公开(公告)号：US20230023764A1

公开(公告)日：2023-01-26

申请号：US17786520

申请日：2020-12-15

Applicant: APPLIED MATERIALS, INC.

Inventor： David W. GROECHEL ,  Michael R. RICE ,  Gang Grant PENG ,  Rui CHENG ,  Zubin HUANG ,  Han WANG ,  Karthik JANAKIRAMAN ,  Diwakar KEDLAYA ,  Paul L. BRILLHART ,  Abdul Aziz KHAJA

IPC: H01L21/285 ,  H01L21/67

Abstract: Methods and apparatus for surface profiling and texturing of chamber components for use in a process chamber, such surface-profiled or textured chamber components, and method of use of same are provided herein. In some embodiments, a method includes measuring a parameter of a reference substrate or a heated pedestal using one or more sensors and modifying a surface of a chamber component physically based on the measured parameter.

公开(公告)号：US20240395561A1

公开(公告)日：2024-11-28

申请号：US18637181

申请日：2024-04-16

Applicant: Applied Materials, Inc.

Inventor： Han WANG ,  Chao LI ,  Yu YANG ,  Gene LEE

IPC: H01L21/311 ,  H01J37/32

Abstract: A method for patterning a boron-containing hard mask includes patterning an oxide hard mask formed on a boron-containing hard mask, and patterning the boron-containing hard mask using the patterned oxide hard mask, wherein the oxide hard mask comprises silicon oxide (SiO2), the boron-containing hard mask is doped with one or more metal elements, and the patterning of the boron-containing hard mask comprises etching the boron-containing hard mask through openings of the patterned oxide hard mask using an etching gas mixture comprising chlorine (Cl2), hydrogen bromide (HBr), and oxygen (O2).

公开(公告)号：US20200255946A1

公开(公告)日：2020-08-13

申请号：US16778642

申请日：2020-01-31

Applicant: Applied Materials, Inc.

Inventor： Gang Grant PENG ,  David W. GROECHEL ,  Han WANG

IPC: C23C16/56 ,  H01J37/32 ,  C23C16/40 ,  H01J37/34

Abstract: One example of the disclosure provides a method of fabricating a chamber component with a coating comprising a yttrium containing material with desired film properties. In one example, the method of fabricating a coating material includes providing a base structure comprising an aluminum containing material. The method further includes forming a coating layer that includes a yttrium containing material on the base structure. The method also includes thermal treating the coating layer to form a treated coating layer.

公开(公告)号：US20180257172A1

公开(公告)日：2018-09-13

申请号：US15955503

申请日：2018-04-17

Applicant: Applied Materials, Inc.

Inventor： Gang PENG ,  David W. GROECHEL ,  Jenn C. CHOW ,  Tuochuan HUANG ,  Han WANG

IPC: B23K26/00 ,  B23K26/12 ,  H01J37/32

CPC classification number: B23K26/355 ,  B23K26/123 ,  H01J37/32477 ,  H01J37/32504

Abstract: A system to provide a texture to a surface of a component for use in a semiconductor processing chamber is provided. The system includes an enclosure comprising a processing region, a support disposed in the processing region, a photon light source to generate a stream of photons, an optical module operably coupled to the photon light source, and a lens. The optical module includes a beam modulator to create a beam of photons from the stream of photons generated from the photon light source, and a beam scanner to scan the beam of photons across the surface of the component. The lens is used to receive the beam of photons from the beam scanner and distribute the beam of photons at a wavelength in a range between about 345 nm and about 1100 nm across the surface of the component to form a plurality of features on the component.

公开(公告)号：US20230047031A1

公开(公告)日：2023-02-16

申请号：US17977019

申请日：2022-10-31

Applicant: Applied Materials, Inc.

Inventor： Gang Grant PENG ,  David W. GROECHEL ,  Han WANG

IPC: C23C16/56 ,  H01J37/34 ,  C23C16/40 ,  H01J37/32

Abstract: One example of the disclosure provides a method of fabricating a chamber component with a coating comprising a yttrium containing material with desired film properties. In one example, the method of fabricating a coating material includes providing a base structure comprising an aluminum containing material. The method further includes forming a coating layer that includes a yttrium containing material on the base structure. The method also includes thermal treating the coating layer to form a treated coating layer.

公开(公告)号：US20210046587A1

公开(公告)日：2021-02-18

申请号：US17089531

申请日：2020-11-04

Applicant: Applied Materials, Inc.

Inventor： Gang PENG ,  David W. GROECHEL ,  Jenn C. CHOW ,  Tuochuan HUANG ,  Han WANG

IPC: B23K26/352 ,  H01J37/32 ,  B23K26/12

Abstract: A system to provide a texture to a surface of a component for use in a semiconductor processing chamber is provided. The system includes an enclosure comprising a processing region, a support disposed in the processing region, a photon light source to generate a stream of photons, an optical module operably coupled to the photon light source, and a lens. The optical module includes a beam modulator to create a beam of photons from the stream of photons generated from the photon light source, and a beam scanner to scan the beam of photons across the surface of the component. The lens is used to receive the beam of photons from the beam scanner and distribute the beam of photons at a wavelength in a range between about 345 nm and about 1100 nm across the surface of the component to form a plurality of features on the component.

公开(公告)号：US20190358746A1

公开(公告)日：2019-11-28

申请号：US16532011

申请日：2019-08-05

Applicant: Applied Materials, Inc.

Inventor： Gang PENG ,  David W. GROECHEL ,  Jenn C. CHOW ,  Tuochuan HUANG ,  Han WANG

IPC: B23K26/352 ,  H01J37/32 ,  B23K26/12

Abstract: A system to provide a texture to a surface of a component for use in a semiconductor processing chamber is provided. The system includes an enclosure comprising a processing region, a support disposed in the processing region, a photon light source to generate a stream of photons, an optical module operably coupled to the photon light source, and a lens. The optical module includes a beam modulator to create a beam of photons from the stream of photons generated from the photon light source, and a beam scanner to scan the beam of photons across the surface of the component. The lens is used to receive the beam of photons from the beam scanner and distribute the beam of photons at a wavelength in a range between about 345 nm and about 1100 nm across the surface of the component to form a plurality of features on the component.

公开(公告)号：US20190341276A1

公开(公告)日：2019-11-07

申请号：US16400603

申请日：2019-05-01

Applicant: Applied Materials, Inc.

Inventor： Jenn C. CHOW ,  David W. GROECHEL ,  Tuochuan HUANG ,  Dorothea BUECHEL-RIMMEL ,  Han WANG ,  Li WU ,  Gang PENG

IPC: H01L21/67 ,  B08B3/12 ,  B08B3/02

Abstract: Embodiments described herein relate to chamber component cleaning systems and methods for cleaning a chamber component. The chamber component cleaning system includes a spray station, at least a first cleaning station, a dry station, a component transfer mechanism, and one or more enclosures that enclose the spray station, at least the first cleaning station, the dry station, and the component transfer mechanism. The spray station has a holder to position a chamber component in a path of a flow of a cleaning spray and a movable nozzle to provide the flow of the cleaning spray at a first pressure in a path of portions of the chamber component. The first cleaning station has a push mechanism to force a cleaning fluid through features and/or holes of the chamber component and at least one movable transducer to provide ultrasonic energy to the portions of the chamber component.