公开(公告)号：US09377697B2

公开(公告)日：2016-06-28

申请号：US14648620

申请日：2013-12-20

Applicant: ASML Netherlands B.V.

Inventor： Mark Johannes Hermanus Frencken ,  Andre Bernardus Jeunink ,  Frederikus Johannes Maria De Vreede ,  Gijs Kramer

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733

Abstract: An immersion lithographic apparatus includes a projection system, a first table with a first planar surface and a second table with a second planar surface, the first and second planar surfaces being substantially coplanar, a liquid confinement system configured to spatially confine an immersion liquid to a volume with a first surface area that is coplanar with the first and second planar surfaces, and is substantially smaller than a second surface area of the top surface of the substrate, and a swap bridge member attached to the first table, the swap bridge member having an upper surface that is substantially coplanar with the first and second planar surfaces, wherein the upper surface of the swap bridge member is configured to serve as part of the liquid confinement system and to deform when the swap bridge member collides with the second table and to remain attached to the first table.

Abstract translation: 浸没式光刻设备包括投影系统，具有第一平面表面的第一工作台和具有第二平面表面的第二工作台，第一和第二平面表面基本上共面;液体限制系统构造成将浸没液体空间地限制在 体积，其具有与第一和第二平坦表面共面的第一表面区域，并且基本上小于衬底的顶表面的第二表面区域，以及附接到第一工作台的交换桥接构件，交换桥接构件具有 与第一和第二平面基本上共面的上表面，其中交换桥接件的上表面构造成用作液体限制系统的一部分，并且当交换桥件与第二工作台碰撞时变形， 留在第一张桌子上。

公开(公告)号：US11860554B2

公开(公告)日：2024-01-02

申请号：US17606785

申请日：2020-03-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Mark Johannes Hermanus Frencken ,  Theodorus Marcus Nagtegaal ,  Oleg Viacheslavovich Voznyi

IPC: G03F7/00

CPC classification number: G03F7/70783 ,  G03F7/7075 ,  G03F7/70875

Abstract: The invention provides an object positioner comprising:—an object support having an object support surface which is configured to engage at least a part of an object, said object support surface having a support surface temperature,—a thermal device, which thermal device is configured to provide at least a part of the object with a first object temperature, which first object temperature differs from the support surface temperature by a first predetermined temperature difference.

公开(公告)号：US11243476B2

公开(公告)日：2022-02-08

申请号：US17050149

申请日：2019-03-27

Applicant: ASML Netherlands B.V.

Inventor： Ringo Petrus Cornelis Van Dorst ,  Gijs Kramer ,  Benjamin Cunnegonda Henricus Smeets ,  Mark Johannes Hermanus Frencken

IPC: G03F7/20 ,  H01L21/67

Abstract: The invention provides a stage apparatus comprising an object support, a plurality of support members, a gripper and a control unit. The object support comprises a surface for mounting an object on, the surface extending in a plane. The plurality of support members are for supporting the object, and are arranged to receive the object from a gripper and to arrange the object on the surface and/or vice versa. The support members are moveable in at least a first direction which is perpendicular to the plane. The control unit is arranged to receive shape information regarding an out-of-plane-shape of the object, and is arranged to control positions of the support members. The control unit is arranged to tilt the object while supported by the support members by controlling the positions so as to reduce a space consumption of the object in the first direction, based on the shape information.

公开(公告)号：US11860546B2

公开(公告)日：2024-01-02

申请号：US17952119

申请日：2022-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70525

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11579533B2

公开(公告)日：2023-02-14

申请号：US17151291

申请日：2021-01-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes Nakiboglu ,  Coen Hubertus Matheus Baltis ,  Siegfried Alexander Tromp ,  Yuri Johannes Gabriël Van De Vijver ,  Bert Dirk Scholten ,  Daan Daniel Johannes Antonius Van Sommeren ,  Mark Johannes Hermanus Frencken

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

公开(公告)号：US11454892B2

公开(公告)日：2022-09-27

申请号：US17315650

申请日：2021-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US11029607B2

公开(公告)日：2021-06-08

申请号：US16330544

申请日：2017-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn Van Den Eijnden ,  Cornelius Maria Rops ,  Theodorus Wilhelmus Polet ,  Floor Lodewijk Keukens ,  Gheorghe Tanasa ,  Rogier Hendrikus Magdalena Cortie ,  Koen Cuypers ,  Harold Sebastiaan Buddenberg ,  Giovanni Luca Gattobigio ,  Evert Van Vliet ,  Nicolaas Ten Kate ,  Mark Johannes Hermanus Frencken ,  Jantien Laura Van Erve ,  Marcel Maria Cornelius Franciscus Teunissen

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US10895808B2

公开(公告)日：2021-01-19

申请号：US15779804

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes Nakiboglu ,  Coen Hubertus Matheus Baltis ,  Siegfried Alexander Tromp ,  Yuri Johannes Gabriël Van De Vijver ,  Bert Dirk Scholten ,  Daan Daniel Johannes Antonius Van Sommeren ,  Mark Johannes Hermanus Frencken

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.