公开(公告)号：US20240302164A1

公开(公告)日：2024-09-12

申请号：US18580062

申请日：2022-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Tzu-Yi YANG ,  Richard Carl ZIMMERMAN ,  Adel JOOBEUR ,  Yevgeniy Konstantinovich SHMAREV

IPC: G01B11/27 ,  G03F7/00

CPC classification number: G01B11/272 ,  G03F7/70633 ,  G03F7/706849 ,  G03F7/706851

Abstract: An optical element, and a metrology tool or system employing the optical element for measurements of structures on a substrate. The optical element includes a first portion configured to reflect the light received from an illumination source towards the substrate, and a second portion configured to transmit the light redirected from the substrate or a desired location, the first portion having a higher coefficient of reflectivity than the second portion, and the second portion having a higher coefficient of transmissivity than the first portion. A metrology tool may include the optical elements and a sensor configured to receive a diffraction pattern caused by radiation redirected from a substrate, and a processor configured to receive a signal relating to the diffraction pattern from the sensor, and determine overlay associated with the substrate by analyzing the signal.

公开(公告)号：US20170191944A1

公开(公告)日：2017-07-06

申请号：US15387610

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Yevgeniy Konstantinovich SHMAREV ,  Stanislav SMIRNOV ,  Chien-Hung TSENG ,  Armand Eugene Albert KOOLEN

IPC: G01N21/88 ,  G01N21/95 ,  G03F7/20 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/95676 ,  G01N2201/0638 ,  G03F7/70625 ,  G03F7/70641

Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.

公开(公告)号：US20190155172A1

公开(公告)日：2019-05-23

申请号：US16313816

申请日：2017-06-16

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Yevgeniy Konstantinovich SHMAREV ,  Markus Franciscus Antonius EURLINGS

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/956

CPC classification number: G03F7/70625 ,  G01N21/47 ,  G01N21/956 ,  G02B5/005 ,  G02B26/0833 ,  G02B27/283 ,  G03F7/70633

Abstract: An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.