公开(公告)号：US09377697B2

公开(公告)日：2016-06-28

申请号：US14648620

申请日：2013-12-20

Applicant: ASML Netherlands B.V.

Inventor： Mark Johannes Hermanus Frencken ,  Andre Bernardus Jeunink ,  Frederikus Johannes Maria De Vreede ,  Gijs Kramer

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733

Abstract: An immersion lithographic apparatus includes a projection system, a first table with a first planar surface and a second table with a second planar surface, the first and second planar surfaces being substantially coplanar, a liquid confinement system configured to spatially confine an immersion liquid to a volume with a first surface area that is coplanar with the first and second planar surfaces, and is substantially smaller than a second surface area of the top surface of the substrate, and a swap bridge member attached to the first table, the swap bridge member having an upper surface that is substantially coplanar with the first and second planar surfaces, wherein the upper surface of the swap bridge member is configured to serve as part of the liquid confinement system and to deform when the swap bridge member collides with the second table and to remain attached to the first table.

Abstract translation: 浸没式光刻设备包括投影系统，具有第一平面表面的第一工作台和具有第二平面表面的第二工作台，第一和第二平面表面基本上共面;液体限制系统构造成将浸没液体空间地限制在 体积，其具有与第一和第二平坦表面共面的第一表面区域，并且基本上小于衬底的顶表面的第二表面区域，以及附接到第一工作台的交换桥接构件，交换桥接构件具有 与第一和第二平面基本上共面的上表面，其中交换桥接件的上表面构造成用作液体限制系统的一部分，并且当交换桥件与第二工作台碰撞时变形， 留在第一张桌子上。