Dual cure monomers
    7.
    发明授权

    公开(公告)号:US11021574B2

    公开(公告)日:2021-06-01

    申请号:US16348346

    申请日:2017-11-21

    摘要: Provided are dual cure monomer are of the formula: (I) wherein R* is a (hetero)hydrocarbyl group; X1 is —O—, —S—, —NR3—, —NR3—CO—NR3, —CO—NR3— or NR3—CO—, where R3 is H, C1-C4 alkyl or R1-Epoxy; R1 is a divalent (hetero)hydrocarbyl group; X2 is —O—, —S—, —NR4—, —NR4—CO—NR4—, —CO—NR4—, —NR4—CO— where R4 is H, C1-C4 alkyl or R2—CH═CH2; R2 is a divalent (hetero)hydrocarbyl group; subscripts a and b are at least one, subscripts c and d are at least one, with the proviso that the monomer has at least two epoxy groups and at least two ene groups.

    Dual Cure Monomers
    8.
    发明申请
    Dual Cure Monomers 审中-公开

    公开(公告)号:US20200062908A1

    公开(公告)日:2020-02-27

    申请号:US16348346

    申请日:2017-11-21

    IPC分类号: C08G75/045 C08G75/12

    摘要: Provided are dual cure monomer are of the formula: (I) wherein R* is a (hetero)hydrocarbyl group; X1 is —O—, —S—, —NR3—, —NR3—CO—NR3, —CO—NR3— or NR3—CO—, where R3 is H, C1-C4 alkyl or R1-Epoxy; R1 is a divalent (hetero)hydrocarbyl group; X2 is —O—, —S—, —NR4—, —NR4—CO—NR4—, —CO—NR4—, —NR4—CO— where R4 is H, C1-C4 alkyl or R2—CH═CH2; R2 is a divalent (hetero)hydrocarbyl group; subscripts a and b are at least one, subscripts c and d are at least one, with the proviso that the monomer has at least two epoxy groups and at least two ene groups.