route comprising a series of motions such that a plurality of target positions on the object pass under the projection system; projecting through the immersion space a beam onto the target portions as the target portions pass under the projection system, the projecting performed to account for a certain predetermined thermal profile in the object; and stopping application of the underpressure at a predetermined time after the immersion space moves off the object for the last time during the series of motions to at least partly induce the certain predetermined thermal profile in the object.

公开(公告)号：US20220171299A1

公开(公告)日：2022-06-02

申请号：US17599302

申请日：2020-01-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Ruud Hendrikus Martinus Johannes BLOKS ,  Hendrik Cornelis Anton BORGER ,  Frederik Eduard DE JONG ,  Johan Gertrudis Cornelis KUNNEN ,  Siebe LANDHEER ,  Chung-Hsun LI ,  Patricius Jacobus NEEFS ,  Georgios TSIROGIANNIS ,  Si-Han ZENG

IPC: G03F7/20

Abstract: A method of determining an overlay value of a substrate, the method including: obtaining temperature data that includes data on measured temperature at one or more positions on a substrate table after a substrate has been loaded onto the substrate table; and determining an overlay value of the substrate in dependence on the obtained temperature data. There is further disclosed a method of determining a performance of a clamping by a substrate table using a determined overlay value.

公开(公告)号：US20170212429A1

公开(公告)日：2017-07-27

申请号：US15329536

申请日：2015-07-16

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik KOEVOETS ,  Christianus Wilhelmus Johannes BERENDSEN ,  Rogier Hendrikus Magdalena CORTIE ,  Jim Vincent OVERKAMP ,  Patricius Jacobus NEEFS ,  Putra SAPUTRA ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Michael Johannes Hendrika Wilhelmina RENDERS ,  Johan Gertrudis Cornelis KUNNEN ,  Thibault Simon Mathieu LAURENT

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two- phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.